Methods and apparatuses for erasing data on a plurality of ferroelectric memory cells in a memory cell array in a memory apparatus are disclosed. An example apparatus includes: a memory cell array including a first plurality of word lines; a digit line; and a plurality of ferroelectric memory cells; a control circuit that provides a section select signal and a word line select signal to select a second plurality of word lines among the first plurality of word lines responsive to an address; and an address decoder that activates the second plurality of word lines. Each ferroelectric memory cell includes: a ferroelectric capacitor having a first terminal coupled to a cell plate node and a second terminal coupled to a selection circuit that couples the digit line to the second terminal responsive to a signal on a corresponding word line of the second plurality of word lines.

A method of manufacturing a semiconductor device is disclosed. The method includes providing a substrate including a channel region for conducting current; shaping the substrate to form a protruding plane, a bottom plane and a side plane connected between the protruding plane and the bottom plane for the channel region; forming an oxide layer covering the channel region; forming a ferroelectric material strip, extending in a first direction, on a protruding plane of the oxide layer; and forming a gate strip, extending in a second direction orthogonal with the first direction, on the ferroelectric material strip and a side plane and a bottom plane of the oxide layer.

Some embodiments include an integrated assembly. The integrated assembly has a first transistor with a horizontally-extending channel region between a first source/drain region and a second source/drain region; has a second transistor with a vertically-extending channel region between a third source/drain region and a fourth source/drain region; and has a capacitor between the first and second transistors. The capacitor has a first electrode, a second electrode, and an insulative material between the first and second electrodes. The first electrode is electrically connected with the first source/drain region, and the second electrode is electrically connected with the third source/drain region. A digit line is electrically connected with the second source/drain region. A conductive structure is electrically connected with the fourth source/drain region.

Apparatuses and methods for memory that includes a first memory cell including a storage component having a first end coupled to a plate line and a second end coupled to a digit line, and a second memory cell including a storage component having a first end coupled to a digit line and a second end coupled to a plate line, wherein the digit line of the second memory cell is adjacent to the plate line of the first memory cell.

A ferroelectric field effect transistor includes: a source; a drain; a first channel connected to and between the source and the drain; a second channel connected to and between the source and the drain and spaced apart from the first channel; a ferroelectric layer covering the first channel and the second channel; a first gate layer disposed on the ferroelectric layer in correspondence with the first channel; a second gate layer disposed on the ferroelectric layer in correspondence with the second channel; and a gate wiring electrically connecting the first gate layer to the second gate layer, wherein the first gate layer includes a first metallic material having a first work function, and the second gate layer includes a second metallic material having a second work function, wherein the second work function is different from the first work function.

Methods, systems, and devices for time-based access of memory cells in a memory array are described herein. During a sense portion of a read operation, a selected memory cell may be charged to a predetermined voltage level. A logic state stored on the selected memory cell may be identified based on a duration between the beginning of the charging and when selected memory cell reaches the predetermined voltage level. In some examples, time-varying signals may be used to indicate the logic state based on the duration of the charging. The duration of the charging may be based on a polarization state of the selected memory cell, a dielectric charge state of the selected state, or both a polarization state and a dielectric charge state of the selected memory cell.

Methods, systems, and devices for sensing techniques for differential memory cells are described. A method may include selecting a pair of memory cells that comprise a first memory cell coupled with a first digit line and a second memory cell coupled with a second digit line for a read operation, the pair of memory cells storing one bit of information. The method may further include applying a first voltage to a plate line coupled with the first memory cell and the second memory cell and applying a second voltage to a select line to couple the first digit line and the second digit line with a sense amplifier. The amplifier may sense a logic state of the pair of memory cells based on a difference between a third voltage of the first digit line and a fourth voltage of the second digit line.

A memory structure including three-dimensional NOR memory strings and method of fabrication is disclosed. In some embodiments, a memory structure includes randomly accessible ferroelectric storage transistors organized as horizontal NOR memory strings. The NOR memory strings are formed over a semiconductor substrate in multiple scalable memory stacks of thin-film storage transistors. The three-dimensional memory stacks are manufactured in a process that includes forming operational trenches for vertical local word lines and forming auxiliary trenches to facilitate back-alley metal replacement and channel separation by a backside selective etch process. In some embodiments, the ferroelectric storage transistors are junctionless field-effect transistors (FeFETs) having a ferroelectric polarization layer as the gate dielectric layer formed adjacent a semiconductor oxide layer as the channel region.

Methods, systems, and devices related to content-addressable memory for signal development caching are described. In one example, a memory device in accordance with the described techniques may include a memory array, a sense amplifier array, and a signal development cache configured to store signals (e.g., cache signals, signal states) associated with logic states (e.g., memory states) that may be stored at the memory array (e.g., according to various read or write operations). The memory device may also include storage, such as a content-addressable memory, configured to store a mapping between addresses of the signal development cache and addresses of the memory array. In various examples, accessing the memory device may include determining and storing a mapping between addresses of the signal development cache and addresses of the memory array, or determining whether to access the signal development cache or the memory array based on such a mapping.

A memory cell arrangement may include: a first memory cell including a first field-effect transistor structure, a first capacitive memory structure coupled to a gate of the first field-effect transistor structure, and a first capacitive lever structure coupled to the gate of the first field-effect transistor structure, and wherein a second memory cell of the plurality of memory cells includes a second field-effect transistor structure, a second capacitive memory structure coupled to a gate of the second field-effect transistor structure, and a second capacitive lever structure coupled to the gate of the second field-effect transistor structure; wherein at least one of the first capacitive memory structure and/or the second capacitive memory structure is disposed in a memory structure region between the first capacitive lever structure and the second capacitive lever structure.