A phase change memory apparatus comprises at least one heating layer; and at least one phase change layer comprising a vanadium dioxide layer, wherein each of the at least one phase change layer is set corresponding to each of the at least one heating layer, the at least one heating layer is configured to heat the at least one phase change layer.

A resistive memory apparatus and an operating method thereof are provided. In the method, a set operation having a first enhanced bias is performed on at least one memory cell in a resistive memory array of the resistive memory apparatus, in which the first enhanced bias is larger than a bias used in a normal execution of the set operation. A heat process is performed on the memory cell. A set operation having a second enhanced bias is performed on the memory cell, in which the second enhanced bias is larger than or equal to the first enhanced bias.

The present disclosure discloses a memory cell and a memory device including the same. The memory cell includes a thin film transistor layer, a gate conductive layer, a first heater, a second heater, a phase change layer, and a dielectric layer. The thin film transistor layer includes a channel layer and a first source/drain structure and a second source/drain structure in contact with opposite sides of the channel layer. The gate conductive layer is disposed beneath the gate dielectric layer to control turn-on or turn-off of the channel layer. The first and second heaters are respectively disposed over the first and second source/drain structures. The phase change layer is disposed over the channel layer and in contact with the first and second heaters. The dielectric layer is disposed beneath the phase change layer, and the phase change layer is separated from the channel layer by the dielectric layer.

A memory cell includes a heating element topped with a phase-change material. Two first silicon oxide regions laterally surround the heating element along a first direction. Two second silicon oxide regions laterally surround the heating element along a second direction orthogonal to the first direction. Top surfaces of the heating element and the two first silicon oxide regions are coplanar such that the heating element and the two first silicon oxide regions have a same thickness.

Subject matter disclosed herein relates to memory devices and, more particularly, to programming a memory cell.

Phase change material can be set with a multistage set process. Set control logic can heat a phase change semiconductor material (PM) to a first temperature for a first period of time. The first temperature is configured to promote nucleation of a crystalline state of the PM. The control logic can increase the temperature to a second temperature for a second period of time. The second temperature is configured to promote crystal growth within the PM. The nucleation and growth of the crystal set the PM to the crystalline state. The multistage ramping up of the temperature can improve the efficiency of the set process relative to traditional approaches.

Subject matter disclosed herein relates to memory devices and, more particularly, to programming a memory cell.

Subject matter described pertains to methods, apparatuses, and circuits for programming a memory device.

The present disclosure generally relates to semiconductor structures and, more particularly, to program and erase memory structures and methods of manufacture. The semiconductor memory includes: a charge trap transistor; and a self-heating circuit which selectively applies voltages to terminals of the charge trap transistor to assist in erase operations of the charge trap transistor.

According to an embodiment, a phase-change memory device comprises: an upper electrode and a lower electrode; a phase-change layer in which a crystal state thereof is changed by heat supplied by the upper electrode and the lower electrode; and a selector which selectively switches the heat supplied by the upper electrode and the lower electrode to the phase-change layer, wherein the selector is formed of a compound which includes a transition metal in the phase-change material so as to have a high resistance when the crystalline state of the selector is crystalline and so as to have a low resistance when the crystalline state of the selector is non-crystalline.