A one-time programing cell includes a first metal oxide semiconductor (MOS) structure and a second transistor having a common gate electrode electrically connected to a word line. The first MOS structure has a first gate dielectric layer and the second MOS structure has a second gate dielectric layer. The second gate dielectric layer is thicker than the first gate dielectric layer. Source nodes of the first MOS structure and the second MOS structure are electrically connected, and a drain node of the second MOS structure is electrically connected to a bit line.

A one-time programing cell includes a first metal oxide semiconductor (MOS) structure and a second transistor having a common gate electrode electrically connected to a word line. The first MOS structure has a first gate dielectric layer and the second MOS structure has a second gate dielectric layer. The second gate dielectric layer is thicker than the first gate dielectric layer. Source nodes of the first MOS structure and the second MOS structure are electrically connected, and a drain node of the second MOS structure is electrically connected to a bit line.

A semiconductor device includes a word line coupled to a mask ROM memory cell, a bit line pair coupled to the memory cell, a differential sense amplifier for amplifying the potential difference of the bit line pair, and a logic circuit for detecting whether the logic states of the bit line pair match or not. In this way, when there is a failure in the memory cell, it is possible to prevent the semiconductor device from passing the test as a result of the determination that the actual value is the same as the expected value in the test even if there is no potential difference in the bit line pair.

Various implementations described herein may refer to and may be directed to non-discharging read-only memory cells. For instance, in one implementation, an integrated circuit may include a read-only memory (ROM) array including a plurality of ROM cells arranged into a column, where the column is disposed proximate to a bit line and to a reference voltage line. The plurality of ROM cells arranged into the column may include a plurality of non-discharging ROM cells positioned adjacently to one another, where each non-discharging ROM cell has a source terminal, a drain terminal, or both coupled to at least one adjacent non-discharging ROM cell. In addition, the plurality of non-discharging ROM cells may be coupled to the bit line using two or fewer connections.

A semiconductor device includes a word line coupled to a mask ROM memory cell, a bit line pair coupled to the memory cell, a differential sense amplifier for amplifying the potential difference of the bit line pair, and a logic circuit for detecting whether the logic states of the bit line pair match or not. In this way, when there is a failure in the memory cell, it is possible to prevent the semiconductor device from passing the test as a result of the determination that the actual value is the same as the expected value in the test even if there is no potential difference in the bit line pair.

A semiconductor device includes first nanostructures vertically separated from one another, a first gate structure wrapping around each of the first nanostructures, and second nanostructures vertically separated from one another. The semiconductor device also includes a second gate structure wrapping around the second nanostructures, a first drain/source structure coupled to a first end of the first nanostructures, a second drain/source structure coupled to both of a second end of the first nanostructures and a first end of the second nanostructures, and a third drain/source structure coupled to a second end of the second nanostructures. The first drain/source structure has a first doping type, the second and third drain/source structures have a second doping type, and the first doping type is opposite to the second doping type.

A method to program bitcells of a ROM array uses different programming cells for programming the bitcells with a first or second data item. A first bitcell is programmed by means of a selected programming cell, wherein the programming cell is selected in dependence on operating the memory array as a flipped or a non-flipped memory in multi-bank instance. All other bitcells located in the same column as the first bitcell and subsequent rows are programmed by selected programming cells, wherein the selection of the programming cells is dependent on operating the memory array as a flipped or a non-flipped memory in multi-bank instance and the programming state of the programming cells used for the previously programmed bitcells in the same column.

A method of operating a memory circuit includes turning on a first programming device and turning on a first selection device thereby causing a first current to flow through a first fuse element. The first fuse element is coupled between the first selection device and the first programming device. The method further includes turning off a second programming device and turning off a second selection device, and blocking the first current from flowing through a second fuse element that is coupled between the second selection device and the first programming device.

A semiconductor device includes first nanostructures vertically separated from one another, a first gate structure wrapping around each of the first nanostructures, and second nanostructures vertically separated from one another. The semiconductor device also includes a second gate structure wrapping around the second nanostructures, a first drain/source structure coupled to a first end of the first nanostructures, a second drain/source structure coupled to both of a second end of the first nanostructures and a first end of the second nanostructures, and a third drain/source structure coupled to a second end of the second nanostructures. The first drain/source structure has a first doping type, the second and third drain/source structures have a second doping type, and the first doping type is opposite to the second doping type.

Methods and apparatus to delete and prevent recovery of data stored in a memory array are disclosed. An example apparatus includes machine readable instructions; and at least one programmable circuit to at least one of instantiate or execute the machine readable instructions to: obtain an instruction to zeroize a memory array; and cause a voltage to be applied across a plurality of transistors associated with a plurality of memory cells in the memory array. The voltage is to set the plurality of memory cells to a same logical value. The voltage is applied across the transistors regardless of the logical values of the plurality of memory cells prior to receiving the instruction to zeroize the memory array.