Memory devices and systems with TSV health monitor circuitry, and associated methods, are disclosed herein. In one embodiment, a memory device includes a plurality of memory dies, a plurality of through-silicon vias (TSVs) in electrical communication with the memory dies; and circuitry. In some embodiments, the circuitry is configured to electrically couple a pair of TSVs of the plurality of TSVs to form a passive circuit. For example, the circuitry can activate a transistor electrically positioned between TSVs of the pair of TSVs to electrically couple the pair of TSVs. In these and other embodiments, the circuitry applies a test voltage to the pair of TSVs using the passive circuit to determine whether a TSV of the pair of TSVs includes degradation.

A device architecture includes a spatially reconfigurable array of processors, such as configurable units of a CGRA, having spare elements, and a parameter store on the device which stores parameters that tag one or more elements as unusable. Technologies are described which change the pattern of placement of configuration data, in dependence on the tagged elements. As a result, a spatially reconfigurable array having unusable elements can be repaired.

A semiconductor device, the device including: a first level overlaid by a first memory control level; a first memory level disposed on top of said first control level, where said first memory level includes a first thinned single crystal substrate; a second memory level, said second memory level disposed on top of said first memory level, where said second memory level includes a second thinned single crystal substrate, where said memory control level is bonded to said first memory level, and where said bonded includes oxide to oxide and conductor to conductor bonding.

Provided are standby circuit dispatch method, apparatus, device and medium. The method includes: a first test item is executed and first test data is acquired, the first test data including position data of a failure bit acquired during execution of the first test item; a first redundant circuit dispatch result is determined according to the first test data; a second test item is executed and second test data is acquired; when the failure bit acquired during execution of the second test item includes a failure bit outside the repair range of the dispatched regional redundant circuits and dispatched global redundant circuits, and the dispatchable redundant circuits have been dispatched out, a maximum target bit umber is acquired according to the first test data and the second test data; and a target dispatch mode is selected and a second redundant circuit dispatch result is determined according to the target dispatch mode.

A redundant circuit assigning method a includes: first test item is executed and first test data is acquired; a first redundant circuit assigning result including the number of assigned local redundant circuits and position data of the assigned local redundant circuits is determined according to the first test data; a second test item is executed and second test data is acquired; when fail bits acquired during execution of the second test item include one or more fail bits beyond the repair range of the assigned local redundant circuits and assigned global redundant circuits, and the assignable redundant circuits have been assigned out, target position data of fail bits in a target subdomain and a related subdomain is acquired based on the first test data and the second test data; and a second redundant circuit assigning result is determined according to the first test data and the second test data.

Semiconductor devices, packaging architectures and associated methods are disclosed. In one embodiment, a semiconductor device is disclosed. The semiconductor device includes a first semiconductor die having a first bonding surface that is formed with a first set of contacts patterned with a first connection pitch. A second semiconductor die has a second bonding surface that is formed with a second set of contacts patterned with a second connection pitch. The second set of contacts are further patterned with a paired offset. The second semiconductor die is bonded to the first semiconductor die such that the first set of contacts is disposed in opposed electrical engagement with at least a portion of the second set of contacts.

A memory device includes a memory cell array including normal memory cells and redundant memory cells; first page buffers connected to the normal memory cells through first bit lines including a first bit line group and a second bit line group and arranged in a first area corresponding to the first bit lines in a line in a first direction; and second page buffers connected to the redundant memory cells through second bit lines including a third bit line group and a fourth bit line group and arranged in a second area corresponding to the second bit lines in a line in the first direction, wherein, when at least one normal memory cell connected to the first bit line group is determined as a defective cell, normal memory cells connected to the first bit line group are replaced with redundant memory cells connected to the third bit line group.

Systems, methods and apparatus are provided for a three-node access device in vertical three-dimensional (3D) memory. An example method includes a method for forming arrays of vertically stacked memory cells, having horizontally oriented access devices and vertically oriented access lines. The method includes depositing alternating layers of a dielectric material and a sacrificial material to form a vertical stack. Forming a plurality of first vertical openings to form elongated vertical, pillar columns with sidewalls in the vertical stack. Conformally depositing a gate dielectric in the plurality of first vertical openings. Forming a conductive material on the gate dielectric. Removing portions of the conductive material to form a plurality of separate, vertical access lines. Repairing a first side of the gate dielectric exposed where the conductive material was removed. Forming a second vertical opening to expose sidewalls adjacent a first region of the sacrificial material. Selectively removing the sacrificial material in the first region to form first horizontal openings. Repairing a second side of the gate dielectric exposed where the sacrificial material was removed in the first region. Depositing a first source/drain region, a channel region, and a second source/drain region in the first horizontal openings.

A semiconductor device includes a first semiconductor portion and a second semiconductor portion. The first semiconductor portion provides a plurality of memory components, including a first substrate layer, a plurality of first interconnect conductive layers, a plurality of first conductive vias, and a plurality of first conductive contacts. The first conductive contacts electrically connect to the first conductive vias, and the first conductive contacts in combination with the first conductive vias are formed on a top first interconnect conductive layer of the first interconnect conductive layers. The second semiconductor portion provides a control circuit, including a second substrate layer and a plurality of second interconnect conductive layers. The first and second semiconductor portions are stacked vertically with one another, so that the first conductive contacts are electrically connected to the control circuit, and the first conductive contacts in combinations with the first conductive vias form a plurality of transmission channels.

A three-dimensional stacked integrated circuit (3D SIC) having a non-volatile memory die, a volatile memory die, and a logic die. The non-volatile memory die, the volatile memory die, and the logic die are stacked. The 3D SIC is partitioned into a plurality of columns that are perpendicular to each of the stacked dies. Each column of the plurality of columns is configurable to be bypassed via configurable routes. When the configurable routes are used, functionality of a failing part of the column is re-routed to a corresponding effective part of a neighboring column.