Patent classifications
G01C19/5762
Sensor
According to one embodiment, a sensor includes a movable member including a first movable portion and a second movable portion, and a first fixed member. At least a portion of the first fixed member is between the first movable portion and the second movable portion. The first fixed member includes a first fixed counter portion opposing the first movable portion, and a second fixed counter portion opposing the second movable portion. The first fixed counter portion includes a first fixed protruding portion protruding toward the first movable portion. The second fixed counter portion includes a second fixed protruding portion protruding toward the second movable portion.
Microelectromechanical gyroscope for sensing angular rate and method of sensing angular rate
A microelectromechanical gyroscope includes: a substrate; a stator sensing structure fixed to the substrate; a first mass elastically constrained to the substrate and movable with respect to the substrate in a first direction; a second mass elastically constrained to the first mass and movable with respect to the first mass in a second direction; and a third mass elastically constrained to the second mass and to the substrate and capacitively coupled to the stator sensing structure, the third mass being movable with respect to the substrate in the second direction and with respect to the second mass in the first direction.
Microelectromechanical gyroscope for sensing angular rate and method of sensing angular rate
A microelectromechanical gyroscope includes: a substrate; a stator sensing structure fixed to the substrate; a first mass elastically constrained to the substrate and movable with respect to the substrate in a first direction; a second mass elastically constrained to the first mass and movable with respect to the first mass in a second direction; and a third mass elastically constrained to the second mass and to the substrate and capacitively coupled to the stator sensing structure, the third mass being movable with respect to the substrate in the second direction and with respect to the second mass in the first direction.
Microelectromechanical or/and nanoelectromechanical device with out-of-plane displacement having capacitive elements having a variable surface
Microelectromechanical sensor comprising a fixed part and a mobile part suspended from the fixed part such that the mobile part can move at least in an out-of-plane displacement direction, the fixed part comprising at least first electrodes extending parallel to the displacement direction of the mobile part, the mobile part comprising a seismic mass and at least second electrodes extending parallel to the out-of-plane displacement direction, the first electrodes and the second electrodes being located relative to each other so as to be interdigitated, in which the second electrodes are directly connected to the inertial mass and only part of the face of each mobile electrode is facing an electrode fixed at rest.
Microelectromechanical or/and nanoelectromechanical device with out-of-plane displacement having capacitive elements having a variable surface
Microelectromechanical sensor comprising a fixed part and a mobile part suspended from the fixed part such that the mobile part can move at least in an out-of-plane displacement direction, the fixed part comprising at least first electrodes extending parallel to the displacement direction of the mobile part, the mobile part comprising a seismic mass and at least second electrodes extending parallel to the out-of-plane displacement direction, the first electrodes and the second electrodes being located relative to each other so as to be interdigitated, in which the second electrodes are directly connected to the inertial mass and only part of the face of each mobile electrode is facing an electrode fixed at rest.
One-axis and two-axis rotation rate sensor
A sensor includes a substrate having a first electrode arrangement; a first mass oscillator having (a) a first mass, (b) a first mass centroid, and (c) a second electrode arrangement including a first area centroid coinciding with the first mass centroid; and a second mass oscillator having (a) a second mass equal to the first mass, (b) a second mass centroid coinciding with the first mass centroid, and (c) a third electrode arrangement including a second area centroid coinciding with the first area centroid. Areas of the second and third electrode arrangements are equal. The sensor detects respective rotation rates around axes parallel to and perpendicular to a substrate extension. The oscillators are oscillatorily connected to each other and to the substrate, are deflectable, and experience respective forces in the directions of extension of the axes upon respective rotations around the other of the axes.
One-axis and two-axis rotation rate sensor
A sensor includes a substrate having a first electrode arrangement; a first mass oscillator having (a) a first mass, (b) a first mass centroid, and (c) a second electrode arrangement including a first area centroid coinciding with the first mass centroid; and a second mass oscillator having (a) a second mass equal to the first mass, (b) a second mass centroid coinciding with the first mass centroid, and (c) a third electrode arrangement including a second area centroid coinciding with the first area centroid. Areas of the second and third electrode arrangements are equal. The sensor detects respective rotation rates around axes parallel to and perpendicular to a substrate extension. The oscillators are oscillatorily connected to each other and to the substrate, are deflectable, and experience respective forces in the directions of extension of the axes upon respective rotations around the other of the axes.
Configuration to reduce non-linear motion
Embodiments for modifying a spring mass configuration are disclosed that minimize the effects of unwanted nonlinear motion on a MEMS sensor. The modifications include any or any combination of providing a rigid element between rotating structures of the spring mass configuration, tuning a spring system between the rotating structures and coupling an electrical cancellation system to the rotating structures. In so doing unwanted nonlinear motion such as unwanted 2.sup.nd harmonic motion is minimized.
Configuration to reduce non-linear motion
Embodiments for modifying a spring mass configuration are disclosed that minimize the effects of unwanted nonlinear motion on a MEMS sensor. The modifications include any or any combination of providing a rigid element between rotating structures of the spring mass configuration, tuning a spring system between the rotating structures and coupling an electrical cancellation system to the rotating structures. In so doing unwanted nonlinear motion such as unwanted 2.sup.nd harmonic motion is minimized.
Inertial Sensor and Method of Inertial Sensing with Tuneable Mode Coupling Strength
There is provided an inertial sensor comprising a frame, a resonator assembly fixed to the frame comprising a first and second resonator coupled to one another by a mechanical coupling and a drive means coupled to the resonator assembly for driving the first and second resonators to vibrate. The resonator assembly is configured such that energy is transferred between the first and second resonators through the mechanical coupling. An amount of energy transferred through the mechanical coupling is dependent on the value of an input measurand acting on one of the first and second resonators. The inertial sensor also comprises a pumping means coupled to the resonator assembly for applying a pumping signal to the resonator assembly, the pumping means controlled by electrical circuitry, and a sensor assembly configured to detect the amplitude of oscillation of the first resonator at a first resonant frequency and the amplitude of oscillation of the second resonator at a second resonant frequency. The electrical circuitry is configured to control the pumping means to apply a pumping signal that has a frequency substantially equal to a difference between the first resonant frequency and the second resonant frequency. When the input measurand has the first value, the signal from the pumping means adjusts an amplitude ratio of the amplitudes of oscillation of the first and second resonator detected by the sensor assembly so that the amplitude ratio is within a predetermined amplitude ratio range over an expected range of input measurand values. An output of the inertial sensor is based on the amplitude ratio.