Patent classifications
G01D5/38
MEASUREMENT DEVICE AND MEASUREMENT METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
A measurement system in which an object that moves toward a processing position serves as a measurement target. In the processing position a processing device is capable of applying processing to the object. The measurement system includes: a mark detection device that has an irradiation system to irradiate a mark provided at the object that is moving with a measurement beam while moving the measurement beam; and a beam receiving system to receive a beam from the mark. The irradiation system irradiates the object with the measurement beam while moving the measurement beam, during a period when the object moves toward the processing position.
LASER APPARATUS, WAVELENGTH CONTROL METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
A laser apparatus includes a first optical element, a second optical element, a first actuator configured to change a first wavelength component included in a pulse laser beam by changing a posture of the first optical element, a second actuator configured to change a second wavelength component included in the pulse laser beam by changing a posture of the second optical element, a first encoder configured to measure a position of the first actuator, a second encoder configured to measure a position of the second actuator, and a processor. The processor reads a first relation and a second relation and performs control of the first actuator based on the first relation and the position of the first actuator measured by the first encoder and control of the second actuator based on the second relation and the position of the second actuator measured by the second encoder.
Optical position measuring device
An optical position measuring device for recording a relative position of two scales includes the scales. The longitudinal extents of the scales are oriented parallel to a first and second measuring direction. A horizontal plane of movement is spanned by these measuring directions. A light source is configured to emit an illumination beam that is split into at least two sub-beam bundles at the first scale. The sub-beam bundles subsequently impinge on the second scale, which is tilted about the direction of the longitudinal extent thereof relative to the horizontal plane of movement, and are back-reflected to impinge again on the first scale and are recombined there such that a resulting signal beam is subsequently propagated toward a detection unit, via which phase-shifted scanning signals are generatable with respect to a relative movement of the scales along a third perpendicular measuring direction and the first or second measuring direction.
Optical position measuring device
An optical position measuring device for recording a relative position of two scales includes the scales. The longitudinal extents of the scales are oriented parallel to a first and second measuring direction. A horizontal plane of movement is spanned by these measuring directions. A light source is configured to emit an illumination beam that is split into at least two sub-beam bundles at the first scale. The sub-beam bundles subsequently impinge on the second scale, which is tilted about the direction of the longitudinal extent thereof relative to the horizontal plane of movement, and are back-reflected to impinge again on the first scale and are recombined there such that a resulting signal beam is subsequently propagated toward a detection unit, via which phase-shifted scanning signals are generatable with respect to a relative movement of the scales along a third perpendicular measuring direction and the first or second measuring direction.
OPTICAL POSITION-MEASURING DEVICE
An optical position-measuring device for determining the position of a first object relative to a second object movable relative to the first object along a measurement direction includes a scale with a measuring graduation connected to the first object and extending along the measurement direction. A scanner is connected to the second object and includes a fiber-optic array including optical fibers. The fiber-optic array is configured as a fiber-optic plate having an image-input face facing the scale and an image-output face facing the detector array. The fiber-optic array transmits a light pattern into a detection plane of the detector array. An interstitial medium is disposed between the image-output face of the fiber-optic plate and the detector array to ensure that an amount of deflection that the beams exiting the image-output face undergo on a path to the detector array is smaller than in a case without the interstitial medium.
Measurement device for linear stage
A measurement device for a linear stage includes a two-dimensional grating and a measurement unit respectively disposed on first and second moving stages of the linear stage. The measurement unit includes a light source, a two-dimensional sensor and a processor. The light source emits incident light to the two-dimensional grating so that the incident light is reflected thereby to result in reflection light. The two-dimensional sensor receives the reflection light and converts the same to a reflection signal. The processor receives the reflection signal and determines accordingly a first rotational angle, and first and second displacement components of a displacement of the first moving stage.
DISPLACEMENT DETECTION APPARATUS
A displacement detection apparatus can reduce a measurement error even when a diffraction grating is displaced and/or tilted to a direction other than the measurement direction. A displacement detection apparatus includes a light source which emits light, a luminous flux-splitting section, a diffraction grating, a diffracted light-reflecting section, a correcting lens, a luminous flux-coupling section, and a light-receiving section. The diffracted light-reflecting section reflects a first luminous flux and a second luminous flux so as to be perpendicular to one of measuring planes of the diffraction grating and be parallel to each other. The correcting lens is arranged between the diffracted light-reflecting section and the diffraction grating.
MEASURING APPARATUS AND METHOD, PROCESSING APPARATUS AND METHOD, PATTERN FORMING APPARATUS AND METHOD, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD
Position information of a movable body within an XY plane is measured with high accuracy by an encoder system whose measurement values have favorable short-term stability, without being affected by air fluctuations, and also position information of the movable body in a Z-axis direction orthogonal to the XY plane is measured with high accuracy by a surface position measuring system, without being affected by air fluctuations. In this case, since both of the encoder system and the surface position measuring system directly measure the upper surface of the movable body, simple and direct position control of the movable body can be performed.
MEASURING APPARATUS AND METHOD, PROCESSING APPARATUS AND METHOD, PATTERN FORMING APPARATUS AND METHOD, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD
Position information of a movable body within an XY plane is measured with high accuracy by an encoder system whose measurement values have favorable short-term stability, without being affected by air fluctuations, and also position information of the movable body in a Z-axis direction orthogonal to the XY plane is measured with high accuracy by a surface position measuring system, without being affected by air fluctuations. In this case, since both of the encoder system and the surface position measuring system directly measure the upper surface of the movable body, simple and direct position control of the movable body can be performed.
ENCODER, POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS
An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.