G01J1/26

Controlling ultraviolet intensity over a surface of a light sensitive object

An approach for controlling ultraviolet intensity over a surface of a light sensitive object is described. Aspects involve using ultraviolet radiation with a wavelength range that includes ultraviolet-A and ultraviolet-B radiation to irradiate the surface. Light sensors measure light intensity at the surface, wherein each sensor measures light intensity in a wavelength range that corresponds to a wavelength range emitted from at least one of the sources. A controller controls the light intensity over the surface by adjusting the power of the sources as a function of the light intensity measurements. The controller uses the light intensity measurements to determine whether each source is illuminating the surface with an intensity that is within an acceptable variation with a predetermined intensity value targeted for the surface. The controller adjusts the power of the sources as a function of the variation to ensure an optimal distribution of light intensity over the surface.

Controlling ultraviolet intensity over a surface of a light sensitive object

An approach for controlling ultraviolet intensity over a surface of a light sensitive object is described. Aspects involve using ultraviolet radiation with a wavelength range that includes ultraviolet-A and ultraviolet-B radiation to irradiate the surface. Light sensors measure light intensity at the surface, wherein each sensor measures light intensity in a wavelength range that corresponds to a wavelength range emitted from at least one of the sources. A controller controls the light intensity over the surface by adjusting the power of the sources as a function of the light intensity measurements. The controller uses the light intensity measurements to determine whether each source is illuminating the surface with an intensity that is within an acceptable variation with a predetermined intensity value targeted for the surface. The controller adjusts the power of the sources as a function of the variation to ensure an optimal distribution of light intensity over the surface.

Lithographic method

A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Lithographic method

A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

LITHOGRAPHIC METHOD

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

LITHOGRAPHIC METHOD

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Interior rearview mirror system with ambient light detection

A vehicular interior rearview mirror system includes an interior rearview mirror assembly having a mirror head adjustably mounted at a mounting structure. The mirror head includes a mirror casing and an electro-optic variable reflectance mirror reflective element. A glare light sensor senses glare light emanating from headlights of another vehicle rearward of the equipped vehicle. An ambient light sensor senses ambient light at the vehicle. The ambient light sensor comprises part of a rain sensing device disposed at an in-cabin side of a windshield of the vehicle. Mirror control circuitry is operable to adjust dimming of the mirror reflective element responsive to an output from the glare light sensor and an output from the ambient light sensor. Responsive to the output from the glare light sensor and the output from the ambient light sensor, the mirror control circuitry controls dimming of the mirror reflective element.

ELECTRONIC DEVICE AND METHOD FOR CONTROLLING SENSITIVITY OF SENSOR ON BASIS OF WINDOW ATTRIBUTES

Various embodiments related to an electronic device and a method for controlling sensitivity of a sensor on the basis of window attributes are described. According to an embodiment, an electronic device may include: a housing; a window cover housed in the housing, in which an attribute of at least a partial area may be changed via an electrical control on the basis of at least one attribute; at least one sensor disposed below at least the partial area; and at least one processor, wherein the at least one processor is configured to identify control information related to an operation of changing the attribute of at least the partial area on the basis of the at least one attribute, to determine a sensitivity related to the at least one sensor corresponding to the at least one attribute at least on the basis of the control information, and to acquire peripheral information of the exterior of the electronic device by using the at least one sensor, at least on the basis of the determined sensitivity.

Attenuated light beam peak frequency modification
10095055 · 2018-10-09 · ·

According to an example, a plurality of pixels of a modulator upon which an input light beam impinges may be modulated to apply a first asymmetrical attenuation pattern on the input light beam and to direct a first attenuated light beam from the modulator and a first power level of the first attenuated light beam may be measured. The plurality of pixels may be modulated to apply a second asymmetrical attenuation pattern on the input light beam and to direct a second attenuated light beam from the modulator, and a second power level of the second attenuated light beam may be measured. A difference between the first power level and the second power level may be calculated and a modified peak frequency for an attenuated light beam from the calculated difference may be calculated.

Using ultraviolet sensor data to determine a pseudo location of a user

Embodiments of the invention are directed to a method for determining a pseudo location of a user. The method includes collecting, by a processing device, ultraviolet (UV) sensor data from a UV sensor of a user device of the user. The method further includes analyzing, by the processing device, the UV sensor data by comparing the UV sensor data to a UV profile for a geographic area. The method further includes determining, by the processing device, the pseudo location of the user based at least in part on the UV sensor data and the UV profile.