A posture adjustment device for an optical sensor includes: a controller, a posture detector, and a posture adjustment structure. An optical sensor to be detected is fixed on the posture adjustment structure. The posture detector receives an emitted beam of the optical sensor to be detected, detects a posture of the optical sensor to be detected according to the emitted beam, and sends posture information to the controller. The controller controls, according to the posture information, the posture adjustment structure to adjust the posture of the optical sensor to be detected.

Target devices for characterizing terahertz imaging systems are provided. The target devices include a terahertz resolution pattern having spatially distributed resolution features and one or more prism assemblies configured to provide a variable contrast level within the resolution features when used with terahertz radiation. Each prism assembly includes first and second prisms arranged in a Frustrated Total Internal Reflection (FTIR) configuration.

A method for fabricating an optical source for calibrating an optical system is provided. The method includes determining a form factor for an optical source based on a point of detection of an optical system corresponding to a region where an optical signal of the optical system interacts with a sample. The method also includes providing an envelope in a size and shape to fit the form factor. The method also includes providing a plurality of electrodes connected to the envelope for connection to a power source and filling the envelope with a gas. The optical source formed from the above method is also provided.

The disclosure provides a calibration assembly for a scan device. The calibration assembly includes a plurality of light-permeable plates and a reflection plate. The light-permeable plates are different in size, and the light-permeable plates are arranged along thicknesses directions thereof to form a step shape. The light-permeable plates define a plurality of light-permeable areas that respectively have different numbers of layers of the light-permeable plates inversely proportional to transmittances of the light-permeable areas. The light-permeable areas are configured to be permeable to a light having a predetermined frequency. The reflection plate is disposed at a side of one of the light-permeable plates in the thickness direction thereof. The reflection plate has a plurality of first holes having different sizes, and the reflection plate is configured to block the light having the predetermined frequency. The disclosure also provides a calibration system having the calibration assembly.

A spectrometer system comprises a housing provided with a window, an illumination source, a spectrometer and a standard for internal recalibration being disposed in said housing. Specific absorption bands of a filling gas present in the housing are identified in a reference spectrum, which was recorded using the standard, wherein a wavelength characterizing the relevant identified specific absorption band is measured in each case such that measured values are obtained for the wavelengths of the absorption bands. A test spectrum is recorded by the spectrometer using the standard. The specific absorption bands of the filling gas are identified in the test spectrum, wherein a wavelength characterizing the relevant identified specific absorption band is measured in each case such that measured values are obtained for the wavelengths of the specific absorption bands.

A calibration standard for determining an intensity decay related to an evanescent field generated close to the interface between a sample to be tested and a substrate on which the sample is to be deposited, preparation and analysis methods and use thereof.

A standard reference material interface for a Raman probe includes a locator including a housing having a first end and a second end, the first end including an attachment portion configured to mate with an attachment portion of the Raman probe. The locator defines a central axis that intersects the first end and the second end. The standard reference material interface also includes a hermetically sealed standard reference material enclosure positioned at the second end of the housing and enclosing a standard reference material. An optical port is positioned within the housing between the Raman probe and the standard reference material relative to the central axis. The optical port includes a window.

An imaging target for characterization of an optical system has a structure, formed on a substrate, wherein the structure has a base level and has one or more staging surfaces spaced apart from the base level and disposed over a range of distances from the base level; and one or more localized light sources disposed along the one or more staging surfaces of the structure and configured to direct light through or from the structure.

A solid fluorescence standard that can be used to calibrate and/or normalize a device (e.g., a scientific instrument) that is configured for generating and collecting fluorescence data. A fluorescence standard disclosed herein includes an adhesive (e.g., a low viscosity, substantially optically transparent, solvent-free, radiation curable adhesive, such as, but not limited to, a UV curable adhesive), and a selected quantity of fluorescent particles (e.g., quantum dots) dispersed in the adhesive. The adhesive and the fluorescent particles are mixed together and disposed in a sample well. The adhesive is then cured and solidified, which yields a solid fluorescence standard in the well.

To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. While illuminating respective distinctly patterned regions, respective instances of imaging of the respective distinctly patterned regions are performed using a TDI sensor in the inspection tool. While performing the respective instances of imaging, a reference intensity detector is used to measure reference intensities of EUV light collected from the photomask. Based on the results of the respective instances of imaging and the measured reference intensities of EUV light, linearity of the TDI sensor is determined.