An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.

Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photomask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects.

Disclosed herein is an ion analysis instrument combining a chromatographic or other separation device for separating gaseous analyte material according to retention time with an ultra-violet (UV) spectrometer or detector for obtaining ultra-violet spectral data of at least a portion of the analyte material separated in said chromatographic or other separation device and a mass and/or ion mobility spectrometer for obtaining mass and/or ion mobility spectral data of ions generated from at least a portion of the analyte material separated in said chromatographic or other separation device. This instrument is able to provide highly orthogonal multidimensional data sets.

Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes first detector(s) configured to detect light having one or more wavelengths shorter than 190 nm emitted from a light source at one or more first angles mutually exclusive of one or more second angles at which the light is collected from the light source by an optical system for illumination of a specimen and to generate first output responsive to the light detected by the first detector(s). In addition, the system includes a control subsystem configured for determining one or more characteristics of the light at one or more planes in the optical system based on the first output.

Apparatus and methods for complex imaging reflectometry and refractometry using at least partially coherent light. Quantitative images yield spatially-dependent, local material information about a sample of interest. These images may provide material properties such as chemical composition, the thickness of chemical layers, dopant concentrations, mixing between layers of a sample, reactions at interfaces, etc. An incident beam of VUV wavelength or shorter is scattered off of a sample and imaged at various angles, wavelengths, and/or polarizations. The power of beam is also measured. This data is used to obtain images of a sample's absolute, spatially varying, complex reflectance or transmittance, which is then used to determine spatially-resolved, depth-dependent sample material properties.

A method and system for testing a liquid sample for an organic compound is disclosed, the method including the steps of collecting the liquid sample from a liquid source; transmitting light having a wavelength of between about 190 nanometers and about 310 nanometers into the liquid sample; measuring absorption/transmission of the light by the organic compound in the liquid sample; and determining a concentration of the organic compound within the liquid sample based on the absorption/transmission of the light by the organic compound. The system can include a spectrophotometer for measuring the absorption of UV light by the organic compound, an ion exchange column for removing ion contaminants from the liquid sample, and a vacuum degasser unit for removing gases and other impurities from the liquid sample.

Methods and systems for performing high throughput spectroscopic measurements of semiconductor structures at mid-infrared wavelengths are presented herein. A Fourier Transform Infrared (FTIR) spectrometer includes one or more measurement channels spanning a wavelength range between 2.5 micrometers and 12 micrometers. The FTIR spectrometer measures a target at multiple different angles of incidence, azimuth angles, different wavelength ranges, different polarization states, or any combination thereof. In some embodiments, illumination light is provided by a laser sustained plasma (LSP) light source to achieve high brightness and small illumination spot size. In some embodiments, FTIR measurements are performed off-axis from the direction normal to the surface of the wafer. In some embodiments, a Stirling cooler extracts heat from the detector of an FTIR spectrometer. In another aspect, measurements performed by one or more spectrometer measurement channels are combined with measurements performed by a mid-infrared FTIR spectrometer channel to characterize high aspect ratio structures.

A system and method for performing four dimensional multicolor nanotomography with high harmonics and attosecond pulses to attain spectrally resolved absorption data about the three-dimensional volumetric structure of a sample are disclosed. Also disclosed are embodiments of the system and method that have been adapted to perform four dimensional multicolor nanotomography absorption and index of refraction data about the three-dimensional volumetric structure of a sample, to perform five dimensional multicolor nanotomography with high harmonics and attosecond pulses to obtain spectrally resolved absorption data about the three-dimensional volumetric structure and temporal dynamics of the sample, to perform five dimensional multicolor nanotomography to obtain spectrally resolved absorption and index of refraction data about the three-dimensional volumetric structure and temporal dynamics of the sample, and to perform Fourier-domain Optical Coherence Tomography.

In one embodiment, an improved gas analysis system having a gas flow cell is provided. In another embodiment an improved gas flow cell is provided. As disclosed herein, dead volumes in a gas flow channel of a gas flow cell may be minimized through the use of one or more additional gas inlets. In one embodiment, an additional gas inlet is located between an analyte gas inlet and a light entrance optical coupling of the gas flow cell. In another embodiment, an additional gas inlet is located between an analyte gas outlet and a light exit optical coupling of the gas flow cell. In addition, enclosed regions may be formed adjacent seals of the gas flow channel of the gas flow cell. The enclosed regions may be evacuated and/or purged so as to minimize the passage of contaminants through the seals into the gas flow channel.

Methods, apparatus, and processes which use Extreme ultraviolet radiation (EUV) and/or soft X-ray wavelengths to read, image, edit, locate, identify, map, alter, delete, repair and sequence genes are described. An EUV scanning tool which allows high throughput genomic scanning of DNA, RNA and protein sequences is also described. A database which records characteristic absorption spectra of gene sequences is also described.