Provided is a lithographic printing plate precursor having an aluminum support and an image-recording layer formed on the aluminum support, in which the image-recording layer contains resin particles A that have an ethylenically unsaturated group and a compound B that has an ethylenically unsaturated group other than the resin particles A and has an ethylenically unsaturated bond valence of 1.5 mmol/g or more. Also provided are a method for preparing lithographic printing plate or a lithographic printing method using the lithographic printing plate precursor.

An aspect of the present disclosure relates to a photosensitive resin composition containing a binder polymer, a photopolymerizable compound, and a photopolymerization initiator, in which the binder polymer includes a structural unit derived from a (meth)acrylate compound having a dicyclopentanyl group, and a weight molecular weight of the binder polymer is 7500 to 23000.

Embodiments in accordance with the present invention encompass compositions comprising an organoruthenium compound, a photoacid generator, a photosensitizer, one or more epoxy group containing olefinic monomers. The compositions of this invention may additionally contain one or more olefinic monomers. The compositions undergo simultaneous ring open metathesis polymerization (ROMP) and cationic polymerization when exposed to a suitable actinic radiation to form a substantially transparent film. The compositions of this invention are stable at room temperature for several days to several months and undergo mass polymerization only when subjected to suitable actinic radiation. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films having various opto-electronic properties. More specifically, the compositions of this invention undergo much faster mass polymerization and exhibit superior thermo-mechanical properties when compared with the compositions containing only the olefinic monomers. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, sealants, adhesives, among others.

Disclosed and claimed herein are photoimageable dielectric compositions for dielectric passivation layers, dielectric protection layers as well as dielectric redistribution layers for use in the manufacture of semiconductors, semiconductor packages and circuit board constructions. More specifically it relates to photoimageable polymers containing vinyl groups capable of being crosslinked during processing and post cured at lower temperatures and shorter times than conventional dielectric materials. The processed compositions are characterized by low dielectric constants and low dissipation factors as well as low moisture uptake, chemical and thermal stability, flexibility and excellent HAST (Highly Accelerated Stress Test) and TCT (Thermal Cycling Test) results. The invention also relates to low dk/df dielectric compositions that are not photoimageable

The invention relates to an imageable coating layer, thermal negative-working lithography printing plate, and platemaking method. The coating layer includes constituents in parts by weight: a radically polymerizable compound 20-60 parts, a radiation-absorbing compound 0.5-12 parts, a free radical initiator 1-25 parts, a binding agent 10-70 parts, and a development accelerator 0.5-15 parts. The platemaking method includes the steps: S1, preparing a printing plate precursor that includes a substrate having a hydrophilic surface or is provided with a hydrophilic layer and imageable coating layer covering the substrate; S2, patternedly exposing the printing plate precursor, forming an exposed area and an unexposed area; and S3, removing the unexposed area via a development process. The employment of the imageable coating layer and the plate making method allows the implementation of a flexible development process of “on-press development” or “off-press development” and produces a printing plate provided with great printing performance.

IR-sensitive lithographic printing plate precursors provide a stable print-out image using a unique IR-sensitive image-recording layer. The IR radiation-sensitive layer includes: (1) a free radical initiator composition with an electron-donating agent and one or more iodonium cations; (2) a free radically polymerizable composition; and (3) a color-changing compound of Structure (I) having an indene ring in the conjugated chain between the aromatic terminal groups. The IR radiation-sensitive composition and layer also contains one or more borate ions such that the molar ratio of one or more borate ions to the one or more iodonium ions is at least 0.5:1. After IR imaging, these precursors exhibit desirable printout images both fresh and after dark storage. The precursors can be developed on-press.

A chemically amplified resist composition comprising a base polymer and a quencher in the form of an amine compound of specific structure is provided. The resist composition has a high sensitivity and forms a pattern with a high resolution and improved LWR, independent of whether it is of positive or negative tone.

Provided are: a lithographic printing plate precursor having a support and an image-recording layer on the support, in which the image-recording layer contains an onium polymerization initiator, a borate compound, an infrared absorber, a chromogenic agent, and a compound A which is an onium salt formed of a cation having a shape index lower than a shape index of a cationic moiety of the onium polymerization initiator; a method of preparing a lithographic printing plate using the lithographic printing plate precursor; and a lithographic printing method.

A chemically amplified positive-type photosensitive resin composition in which the acid generator included has excellent solubility in a solvent and with which a resist pattern having excellent mask linearity is easily formed; a photosensitive dry film having a photosensitive layer formed from the composition; a method of manufacturing the photosensitive dry film; a method of manufacturing a patterned resist film using the composition; and a compound and an acid generator which can be added to the composition. The composition includes an acid generator which generates acid when irradiated with an active ray or radiation, and a resin whose solubility in alkali increases under action of an acid.

A fluorenylaminoketone photoinitiator, a preparation method thereof, and a UV photocurable composition containing same. The photoinitiator has a compound having a structure as shown in general formula (I) or a derivative compound thereof. The fluorenylaminoketone photoinitiator may effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and may also have high sensitivity and good deep-layer curing. It has very good promotion effect on popularization and application of photocurable compositions, particularly colored ink systems, in the field of photocuring. A UV photocurable composition containing such a fluorenylaminoketone photoinitiator can have an advantage in terms of high sensitivity, no residue after development, good pattern integrity, no or little odor of coating layers after curing, or excellent yellowing resistance.