Provided are: a composition for forming an underlayer film in an imprinting method, which includes a high-molecular-weight compound having a polymerizable functional group and a monomer having a plurality of crosslinking functional groups capable of being bonded to the polymerizable functional group, and in which a Hansen solubility parameter distance, which is a difference between a Hansen solubility parameter of the high-molecular-weight compound and a Hansen solubility parameter of the monomer, is 5.0 or less, and regarding the two crosslinking functional groups among the plurality of crosslinking functional groups, the number of atoms, which constitute a shortest atom chain mutually linking crosslinking points in the respective crosslinking functional groups, is 7 or more; a laminate including a layer formed of the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, in which a semiconductor element is manufactured using a pattern obtained by a pattern producing method.

Provided are: a composition for forming a pattern, which contains a polymerizable compound, a photopolymerization initiator, and a sensitizer containing two or more of at least one kind of atom selected from the group consisting of a nitrogen atom and a sulfur atom, in which a length of a specific atom chain from one atom to another atom among the two or more atoms is 2 or 3 in terms of the number of atoms; a kit to which the composition for forming a pattern is applied; a cured film; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.

A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine.

A method of fabricating a thin film structure includes printing, using an electrohydrodynamic jet (e-jet) printing apparatus, a first layer comprising a first liquid ink, such that the first layer is supported by a substrate, curing the first layer; printing, using the e-jet printing apparatus, a second layer comprising a second liquid ink, such that the second layer is supported by the first layer, and curing the second layer.

A substrate, a display panel, and a substrate manufacturing method are proposed. The substrate includes a base layer; partitioning walls located on the base layer and dividing the base layer into a plurality of pixel regions, and patterns located in each of the pixel regions of the base layer, and guiding spread of a liquid drop discharged to the base layer.

Provided is a curable water-based composition including water, a polymerizable compound (A), and a polymerization initiator (C). The polymerizable compound (A) contains an acrylamide compound (A1) represented by General formula (A1) below.

##STR00001##

In the General formula (A1), X represents an alkylene group containing from 1 through 6 carbon atoms, and Y represents a group represented by General formula (A1a) below or General formula (A1b) below,

##STR00002##

In the General formula (A1a), R.sup.1 represents an alkyl group containing from 1 through 10 carbon atoms, and * represents a bonding site with X,

##STR00003##

In the General formula (A1b), R.sup.1 represents an alkyl group containing from 1 through 10 carbon atoms, and * represents a bonding site with X.

A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch-resist mask.

A method of fabricating a thin film structure includes printing, using an electrohydrodynamic jet (e-jet) printing apparatus, a first layer comprising a first liquid ink, such that the first layer is supported by a substrate, curing the first layer; printing, using the e-jet printing apparatus, a second layer comprising a second liquid ink, such that the second layer is supported by the first layer, and curing the second layer.

An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.

A method of creating an image film negative capable of masking non-image areas of one or more layers of liquid photopolymer during a step of imagewise exposing the one or more layers of liquid photopolymer to actinic radiation. The method includes the steps of (a) providing an image film negative comprising a negative of an image on the image film negative, wherein the negative of the image comprises a pattern of opaque areas; and (b) inkjet printing a filtering layer on portions of the image film negative not covered by the pattern of opaque areas, wherein the portions of the image film negative comprise portions where it is desirable to modulate intensity of actinic radiation in a subsequent exposure step.