Patent classifications
G03F7/2018
APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER
Systems and methods are provided for adjusting a fluid dispenser for depositing drops of formable material. According to embodiments, a system obtains an image of a substrate including a film formed on the substrate by curing the formable material deposited by a first dispenser and a second dispenser. Intensity information is obtained for pixels of the image and a difference is determined between intensity values from a portion of the substrate on which the first dispenser deposited drops and intensity values from a portion on which the second dispenser deposited drops, the intensity values corresponding to a region of the substrate associated with a target thickness. Adjustments based on the intensity values are made to change a drop volume and a drop density for nozzles of the first dispenser and nozzles of the second dispenser.
Quantum dot, curable composition comprising the same, cured layer using the composition, color filter including the cured layer, display device including the cured layer and method of manufacturing the cured layer
A quantum dot surface-modified with a ligand, a non-solvent curable composition including the quantum dot, a solvent-based curable composition including the quantum dot, a cured layer manufactured utilizing the curable composition, a color filter including the cured layer, a display device including the color filter, and a method of manufacturing the cured layer are disclosed.
METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE
A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch-resist mask.
LIQUID EJECTION METHOD, LIQUID EJECTION APPARATUS, IMPRINT METHOD, AND IMPRINT APPARATUS
A liquid ejection method includes an ejection step for ejecting liquid from a liquid ejection head to a substrate such that an ejection pattern is formed on the substrate, a step for correcting a control value for a drive unit for each ejection nozzle of the liquid ejection head on the basis of a relation with another ejection nozzle in the ejection step, and a step for performing the ejection step a plurality of times by using the corrected control value while relatively moving the liquid ejection head and the substrate such that a drop pattern constituted by a plurality of the ejection patterns is formed in an ejection region on the substrate. In the ejection step for forming a first ejection pattern, a second ejection pattern different from the first ejection pattern is formed on the substrate.
CURABLE COMPOSITION, FILM FORMING METHOD, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD
A curable composition contains a polymerizable compound, a photopolymerization initiator, and a solvent, wherein the curable composition has a viscosity of not less than 2 mPa.Math.s and not more than 60 mPa.Math.s at 23 C., the curable composition in a state in which the solvent is removed has a viscosity of not less than 30 mPa.Math.s and not more than 10,000 mPa.Math.s at 23 C., content of the solvent to the whole curable composition is not less than 5 vol % and not more than 95 vol %, and the polymerizable compound contains at least a compound having a plurality of cyclic structures, in which at least one of the cyclic structures is an aromatic structure or an aromatic heterocyclic structure.
Photosensitive ink composition, cured product, display panel, and method for producing cured product
A liquid photosensitive ink composition capable of forming a cured product with a high refractive index and a high transparency, a cured product of the photosensitive ink composition, a display panel having a film consisting of the cured product, and a method for producing the cured product using the photosensitive ink composition. In a photosensitive ink composition including a photopolymerizable compound, and a photopolymerization initiator, a sulfide compound having specific structure and a (meth)acrylate compound having specific structure are used as the photopolymerizable compound, and a phosphine oxide compound and an oxime ester compound are used as the photopolymerization initiator.
MATERIAL KIT, CURABLE COMPOSITION, FILM FORMING METHOD, AND ARTICLE MANUFACTURING METHOD
A material kit includes a curable composition, and a layer forming composition configured to form an adhesion layer that adheres a substrate and the curable composition. The curable composition contains a polymerizable compound, a photopolymerization initiator, and a solvent. A contact angle of the curable composition to the adhesion layer is not more than 1.8[], and the contact angle of a composition in a state in which the solvent is removed from the curable composition to the adhesion layer is not less than 11[] and not more than 19[].
NANOIMPRINT LITHOGRAPHY MASK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
A method of manufacturing a semiconductor device includes forming a resist layer over a substrate and contacting the resist layer with a mask. The mask includes: a device region including a device pattern at a first level, an overlapping region surrounding the device region and having a light absorption material at a second level, and a peripheral region surrounding the device region and the overlapping region, and including a light blocking material at a third level, wherein the first, second, and third levels are at different positions. The resist layer is exposed to actinic radiation through the mask. The mask is removed from the resist layer, and portions of the resist layer not exposed to the actinic radiation are removed.
Apparatus and method for calibrating a fluid dispenser
Systems and methods are provided for adjusting a fluid dispenser for depositing drops of formable material. According to embodiments, a system obtains an image of a substrate including a film formed on the substrate by curing the formable material deposited by a first dispenser and a second dispenser. Intensity information is obtained for pixels of the image and a difference is determined between intensity values from a portion of the substrate on which the first dispenser deposited drops and intensity values from a portion on which the second dispenser deposited drops, the intensity values corresponding to a region of the substrate associated with a target thickness. Adjustments based on the intensity values are made to change a drop volume and a drop density for nozzles of the first dispenser and nozzles of the second dispenser.