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Patent classifications
G
PHYSICS
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G03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
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7/00
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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G03F7/70
Microphotolithographic exposure; Apparatus therefor
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G03F7/708
Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
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G03F7/70858
Environment aspects, e.g. pressure of beam-path gas, temperature
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G03F7/70866
of mask or workpiece
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G03F7/70875
Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
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