A gas supply system according to the present disclosure includes a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes. The gas supply system also includes a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes. The gas supply system further includes a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole to correspond to the first gas discharge hole.

An example valve includes: a first port configured to be fluidly coupled to an actuator; a second port configured to be fluidly coupled to a reservoir; a third port configured to provide an output pilot fluid signal and receive an input pilot fluid signal; a fourth port configured to be fluidly coupled to a source of fluid; a pilot poppet configured to be subjected to a first fluid force of fluid received at the first port and configured to be subjected to a second fluid force of the input pilot fluid signal; a solenoid actuator sleeve that is axially movable between an unactuated state and an actuated state; and at least one setting spring configured to apply a biasing force on the pilot poppet.

Embodiments are described herein to monitor and synchronize dispense systems for processing systems. For one embodiment, pressure and flow rate sensors are used to determine a delay between a flow change event and an increase in flow rate, and this delay is used to detect defects or conditions within the dispense system. For one embodiment, dispense system operation is synchronized using flow rate sensors. For one embodiment, simulation models or complex dispense profiles based upon combined pressure/flow/spin/concentration sensor data are used to enable complex process recipes. For one embodiment, dispense-to-dispense pressure and/or flow rate measurements are used to detect dispense parameters and defects. For one embodiment, cameras and image processing are used to detect flow rates from the dispense nozzle, and dispense-to-dispense measurements are used to detect dispense parameters and defects. One or more of the disclosed embodiments can be used in processing systems for microelectronic workpieces.

Embodiments are described herein to monitor and synchronize dispense systems for processing systems. For one embodiment, pressure and flow rate sensors are used to determine a delay between a flow change event and an increase in flow rate, and this delay is used to detect defects or conditions within the dispense system. For one embodiment, dispense system operation is synchronized using flow rate sensors. For one embodiment, simulation models or complex dispense profiles based upon combined pressure/flow/spin/concentration sensor data are used to enable complex process recipes. For one embodiment, dispense-to-dispense pressure and/or flow rate measurements are used to detect dispense parameters and defects. For one embodiment, cameras and image processing are used to detect flow rates from the dispense nozzle, and dispense-to-dispense measurements are used to detect dispense parameters and defects. One or more of the disclosed embodiments can be used in processing systems for microelectronic workpieces.

A sensor system includes a sensor including a sensor window; a nozzle aimed at the sensor window; a supply line to supply fluid to the nozzle; a primary reservoir to supply fluid to the supply line; a first valve actuatable to inject fluid from a first reservoir into the supply line; a second valve actuatable to inject fluid from a second reservoir into the supply line; a third valve actuatable to inject fluid from a third reservoir into the supply line; and a computer communicatively coupled to the sensor and the valves. The computer is programmed to actuate the first valve in response to determining a first condition based on data from the sensor, actuate the second valve in response to determining a second condition based on data from the sensor, and actuate the third valve in response to determining a third condition based on data from the sensor.

An apparatus to distribute pressurized fluid from one or more sources to multiple wellbores. The apparatus includes a manifold having at least two inlets and at least two outlets. Pressurized fluid is brought into the manifold from opposing directions so that the fluid from one inlet will impinge upon the fluid from the other inlet thereby deenergizing the fluid. Additionally, the manifold is configured such that the cross-sectional area of the inlets is less than the cross-sectional area of the manifold thereby decreasing velocity minimizing the kinetic energy available to erode or otherwise damage equipment, while providing a pressure decrease as the fluid enters the manifold. The outlets are configured such that the cross-sectional area of the outlets providing fluid to a single wellbore is greater than or equal to the cross-sectional area of the inlets such that no pressure increase occurs within the manifold or the outlets as the fluid exits the manifold. Additional velocity reduction enhancements may include angled or camp third turns between the inlet and the manifold or the manifold and an outlet.

A gas supply system includes a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes, a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes, and a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole to correspond to the first gas discharge hole.

A system for monitoring and controlling a flow of fluid in an environment and a method of using the system to control the flow of fluid in the environment. The system comprises a main valve positioned at an entry point of the environment. The main valve permits fluid to be discharged into the environment upon receipt of an authorized request to a controller from one or more authorizing signaling devices. The controller communicates with the authorizing devices and processes signals from the authorizing signaling device to control the flow of fluid in the environment. The system may also comprise one or more monitoring signaling devices positioned in the environment intermediate the main valve and an authorizing signaling device.

A control assembly that is configured to operate large, heavy duty flow controls. The control assembly may include a main support and a thin plate disposed on the main support, the thin plate having four sides forming a mounting surface, the thin plate also having lateral slots that extend lengthwise in a first direction between two of the sides and are arranged so adjacent lateral slots are spaced apart from one another in a second direction perpendicular to the first direction.

A frac zipper manifold bridge connector comprises two bridge spools for connecting a well configuration unit of a frac zipper manifold to a frac tree of a wellhead. The connector comprises multiple connections involving threaded flanges, such that the orientation of the bridge spools may be adjusted to ensure that they are correctly aligned with the frac tree. The bridge connector further comprises one or more flow diverters to decrease turbulence and reduce erosion.