A starter air valve (SAV) system can include a pressure actuated SAV actuator configured to be operatively connected to a SAV and a first pressure valve configured to selectively allow pressure from a pressure source to the SAV actuator when in fluid communication with the SAV actuator. The first pressure valve can be a pulse-width modulation solenoid valve configured to provide a duty cycle of pressure from the pressure source to the SAV actuator.

A dual section module with mass flow controllers, for processing wafers, includes: dual process sections integrated together; at least one mass flow controller (MFC) each shared by the dual process sections and provided in a gas line branching into two gas lines, at a branching point, connected to the respective interiors of the dual process sections and arranged symmetrically between the dual process sections; and at least one mass flow controller (MFC) each unshared by the dual process sections and provided in a gas line connected to the interior of each dual process section.

A system for monitoring and controlling a flow of fluid in an environment and a method of using the system to control the flow of fluid in the environment. The system comprises a main valve positioned at an entry point of the environment. The main valve permits fluid to be discharged into the environment upon receipt of an authorized request to a controller from one or more authorizing signaling devices. The controller communicates with the authorizing devices and processes signals from the authorizing signaling device to control the flow of fluid in the environment. The system may also comprise one or more monitoring signaling devices positioned in the environment intermediate the main valve and an authorizing signaling device.

The present disclosure provides a system and method for odorizing natural gas flowing through a distribution pipeline. The system includes a bypass line adjacent to a distribution pipeline, wherein bypass gas flows through the bypass line and an odorant tank connected to the bypass line, and into the distribution pipeline; a high-flow control valve and a low-flow control valve in the bypass line, wherein bypass gas flows through the odorant tank into the distribution pipeline when the high-flow control valve or the low-flow control valve is open; and a programmable logic controller connected to the high-flow and low flow control valve; wherein the programmable logic controller opens the high-flow or low-flow control valve for a predetermined dwell time proportional to an amount of bypass gas needed to odorize gas in the distribution pipeline each time that a preselected quantity of gas flows through the distribution pipeline.

The present disclosure provides a system and method for odorizing natural gas flowing through a distribution pipeline. The system includes a bypass line adjacent to a distribution pipeline, wherein bypass gas flows through the bypass line and an odorant tank connected to the bypass line, and into the distribution pipeline; a high-flow control valve and a low-flow control valve in the bypass line, wherein bypass gas flows through the odorant tank into the distribution pipeline when the high-flow control valve or the low-flow control valve is open; and a programmable logic controller connected to the high-flow and low flow control valve; wherein the programmable logic controller opens the high-flow or low-flow control valve for a predetermined dwell time proportional to an amount of bypass gas needed to odorize gas in the distribution pipeline each time that a preselected quantity of gas flows through the distribution pipeline.

A reference volume for use with pressure change flow rate measurement apparatus has an internal structure comprising elements with cross section and length comparable to the cross section and length of adjacent interstitial fluid regions. The reference volume may have one or more heat conduction elements exterior to and in good thermal contact with a corrosion resistant material that defines the internal fluid holding region.

A self-correcting pressure-based mass flow control apparatus includes outlet pressure sensing to enable correction for non-ideal operating conditions. Further the mass flow control apparatus having a fluid pathway, a shutoff valve in the fluid pathway, a reference volume in the fluid pathway, a first pressure measuring sensor in fluid communication with the reference volume, a first temperature measuring sensor providing a temperature signal indicative of the fluid temperature within the reference volume, a proportional valve in the fluid pathway, and a second pressure measuring sensor in fluid communication with the fluid pathway.

A system comprises a flow restrictor connected to a fluid flow path and located upstream from a chamber. The flow restrictor comprises an adjustable flow restriction aperture defined by the flow path region between a first element and a second element of the flow restrictor, and a drive unit configured to adjust the relative positions of the first element, second element or both to modify the fluid flow path across the aperture. The first or second element provides a curved boundary in the aperture flow path to form a converging region, a region of closest approach and a diverging region, within the flow path. Flow rate may be determined using a reference volume upstream from the flow restrictor.

Controlling flow of gas in a gas pipeline network, wherein flow within each pipeline segment is associated with a direction (positive or negative). Minimum and maximum signed flow rates are calculated for each pipeline segment constituting lower and upper bounds, respectively, for flow in each pipeline segment. A nonlinear pressure drop relationship is linearized within the lower and upper flow bounds to create a linear pressure drop model for each pipeline segment. A network flow solution is calculated, using the linear pressure drop model, and includes flow rates for each pipeline segment to satisfy demand constraints and pressures for each of a plurality of network nodes to satisfy pressure constraints. Lower and upper bounds on the pressure constraint comprise a minimum delivery pressure and a maximum operating pressure, respectively. The network flow solution is associated with control element setpoints used by a controller to control one or more control elements.

An untreated semiconductor wafer is transferred from an indexer unit to a treatment chamber via a first cool chamber and a transfer chamber in this order. A treated semiconductor wafer subjected to heating treatment in the treatment chamber is transferred to the indexer unit via the transfer chamber and the first cool chamber in this order. For a predetermined time after an untreated semiconductor wafer is transferred into the first cool chamber, nitrogen gas is supplied into the first cool chamber at a large supply flow rate and exhausting from the first cool chamber is performed at a large exhaust flow rate. An oxygen concentration in the first cool chamber sharply decreases to enable the semiconductor wafer after the heating treatment to be prevented from being oxidized.