A method of writing data to a memory array of three-terminal memory cells includes simultaneously programming a first subset of memory cells in a first column of the memory array to a first logic level by activating a first select line of the first column and a first bit line of the first column, and simultaneously programming a second subset of memory cells in the first column to the first logic level by activating the first select line and a second bit line of the first column.

A memory is provided which comprises a capacitor including non-linear polar material. The capacitor may have a first terminal coupled to a node (e.g., a storage node) and a second terminal coupled to a plate-line. The capacitors can be a planar capacitor or non-planar capacitor (also known as pillar capacitor). The memory includes a transistor coupled to the node and a bit-line, wherein the transistor is controllable by a word-line, wherein the plate-line is parallel to the bit-line. The memory includes a refresh circuitry to refresh charge on the capacitor periodically or at a predetermined time. The refresh circuit can utilize one or more of the endurance mechanisms. When the plate-line is parallel to the bit-line, a specific read and write scheme may be used to reduce the disturb voltage for unselected bit-cells. A different scheme is used when the plate-line is parallel to the word-line.

Tracking circuitry for a memory device is disclosed. The tracking circuitry includes an inverter, a level shifter, delay circuitry, and a logic gate. The inverter is configured to receive a first clock signal and generate an inverted clock signal. The level shifter is configured to receive the first clock signal and the inverted clock signal and generate a level shifted clock signal. The delay circuitry is configured to receive the level shifted clock signal and generate an inverted level shifted clock signal. The logic gate comprises a first input configured to receive the first clock signal and a second input configured to receive the inverted level shifted clock signal. The logic gate is configured to generate a second clock signal based on the first clock signal and the inverted level shifted clock signal.

An oxide semiconductor based FRAM is provided in the present invention, including a substrate, a write electrode on the substrate, a ferroelectric dielectric layer on the write electrode, an oxide semiconductor layer on the ferroelectric dielectric layer, a source and a drain respectively on the oxide semiconductor layer and spaced apart at a distance, wherein the source and the drain are further connected to a plate line and a bit line respectively, a gate insulating layer on the source, the drain and the oxide semiconductor layer, and a word line on the gate insulating layer, wherein the word line, the oxide semiconductor layer, the ferroelectric dielectric layer and the write electrode overlapping each other in a direction vertical to the substrate.

Provided are a non-volatile memory device and a method of operating the same. The non-volatile memory device includes a substrate, a plurality of word lines extending in a first direction on the substrate, a plurality of ferroelectric patterns respectively provided on the word lines, a blocking insulating film covering the ferroelectric patterns, a plurality of bit line pairs including a first bit line and a second bit line extending in a second direction crossing the word lines and the ferroelectric patterns on the blocking insulating film and intersecting the first direction, and a channel pattern provided between the first bit line and the second bit line of each of the bit line pairs on the blocking insulating film, wherein the channel pattern has an ambipolar conduction characteristic.

Described is a low power, high-density a 1T-1C (one transistor and one capacitor) memory bit-cell, wherein the capacitor comprises a pillar structure having ferroelectric material (perovskite, improper ferroelectric, or hexagonal ferroelectric) and conductive oxides as electrodes. In various embodiments, one layer of the conductive oxide electrode wraps around the pillar capacitor, and forms the outer electrode of the pillar capacitor. The core of the pillar capacitor can take various forms.

Dual-precision analog memory cells and arrays are provided. In some embodiments, a memory cell, comprises a non-volatile memory element having an input terminal and at least one output terminal; and a volatile memory element having a plurality of input terminals and an output terminal, wherein the output terminal of the volatile memory element is coupled to the input terminal of the non-volatile memory element, and wherein the volatile memory element comprises: a first transistor coupled between a first supply and a common node, and a second transistor coupled between a second supply and the common node; wherein the common node is coupled to the output terminal of the volatile memory element; and wherein gates of the first and second transistors are coupled to respective ones of the plurality of input terminals of the volatile memory element.

Methods, systems, and devices for memory array with multiplexed select lines are described. In some cases, a memory cell of the memory device may include a storage component, a first transistor coupled with a word line, and a second transistor coupled with a selection line to selectively couple the memory cell with a digit line. The selection line may be provided in parallel to each digit line for multiplexing the digit lines toward a sense amplifier while a plurality of drivers, one for each selection line, may be provided in a staggered configuration under the memory array and split in even drivers and odd drivers for corresponding adjacent tiles of the memory array.

Methods, systems, and devices for deck-level signal development cascodes are described. A memory device may include transistors that support both a signal development and decoding functionality. In a first operating condition (e.g., an open-circuit condition), a transistor may be operable to isolate first and second portions of an access line based on a first voltage applied to a gate of the transistor. In a second operating condition (e.g., a signal development condition), the transistor may be operable to couple the first and second portions of the access line and generate an access signal based on a second voltage applied to the gate of the transistor. In a third operating condition (e.g., a closed-circuit condition), the transistor may be operable to couple the first and second portions of the access line based on applying a third voltage greater than the second voltage to the gate of the transistor.

A semiconductor device includes a substrate including, in a first area, a first semiconductor channel and coupled to a portion of a first memory layer, and first, second, and third conductive structures. The first and third conductive structures are coupled to end portions of a sidewall of the first semiconductor channel, with the second conductive structure coupled to a middle portion of the sidewall. The semiconductor device includes, in a second area, a second semiconductor channel and coupled to a first portion of a second memory layer, and fourth and fifth conductive structures. The fourth and fifth conductive structures are coupled to end portions of a sidewall of the second semiconductor channel, with no vertically extending conductive structure interposed between the fourth and fifth conductive structures.