A halftone mask, a manufacturing method of a display panel, and an ultraviolet mask are disclosed. The halftone mask includes a substrate, a plurality of light-blocking parts, and a plurality of semi-transmissive parts. Wherein, the semi-transmissive parts correspond to a thinned patterning area of a first target object and a hollowed patterning area of a second target object.

An FFS mode array substrate and a manufacturing method thereof are provided. The FFS mode array substrate has: a second insulation layer deposited on a base layer, wherein a first through hole and a second through hole are formed in the second insulation layer; a pixel electrode layer deposited on the second insulation layer, wherein the pixel electrode layer is provided with a plurality of pixel electrodes; and a third insulation layer formed on a source electrode, a drain electrode, the pixel electrodes, and the second insulation layer.

Provided is a method to manufacture a liquid crystal display device in which a contact hole for the electrical connection of the pixel electrode and one of the source and drain electrode of a transistor and a contact hole for the processing of a semiconductor layer are formed simultaneously. The method contributes to the reduction of a photography step. The transistor includes an oxide semiconductor layer where a channel formation region is formed.

A liquid crystal display device comprising: a substrate; a gate line that is disposed on the substrate and extends in a first direction; a first insulating film that is disposed on the gate line; a semiconductor pattern that is disposed on the first insulating film; a first transparent electrode that is disposed on the semiconductor pattern, and has a first electrode and a second electrode being spaced apart from each other; a second insulating film that is disposed on the first transparent electrode and partially exposes the first electrode; a data line disposed on the second insulating film and extends in a second direction different from the first direction; a second transparent electrode that is disposed on the second insulating film and at least partially overlaps the second electrode; and a connecting electrode in direct contact with a portion of the exposed first electrode and the data line.

To provide a semiconductor device, a liquid crystal display device, and an electronic device which have a wide viewing angle and in which the number of manufacturing steps, the number of masks, and manufacturing cost are reduced compared with a conventional one. The liquid crystal display device includes a first electrode formed over an entire surface of one side of a substrate; a first insulating film formed over the first electrode; a thin film transistor formed over the first insulating film; a second insulating film formed over the thin film transistor; a second electrode formed over the second insulating film and having a plurality of openings; and a liquid crystal over the second electrode. The liquid crystal is controlled by an electric field between the first electrode and the second electrode.

A display substrate is provided. The display substrate includes a gate electrode disposed on a base; a gate insulating layer disposed on the base and covering the gate electrode; a semiconductor layer disposed on the gate insulating layer and overlapping the gate electrode; a source electrode and a drain electrode disposed on the semiconductor layer and connected to the semiconductor layer; a pixel electrode disposed on the gate insulating layer, connected to the drain electrode, and extending from the drain electrode; a common electrode insulated from the pixel electrode and overlapping the pixel electrode; and a semiconductor pattern disposed between the gate insulating layer and the pixel electrode, the semiconductor pattern overlapping the pixel electrode. The semiconductor pattern comprises a same material as the semiconductor layer and extends from the semiconductor layer.

Provided is a liquid crystal panel and a method for etching a liquid crystal panel, the liquid crystal panel including: a first substrate; a second substrate installed at a location facing the first substrate with a liquid crystal layer therebetween; a driving circuit unit connected to the second substrate; and a masking tape integrally surrounding the edges of the first substrate and the second substrate.

Provided is a display panel including a base substrate which includes a display area and a non-display area, a polarizing member disposed on a surface of the base substrate and including a plurality of grid patterns overlapping the display area and a reflective pattern overlapping the non-display area, and a pixel array layer which overlaps the polarizing member and is insulated from the polarizing member, wherein a first height from the surface of the base substrate to an upper surface of the reflective pattern is different from a second height from the surface of the base substrate to upper surfaces of the grid patterns.

A manufacturing method of array substrates, an array substrate, and a display panel are disclosed. The manufacturing method of the array substrate includes: forming a first electrode and a gate electrode on a substrate in sequence; forming an insulation layer, a semiconductor layer and a dielectric layer on the substrates in sequence and forming a first through hole, a second through hole and a third through hole; forming a source electrode, a drain electrode, a second electrode and a third electrode on the dielectric layer, wherein the source electrode and the drain electrode connect to the semiconductor layer respectively, the second electrode connects to the first electrode and the third electrode connects with the drain electrode. In this way, the number of the masks needed during the manufacturing process is decreased. In addition, the manufacturing process is simplified and the cost is reduced.

A method of manufacturing a display panel substrate having a semiconductor element includes a film forming step of forming a thin film, a resist film forming step of forming a positive resist film on the thin film, a first exposure step of selectively exposing a resist film via a photomask including a pattern of the semiconductor element, a second exposure step of selectively exposing the resist film by scanning and irradiating the resist film with light along an outline shape of the display panel substrate, a developing step of developing the resist film to remove the resist film exposed in the first and second exposure steps and form a resist pattern on the thin film, an etching step of etching the thin film using the resist pattern as a mask, and forming a thin-film pattern by selectively removing the thin film, and a peeling step of peeling the resist pattern.