An array substrate for a liquid crystal display (LCD) device includes a common line and gate lines. The array substrate includes a first, second, and third passivation layer and thin film transistors (TFTs). The second passivation layer includes first and second holes respectively corresponding to a drain electrode and the common line. A common electrode on the second passivation layer includes a first opening corresponding to the TFTs and a second opening in the second hole. A drain contact hole through the third and first passivation layers exposes the drain electrode. A first common contact hole through the third passivation layer exposes the common electrode in the second hole. A second common contact hole through the third and first passivation layers exposes the common line, and a pixel electrode includes a third opening and a connection pattern connecting the common electrode to the common line on the third passivation layer.

The embodiments of the present invention provide an array substrate and a method for manufacturing the same. The method includes: forming an ITO film on a substrate; performing an annealing treatment on the substrate; forming a gate metal film on the ITO film; and processing the ITO film and the gate metal film to obtain a common electrode pattern and a gate pattern. In the embodiments of the present invention, after film formation of ITO, an annealing process is performed. Water vapor residue in the ITO film can thus be released, thereby avoiding bumps on the interface between the ITO and other layers, and improving the yield of ADS products.

Disclosed is a method for manufacturing an array substrate, the array substrate and a display device which can reduce manufacturing steps of a color filter process and further reduce manufacturing steps of the display device, thereby saving manufacturing cost and time. The method for manufacturing the array substrate includes: forming a thin film transistor on a base substrate; forming a passivation layer having a via hole on a front side of the thin film transistor and forming a photo spacer on a front side of the passivation layer through a halftone mask patterning process. With this method for manufacturing the array substrate, there is no need to prepare the photo spacer on a back side of the color filter substrate. Therefore, it is possible to reduce manufacturing steps of a color filter process, which in turn further reduces manufacturing steps of the display device, thereby saving manufacturing cost and time.

The present application provides an array substrate, which is divided into a plurality of pixel units, wherein each pixel unit is provided therein with a light filtering structure, the light filtering structure includes a first light shielding part and a second light shielding part, the second light shielding part includes a second light shielding part body and a light transmitting hole penetrating through the second light shielding part body, a light transmitting gap exists between a inner boundary of an orthographic projection of the second light shielding part body on a layer in which the first light shielding part is provided and a boundary of the first light shielding part, a transparent light transmitting space is formed above the first light shielding part, and the light transmitting gap allows light with a predetermined wavelength to transmit therethrough.

A thin film transistor substrate includes a gate electrode on a base substrate, an active pattern on the gate electrode, a source electrode on a first end of the active pattern, a drain electrode on a second end of the active pattern, an organic insulation layer on the source electrode and the drain electrode, and a transparent electrode contacting the drain electrode through a contact opening in the organic insulation layer. The drain electrode is spaced from the source electrode. The organic insulation layer includes a first thickness portion around the contact opening and a second thickness portion adjacent to the first thickness portion. The second thickness portion has a thickness greater than that of the first thickness portion.

A liquid crystal display panel, an array substrate and a manufacturing method for the same are provided. Designing a black matrix for light shielding, and an insulation layer between a pixel electrode and other structures in order to reduce the type and the number of the masks, simplify the manufacturing process and decrease the production cost. Besides, a distance between the black matrix located above a data line and the data line is shorten such that lights of a pixel emitting out through an adjacent pixel is avoided in order to reduce the light leakage at a large viewing angle.

Provided is a liquid crystal panel and a method for etching a liquid crystal panel, the liquid crystal panel including: a first substrate; a second substrate installed at a location facing the first substrate with a liquid crystal layer therebetween; a driving circuit unit connected to the second substrate; and a masking tape integrally surrounding the edges of the first substrate and the second substrate.

An array substrate and a method of manufacturing the same, and a display panel are disclosed. The array substrate includes a substrate, a first metal layer, a first insulating layer, an electrically conductive layer, and a second metal layer. The first metal layer and the second metal layer are electrically connected through a through hole on the first insulating layer and a second conductive portion of the electrically conductive layer, so that a contact resistance between the first. metal layer and the second metal layer can be reduced, a problem of gradient lines likely to occur in a display panel can be overcome, and display quality of the display panel can be improved.

The disclosure provides a photo-etching compensation structure of an array substrate, including a substrate, a base layer, a light-sensitive layer, and a photo-etching compensation pattern layer disposed between the substrate and the base layer. The photo-etching compensation pattern layer includes a plurality of compensation patterns distributed in an array arrangement, and the compensation patterns change a thickness of the base layer along a thickness direction of the substrate, thereby making a thickness of the light-sensitive layer in an area corresponding to the compensation patterns less than a thickness of the light-sensitive layer in a corresponding area around the compensation patterns.

To provide a semiconductor device, a liquid crystal display device, and an electronic device which have a wide viewing angle and in which the number of manufacturing steps, the number of masks, and manufacturing cost are reduced compared with a conventional one. The liquid crystal display device includes a first electrode formed over an entire surface of one side of a substrate; a first insulating film formed over the first electrode; a thin film transistor formed over the first insulating film; a second insulating film formed over the thin film transistor; a second electrode formed over the second insulating film and having a plurality of openings; and a liquid crystal over the second electrode. The liquid crystal is controlled by an electric field between the first electrode and the second electrode.