Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.

A setting method includes setting the conductances of the controllable restrictions of an airborne molecular contamination measurement station. The setting method includes an initial identification step, prior to the carrying-out of an airborne molecular contamination measurement step, and during which the sampling line that has the lowest conductance when the conductance of the controllable restriction of the said sampling line is set to its maximum value is determined, and an initial conductance-setting step prior to the carrying-out of the measurement step and after the initial identification step, and during which the conductances of the controllable restrictions are set to make them correspond to the lowest conductance determined in the initial identification step. Further, a measurement station is provided for measuring airborne molecular contamination.

A controller in a fluid delivery system controls magnitudes of pressure in a first volume and a second volume. The first volume is of a known magnitude. The second volume is of an unknown magnitude and varies. The controller estimates a temperature of gas in the first volume and a temperature of gas in the second volume based on measurements of pressure in the first volume and measurements of pressure in the second volume. The controller then calculates a magnitude of the second volume based on measured pressures of the gases and estimated temperatures of gases in the first volume and the second volume.

The disclosure relates to a method and a device for providing zeotropic refrigerants in which the refrigerant is formed from a refrigerant blend of at least two components, the components being added to a container in the ratio of their respective mass fractions to the refrigerant, and the refrigerant blend being formed in the container, wherein the temperature and/or the pressure in the container is set by means of a control device such that the refrigerant is present exclusively in the gas phase or exclusively in the liquid phase.

An apparatus to distribute pressurized fluid from one or more sources to multiple wellbores. The apparatus includes a manifold having at least two inlets and at least two outlets. Pressurized fluid is brought into the manifold from opposing directions so that the fluid from one inlet will impinge upon the fluid from the other inlet thereby de-energizing the fluid. Additionally, the manifold is configured such that the cross-sectional area of the inlets is less than the cross-sectional area of the manifold thereby decreasing velocity minimizing the kinetic energy available to erode or otherwise damage equipment, while providing a pressure decrease as the fluid enters the manifold. The outlets are configured such that the cross-sectional area of the outlets providing fluid to a single wellbore is greater than or equal to the cross-sectional area of the inlets such that no pressure increase occurs within the manifold or the outlets as the fluid exits the manifold. Additional velocity reduction enhancements may include angled or camp third turns between the inlet and the manifold or the manifold and an outlet.

A method of mixing at N gases is provided. This method includes providing N gas flow meters, including N gas flows, wherein N is 3 or more. Measuring each of the N gas flows, at first predetermined intervals of time, and totaling each of the measured N flows over a second predetermined interval of time. Adding the N measured gas flows, thereby determining the total gas flow at the second predetermined interval of time. Dividing the total gas flow for each of the N gas flows by the total gas flow, thereby determining a cumulative calculated theoretical percentage for each of the N gas flows over the second predetermined interval of time. And sounding an alarm, and/or terminating the N gas flows, if the cumulative calculated theoretical percentage for any of the N gas flows exceeds a predetermined range value.

Another method of mixing at least two gases is provided. This method includes providing a mixture composition control, comprising a predetermined composition input and a composition trim input. Providing N gas flow meters, wherein N is 3 or more. Configuring the N flow meters to adjust the N gas flows to maintain the line pressure at a predetermined value, while maintaining the predetermined composition. Adding the N measured gas flow, thereby determining the total gas flow at the first predetermined intervals of time. Adjusting the composition trim input to vary the composition of the mixed gas, without modifying the predetermined composition input. And sounding an alarm, and/or terminating both the N gas flows, if either of the following exceed a predetermined range value: the instantaneous calculated theoretical percentage for any of the N gas flows, or the cumulative calculated theoretical percentage for any of the N gas flows.

A substrate processing system includes a processing chamber that includes a substrate support positioned therein. The substrate processing system includes a valve system fluidly coupled to the processing chamber and configured to control flow of gas into the processing chamber. The valve system includes a primary flow line and a first gas source flow line fluidly coupled to the primary flow line through a first gas source valve. The valve system includes a second gas source flow line fluidly coupled to the primary flow line through a second gas source valve. The first gas source valve and the second gas source valve are positioned in series within the primary flow line.

A method of mixing at least two gases is provided. This method includes providing a mixture composition control, including a predetermined composition input and a composition trim input. Providing N gas flow meters, including a N gas flows, and N desired gas flow rates determined by the mixture composition control, wherein N is 3 or more. Mixing the N gas flows, thereby producing a mixed gas flow at the predetermined composition and at a line pressure. Configuring the N flow meters to adjust the N gas flows to maintain the line pressure at a predetermined value, while maintaining the predetermined composition. And adjusting the composition trim input to vary the composition of the mixed gas, without modifying the predetermined composition input.

A faucet includes a faucet spout, a communication valve, a first valve cartridge, a second valve cartridge, a solenoid valve, and an induction control circuit. A first input end, a second input end and a third input end of the communication valve are connected to the first valve cartridge, the second valve cartridge and the solenoid valve, respectively. An output end of the communication valve is connected to the faucet spout. The communication valve is provided with a water flow sensor electrically connected to the induction control circuit. The faucet provides a manual mode and an induction mode to control the flow of water and is convenient to use and can prolong its service life.