A substrate processing system includes a processing chamber that includes a substrate support positioned therein. The substrate processing system includes a valve system fluidly coupled to the processing chamber and configured to control flow of gas into the processing chamber. The valve system includes a primary flow line and a first gas source flow line fluidly coupled to the primary flow line through a first gas source valve. The valve system includes a second gas source flow line fluidly coupled to the primary flow line through a second gas source valve. The first gas source valve and the second gas source valve are positioned in series within the primary flow line.

A flow path switching unit switches a flow path to an introduction state for introducing a sample in a sample loop, an analysis state for flowing a mobile phase into a column via the sample loop, or a cleaning state for introducing a cleaning solution into a sample loop. A command execution processing unit executes a plurality of preset control commands. A selection acceptance processing unit accepts a selection as to whether or not to switch the flow path from the analysis state to the cleaning state. In the case in which the selection of switching the flow path from the analysis state to the cleaning state is accepted by the selection acceptance processing unit, the command setting processing unit automatically includes the first switching command for switching the flow path from the analysis state to the cleaning state and the second switching command for returning the flow path from the cleaning state to the analysis state in a plurality of control commands.

A sample catching system for cleaning a drilling fluid in a drilling operation includes a first line having a first entrance valve configured to allow the drilling fluid to flow into the first line, a first chemical sensor for measuring the amount of hydrogen sulfide of the drilling fluid in the first line, and a first sample catch valve configured to allow the drilling fluid to flow out of the first line. The system also includes a second line having a second entrance valve configured to allow the drilling fluid to flow into the second line, a sample catch pump, and a controller configured to determine the amount of hydrogen sulfide is above a predetermined threshold value, and open the second entrance valve to divert drilling fluid intake from the first line to the second line, and close the first entrance valve to stop the drilling fluid from entering the first line.

A controller in a fluid delivery system controls magnitudes of pressure in a first volume and a second volume. The first volume is of a known magnitude. The second volume is of an unknown magnitude and varies. The controller estimates a temperature of gas in the first volume and a temperature of gas in the second volume based on measurements of pressure in the first volume and measurements of pressure in the second volume. The controller then calculates a magnitude of the second volume based on measured pressures of the gases and estimated temperatures of gases in the first volume and the second volume.

A method of self-balancing a plurality of mechanical components within a temperature control unit of an HVAC system. Each mechanical component is adjustable by the controller to vary airflow within the temperature control unit. For each mechanical components, a property is measured. An estimated condition of the mechanical component is calculated based on the measured property and known qualities of the temperature control unit. A desired condition for the mechanical component is determined based on a desired air condition within the HVAC system or building envelope. The estimated condition of the mechanical component is compared to the desired condition of the component. The condition of the mechanical component is changed using a controller to more closely align the estimated condition to the desired condition to achieve the desired indoor air condition. Steps are repeated until the difference between the estimated condition and desired condition is within a threshold value.

An apparatus to distribute pressurized fluid from one or more sources to multiple wellbores. The apparatus includes a manifold having at least two inlets and at least two outlets. Pressurized fluid is brought into the manifold from opposing directions so that the fluid from one inlet will impinge upon the fluid from the other inlet thereby de-energizing the fluid. Additionally, the manifold is configured such that the cross-sectional area of the inlets is less than the cross-sectional area of the manifold thereby decreasing velocity minimizing the kinetic energy available to erode or otherwise damage equipment, while providing a pressure decrease as the fluid enters the manifold. The outlets are configured such that the cross-sectional area of the outlets providing fluid to a single wellbore is greater than or equal to the cross-sectional area of the inlets such that no pressure increase occurs within the manifold or the outlets as the fluid exits the manifold. Additional velocity reduction enhancements may include angled or camp third turns between the inlet and the manifold or the manifold and an outlet.

The flow rate measuring method is performed in a common gas supply system comprising a plurality of gas supply paths each having a first valve, and a gas measuring device formed downstream side of the plurality of gas supply paths, having a pressure sensor, a temperature sensor, and a downstream side second valve. The flow rate measuring method includes: a first step of opening any one of the first valves and the second valve to allow gas to flow, closing the second valve while gas is flowing, and closing the first valve after a predetermined time has elapsed, and then measuring a pressure and a temperature after the first valve has been closed; a second step of opening any one of first valves and the second valve to allow gas to flow, closing the any one of the first valve and the second valve at the same time while gas is flowing, and then measuring a pressure and temperature after the first valve and the second valve have been closed; and a third step of calculating the flow rate in accordance with the pressure and temperature measured in the first step and the pressure and temperature measured in the second step.

Systems for processing articles are essential for semiconductor fabrication. In one method of controlling gas flow, a processing system is provided, the processing system having first and second fluid supplies. The first fluid supply is coupled to a first apparatus for controlling flow and the second fluid supply is coupled to the second apparatus for controlling flow. The first process fluid is then delivered to a process chamber via outlet of the first apparatus for controlling flow. The first process fluid is also bled via a bleed port of the first apparatus for controlling flow. The flow rate of the first process fluid through the bleed port is controlled at a first flow rate which is less than a first threshold.

Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.

A sample catching system for cleaning a drilling fluid in a drilling operation includes a first line having a first entrance valve configured to allow the drilling fluid to flow into the first line, a first chemical sensor for measuring the amount of hydrogen sulfide of the drilling fluid in the first line, and a first sample catch valve configured to allow the drilling fluid to flow out of the first line. The system also includes a second line having a second entrance valve configured to allow the drilling fluid to flow into the second line, a sample catch pump, and a controller configured to determine the amount of hydrogen sulfide is above a predetermined threshold value, and open the second entrance valve to divert drilling fluid intake from the first line to the second line, and close the first entrance valve to stop the drilling fluid from entering the first line.