Provided is a memory macro which allows detection of a fault in a fetch circuit for an address signal which is input. The memory micro includes an address input terminal, a clock input terminal, a memory array and a control unit. The control unit includes a temporary memory circuit which fetches an input address signal which is input into the address input terminal in synchronization with an input clock signal which is input from the clock input terminal and outputs the input address signal as an internal address signal. The memory macro further includes an internal address output terminal which outputs the internal address signal for comparison with the input address signal.

Provided is a memory macro which allows detection of a fault in a fetch circuit for an address signal which is input. The memory micro includes an address input terminal, a clock input terminal, a memory array and a control unit. The control unit includes a temporary memory circuit which fetches an input address signal which is input into the address input terminal in synchronization with an input clock signal which is input from the clock input terminal and outputs the input address signal as an internal address signal. The memory macro further includes an internal address output terminal which outputs the internal address signal for comparison with the input address signal.

A serial array processor may have an execution unit, which is comprised of a multiplicity of single bit arithmetic logic units (ALUs), and which may perform parallel operations on a subset of all the words in memory by serially accessing and processing them, one bit at a time, while an instruction unit of the processor is pre-fetching the next instruction, a word at a time, in a manner orthogonal to the execution unit.

A serial array processor may have an execution unit, which is comprised of a multiplicity of single bit arithmetic logic units (ALUs), and which may perform parallel operations on a subset of all the words in memory by serially accessing and processing them, one bit at a time, while an instruction unit of the processor is pre-fetching the next instruction, a word at a time, in a manner orthogonal to the execution unit.

Systems, apparatuses, and methods related to a memory array data structure for posit operations are described. Universal number (unum) bit strings, such as posit bit string operands and posit bit strings representing results of arithmetic and/or logical operations performed using the posit bit string operands may be stored in a memory array. Circuitry deployed in a memory device may access the memory array to retrieve the unum bit string operands and/or the results of the arithmetic and/or logical operations performed using the unum bit string operands from the memory array. For instance, an arithmetic operation and/or a logical operation may be performed using a first unum bit string stored in the memory array and a second unum bit string stored in the memory array. The result of the arithmetic operation and/or the logical operation may be stored in the memory array and subsequently retrieved.

A memory device includes a memory array having a first memory cell in a first column of the memory array, a second memory cell in the first column of the memory array, a first read bit line extending in a column direction and connected to the first memory cell to read data from the first memory cell, and a second read bit line extending in the column direction and connected to the second memory cell to read data from the second memory cell.

Some embodiments include an integrated assembly having first and second source/drain regions laterally offset from one another. Metal silicide is adjacent to lateral surfaces of the source/drain regions. Metal is adjacent to the metal silicide. Container-shaped first and second capacitor electrodes are coupled to the source/drain regions through the metal silicide and the metal. Capacitor dielectric material lines interior surfaces of the container-shaped first and second capacitor electrodes, A shared capacitor electrode extends vertically between the first and second capacitor electrodes, and extends into the lined first and second capacitor electrodes. Some embodiments include methods of forming integrated assemblies.

Some embodiments include an integrated assembly having first and second source/drain regions laterally offset from one another. Metal silicide is adjacent to lateral surfaces of the source/drain regions. Metal is adjacent to the metal silicide. Container-shaped first and second capacitor electrodes are coupled to the source/drain regions through the metal silicide and the metal. Capacitor dielectric material lines interior surfaces of the container-shaped first and second capacitor electrodes, A shared capacitor electrode extends vertically between the first and second capacitor electrodes, and extends into the lined first and second capacitor electrodes. Some embodiments include methods of forming integrated assemblies.

It is an object to provide a semiconductor having a novel structure. In the semiconductor device, a plurality of memory elements are connected in series and each of the plurality of memory elements includes first to third transistors thus forming a memory circuit. A source or a drain of a first transistor which includes an oxide semiconductor layer is in electrical contact with a gate of one of a second and a third transistor. The extremely low off current of a first transistor containing the oxide semiconductor layer allows storing, for long periods of time, electrical charges in the gate electrode of one of the second and the third transistor, whereby a substantially permanent memory effect can be obtained. The second and the third transistors which do not contain an oxide semiconductor layer allow high-speed operations when using the memory circuit.

It is an object to provide a semiconductor having a novel structure. In the semiconductor device, a plurality of memory elements are connected in series and each of the plurality of memory elements includes first to third transistors thus forming a memory circuit. A source or a drain of a first transistor which includes an oxide semiconductor layer is in electrical contact with a gate of one of a second and a third transistor. The extremely low off current of a first transistor containing the oxide semiconductor layer allows storing, for long periods of time, electrical charges in the gate electrode of one of the second and the third transistor, whereby a substantially permanent memory effect can be obtained. The second and the third transistors which do not contain an oxide semiconductor layer allow high-speed operations when using the memory circuit.