An array substrate and a manufacturing method thereof are disclosed. The manufacturing method includes forming, on a substrate, a first metal pattern layer, a first insulating layer, a second metal pattern layer, and a second insulating layer, successively; coating a photoresist on the second insulating layer; forming a photoresist pattern and an etching protection layer, in a first region of the array substrate, the photoresist pattern exposing a part of the top surface of the second insulating layer, and being coupled to the second insulating layer through the etching protection layer; and performing etching in the first region by using the photoresist pattern as a mask to remove the etching protection layer and at least part of the second insulating layer, without etching the first insulating layer, so as to expose a part of the second metal pattern layer and form a liquid crystal diversion groove.

This invention is related to a method of manufacturing an anti-glare cover. The method includes preparing a crosslinking precursor solution, wherein the precursor solution is an organic solution with crosslinkable polymer monomer and crosslinking initiator; applying the crosslinking precursor solution on a cover to form a crosslinking precursor layer; pre-crosslinking and crosslinking the crosslinking precursor layer to form a mesh crosslinked layer; etching the cover with acid solution and the mesh crosslinked layer acting as a hard mask to form an anti-glare microstructure on the cover; and removing the mesh crosslinked layer.

The invention relates generally to optically high transparency and adjustable haze, superomniphobic, rigid and flexible structures and, more particularly, to fused silica glass and flexible plastic, e.g., polymer, structures having a sub-wavelength texture formed on a surface thereof, which is effective to impart the optical properties of high transparency and adjustable haze to the structures. The texture is reentrant. Additionally, the optically high transparency and adjustable haze structures include a silicon dioxide coating applied to the texture and a treatment of a low surface energy material deposited on the silicon dioxide coating. The silicon dioxide coating renders the structures super hydrophilic, and the low surface energy material treatment renders the structures superomniphobic.

A method of producing an element substrate includes (A) a process of forming a transparent electrode film containing a transparent metal oxide on an upper side of an insulating film located above a conductive film, (B) a process of forming a photoresist film on an upper side of the transparent electrode film and patterning the photoresist film, (C) a process of removing a portion of the transparent electrode film not covered by the photoresist film to form an opening H extending through the transparent electrode film, and (D) a process of removing a portion of the insulating film not covered by the photoresist film and the transparent electrode film to form a contact hole extending to the conductive film. The element substrate produced by the method includes an electrode including the transparent electrode film electrically connected to the conductive film at the contact hole.

In a display device having high reliability, even if being a narrow framing type, and a method for manufacturing thereof, having a display panel, being made up with a first substrate 101 and a second substrate 201, which are adhered with using a seal 301, a main SOC 302 is disposed like a wall, on a peripheral end portion of the first substrate 101 and the second substrate 201, and the seal 301 is disposed inwardly of the main SOC 302. Also, in a method for manufacturing thereof, the main SOC 302 is formed in a region including a cutting plane between the display panel regions neighboring with, and on the cutting plane is made the cutting thereof.

Disclosed are a method for forming a pattern for liquid crystal orientation of a zenithal bi-stable liquid crystal panel, a liquid crystal orientation substrate including the pattern formed thereby, and a mask substrate used for forming the pattern. The method includes: (a) depositing a silicon-based compound on a silicon substrate, (b) forming a guide pattern on an upper portion of the deposited silicon-based compound layer by using an imprint lithography, (c) discontinuously exposing the silicon substrate by transferring a pattern from the guide pattern onto the silicon-based compound layer by dry etching, (d) forming a pattern in an asymmetrical form on the silicon substrate by wet etching, (e) removing the part of the remaining silicon-based compound layer, and then hydrophobically treating a pattern surface of the silicon substrate; and (f) transferring a pattern in an asymmetrical form onto a glass substrate by disposing the surface-treated silicon substrate to face the glass substrate, and supplying a dielectric therebetween.

In a display device having high reliability, even if being a narrow framing type, and a method for manufacturing thereof, having a display panel, being made up with a first substrate 101 and a second substrate 201, which are adhered with using a seal 301, a main SOC 302 is disposed like a wall, on a peripheral end portion of the first substrate 101 and the second substrate 201, and the seal 301 is disposed inwardly of the main SOC 302. Also, in a method for manufacturing thereof, the main SOC 302 is formed in a region including a cutting plane between the display panel regions neighboring with, and on the cutting plane is made the cutting thereof.

In a display device having high reliability, even if being a narrow framing type, and a method for manufacturing thereof, having a display panel, being made up with a first substrate 101 and a second substrate 201, which are adhered with using a seal 301, a main SOC 302 is disposed like a wall, on a peripheral end portion of the first substrate 101 and the second substrate 201, and the seal 301 is disposed inwardly of the main SOC 302. Also, in a method for manufacturing thereof, the main SOC 302 is formed in a region including a cutting plane between the display panel regions neighboring with, and on the cutting plane is made the cutting thereof.

The present disclosure provides an alignment film manufacturing method, a liquid crystal display panel, and a liquid crystal display. The alignment film manufacturing method includes: providing a substrate; defining an active display area and a sealant area on the substrate, wherein the sealant area is a strip area arranged around the active display area, and there is a predetermined distance between the sealant area and the active display area; arranging an alignment film on the substrate, wherein the alignment film covers at least a part of the active display area; and etching the alignment film, so that an edge of the alignment film is located between an edge of the active display area and the sealant area. By the above-mentioned one or more implementations, the present disclosure may improve an adhesion force between the sealant and the substrate.

This invention is related to a method of manufacturing an anti-glare cover. The method includes preparing a crosslinking precursor solution, wherein the precursor solution is an organic solution with crosslinkable polymer monomer and crosslinking initiator; applying the crosslinking precursor solution on a cover to form a crosslinking precursor layer; pre-crosslinking and crosslinking the crosslinking precursor layer to form a mesh crosslinked layer; etching the cover with acid solution and the mesh crosslinked layer acting as a hard mask to form an anti-glare microstructure on the cover; and removing the mesh crosslinked layer.