An integrated circuit including a link or string of semiconductor memory cells, wherein each memory cell includes a floating body region for storing data. The link or string includes at least one contact configured to electrically connect the memory cells to at least one control line, and the number of contacts in the string or link is the same as or less than the number of memory cells in the string or link.

The present disclosure includes apparatuses and methods related to modifying an operating mode in memory. An example apparatus can include a memory array and a controller coupled to the memory array, wherein the controller includes a register configured to receive a mode register write command and write a value indicative of an operating mode in which the apparatus has reduced power consumption relative to a normal operating mode.

The present disclosure includes apparatuses and methods related to modifying an operating mode in memory. An example apparatus can include a memory array and a controller coupled to the memory array, wherein the controller includes a register configured to receive a mode register write command and write a value indicative of an operating mode in which the apparatus has reduced power consumption relative to a normal operating mode.

A variety of applications can include multiple memory die packages configured to engage in peak power management (PPM) across the multiple packages of memory dies. A communication line coupled to each memory die in the multiple memory die packages can be used to facilitate the PPM. A global management die can start a communication sequence among the multiple memory die packages to share a current budget across the multiple memory die packages by driving a signal on the communication line. Local management dies can use the received signal having clock pulses driven by the global management die on the communication line to engage in the PPM. To engage in global PPM, each memory die can be structured, to be selected as the global management die or a local management die, with one or more controllers to interface with the multiple memory die packages and to handle current budget limits.

A variety of applications can include multiple memory die packages configured to engage in peak power management (PPM) across the multiple packages of memory dies. A communication line coupled to each memory die in the multiple memory die packages can be used to facilitate the PPM. A global management die can start a communication sequence among the multiple memory die packages to share a current budget across the multiple memory die packages by driving a signal on the communication line. Local management dies can use the received signal having clock pulses driven by the global management die on the communication line to engage in the PPM. To engage in global PPM, each memory die can be structured, to be selected as the global management die or a local management die, with one or more controllers to interface with the multiple memory die packages and to handle current budget limits.

An N.sup.+ layer 11a and N.sup.+ layers 13a to 13d that are disposed on both ends of Si pillars 12a to 12d standing on a substrate 10 in a vertical direction, a TiN layer 18a that surrounds a gate HfO.sub.2 layer 17a surrounding the Si pillars 12a to 12d and that extends between the Si pillars 12a and 12b, a TiN layer 18b that surrounds the gate HfO.sub.2 layer 17a and that extends between the Si pillars 12c and 12d, a TiN layer 26a that surrounds a gate HfO.sub.2 layer 17b surrounding the Si pillars 12a to 12d and that extends between the Si pillars 12a and 12b, and a TiN layer 26b that surrounds the gate HfO.sub.2 layer 17b and that extends between the Si pillars 12c and 12d are formed. Voltages applied to the N.sup.+ layers 11a and 13a to 13d and the TiN layers 18a, 18b, 26a, and 26b are controlled to perform a data write operation of retaining, inside the Si pillars 12a to 12d, a group of positive holes generated by an impact ionization phenomenon and a data erase operation of discharging the group of positive holes from the inside of the Si pillars 12a to 12d.

An N.sup.+ layer 11a and N.sup.+ layers 13a to 13d that are disposed on both ends of Si pillars 12a to 12d standing on a substrate 10 in a vertical direction, a TiN layer 18a that surrounds a gate HfO.sub.2 layer 17a surrounding the Si pillars 12a to 12d and that extends between the Si pillars 12a and 12b, a TiN layer 18b that surrounds the gate HfO.sub.2 layer 17a and that extends between the Si pillars 12c and 12d, a TiN layer 26a that surrounds a gate HfO.sub.2 layer 17b surrounding the Si pillars 12a to 12d and that extends between the Si pillars 12a and 12b, and a TiN layer 26b that surrounds the gate HfO.sub.2 layer 17b and that extends between the Si pillars 12c and 12d are formed. Voltages applied to the N.sup.+ layers 11a and 13a to 13d and the TiN layers 18a, 18b, 26a, and 26b are controlled to perform a data write operation of retaining, inside the Si pillars 12a to 12d, a group of positive holes generated by an impact ionization phenomenon and a data erase operation of discharging the group of positive holes from the inside of the Si pillars 12a to 12d.

A static random access memory (SRAM) includes a bit cell including a p-type pass gate, a bit information path connected to the bit cell by the p-type pass gate, and a read multiplexer connected to the bit information path. The read multiplexer includes an n-type transistor configured to selectively couple the bit information path to a sense amplifier.

A static random access memory (SRAM) includes a bit cell including a p-type pass gate, a bit information path connected to the bit cell by the p-type pass gate, and a read multiplexer connected to the bit information path. The read multiplexer includes an n-type transistor configured to selectively couple the bit information path to a sense amplifier.

A memory device according to the present invention includes memory cells, each of the memory cells includes a semiconductor base material that is formed on a substrate and that stands on the substrate in a vertical direction, voltages applied to a first gate conductor layer, a second gate conductor layer, a first impurity layer, and a second impurity layer in each of the memory cells are controlled to perform a write operation of retaining, inside a channel semiconductor layer, a group of positive holes generated by an impact ionization phenomenon or by a gate-induced drain leakage current, and the voltages applied to the first gate conductor layer, the second gate conductor layer, the first impurity layer, and the second impurity layer are controlled to perform an erase operation of discharging the group of positive holes from inside the channel semiconductor layer. The first gate conductor layer partially surrounds a side surface of the semiconductor base material, and the second gate conductor layer entirely surrounds the side surface of the semiconductor base material.