A circuit includes a memory array with SRAM cells connected in rows by word lines and in columns by bit lines. A row controller circuit simultaneously actuates, through a word line driver circuit for each row, word lines in parallel for an in-memory compute operation. A column processing circuit processes analog voltages developed on the bit lines in response to the simultaneous actuation to generate a decision output for the in-memory compute operation. A bit line precharge circuit generates a precharge voltage for application to each pair of bit lines. The precharge voltage has a first voltage level (not greater than a positive supply voltage for the SRAM cells) when the memory array is operating in a data read/write mode. The precharge voltage has a second voltage level (greater than the first voltage level) in advance of the simultaneous actuation of the word lines for the in-memory compute operation.

A memory device includes a substrate, an active layer that is spaced apart from the substrate and laterally oriented, a word line that is laterally oriented in parallel to the active layer along one side of the active layer, an active body that is vertically oriented by penetrating through the active layer, a bit line that is vertically oriented by penetrating through the active layer to be spaced apart from one side of the active body, and a capacitor that is vertically oriented by penetrating through the active layer to be spaced apart from another side of the active body.

A processing device in a memory sub-system sends a program command to the memory device to cause the memory device to initiate a program operation on a corresponding wordline and sub-block of a memory array of the memory device. The processing device further receives a request to perform a read operation on data stored on the wordline and sub-block of the memory array, sends a suspend command to the memory device to cause the memory device to suspend the program operation, reads data corresponding to the read operation from a page cache of the memory device, and sends a resume command to the memory device to cause the memory device to resume the program operation.

A stacked memory device includes a plurality of lower word lines extending in a first direction, a bit line positioned over the plurality of the lower word lines and extending in a second direction intersecting with the first direction, and a plurality of upper word lines positioned over the bit line and extending in the first direction. The stacked memory device also includes a plurality of lower memory cells including a lower capacitor and a lower switching element between the lower word lines and the bit line. The stacked memory device further includes a plurality of upper memory cells including an upper capacitor and an upper switching element between the bit line and the upper word lines.

A nonvolatile memory apparatus may include a control circuit, a sense amplifier, and a reference generator. The control circuit may apply a read voltage across a target memory cell through a selected global bit line and a selected global word line. The sense amplifier may generate an output signal by comparing voltage levels of the selected global word line and a reference line. The reference generator may change the voltage level of the reference line by charging and discharging a capacitor that is coupled to the reference line.

A semiconductor memory device includes a first semiconductor pillar having i first memory cells on a first side and i second memory cells on a second side, a second semiconductor pillar having i third memory cells on a third side and i fourth memory cells on a fourth side, i first word lines (i is an integer of 4 or more) connected to the i first memory cells and the i third memory cells, i second word lines connected to the i second memory cells and the i fourth memory, and a driver. In writing data to the k-th (k is smaller than i and greater than 1) first memory cell, the driver supplies the k-th first word line with a first voltage larger than a reference voltage, and supplies the k-th second word line with a second voltage smaller than the reference voltage.

A semiconductor memory includes a main memory area and a tag memory area. A plurality of memory groups are set in the main memory area and a plurality of flag bits are set in the tag memory area. Each of the plurality of memory groups has a corresponding relationship with one of the plurality of flag bit. The flag bit is at least configured to indicate whether at least one memory cell in the memory group has a specific state. The specific state includes an occupied state.

A memory device includes a plurality of word lines elongated along a first direction, and at least one memory unit. The at least one memory unit includes a plurality of memory cells, at least one bit line, and at least one column word line. The plurality of memory cells are arranged along a second direction different from the first direction. The at least one bit line is elongated along the second direction, and configured to transmit data of a selected memory cell. The at least one column word line is elongated along the second direction, and configured to control electrical connections between the memory cells and the at least one bit line, wherein the selected memory cell is selected by a corresponding word line and the at least one column word line.

A memory device coupled to a memory controller and including a memory array and an access circuit is provided. The memory array includes a plurality of cells. Each of the cells is coupled to a word-line. The access circuit is coupled between the memory controller and the memory array. In a normal mode, the access circuit executes a refresh action for the cells which are coupled to at least one word-line in response to the memory controller outputting an auto-refresh command. In a standby mode, the access circuit selects one of the word-lines and determines whether to execute the refresh action for the cells coupled to the selected word-line according to the retention capability of the selected word-line at regular time intervals.

Embodiments of the present disclosure relate to a semiconductor structure and a manufacturing method thereof, a data storage device and a data read-write device. The semiconductor structure includes: a substrate, a plurality of active regions separated from each other being formed in the substrate; a trench, located in the active region; a first gate structure, located in the trench, and configured to be applied with a first applied voltage; a second gate structure, located in the trench, and located above the first gate structure, and configured to be applied with a second applied voltage, the second applied voltage being greater than the first applied voltage; and an insulating isolation layer, located in the trench, and located between the first gate structure and the second gate structure.