An expansion mount, electrode arrangement and a surface treater station include a mounting block with one or more clamps pivotally coupled to the mounting block to move between a connect position and a release position. When the mounting block is coupled to a surface treater, the one or more clamps are configured to engage the electrode in the connect position and disengage from the electrode in the release position.

An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset.

A system for extending the life of a repeller in an IHC ion source is disclosed. The system includes an IHC ion source wherein the back surface of the repeller has been shaped to reduce the possibility of electrical shorts. The separation distance between the back surface of the repeller and the chamber wall behind the repeller is increased along its outer edge, as compared to the separation distance near the center of the repeller. This separation distance reduces the possibility that deposited material will flake and short the repeller to the chamber wall. Further, in certain embodiments, the separation distance between the back surface of the repeller and the chamber wall near the center of the repeller is unchanged, so as to minimize the flow of gas that exits from the chamber. The back surface of the repeller may be tapered, stepped or arced to achieve these criteria.

An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset.

The invention relates to a liquid metal-ion beam system (1) or liquid metal electron beam system, comprising: a conductive emitter electrode (2), a conductive extractor electrode (3) opposite to the emitter electrode (2), a liquid metal reservoir (4) which is fluidically connected to the emitter electrode (2) for transporting liquid metal to the emitter electrode (2), a control unit (5) which is configured to apply a periodically varying operating voltage between emitter electrode (2) and extractor electrode (3).

The invention relates to a liquid metal-ion beam system (1) or liquid metal electron beam system, comprising: a conductive emitter electrode (2), a conductive extractor electrode (3) opposite to the emitter electrode (2), a liquid metal reservoir (4) which is fluidically connected to the emitter electrode (2) for transporting liquid metal to the emitter electrode (2), a control unit (5) which is configured to apply a periodically varying operating voltage between emitter electrode (2) and extractor electrode (3).

An optical sensor including: a substrate; a circuit element layer disposed on the substrate and including a circuit element; and a photoelectric element layer including a photoelectric element, a self-assembled monolayer, and a bias electrode connected to the photoelectric element, wherein the photoelectric element is connected to the circuit element, and wherein the self-assembled monolayer is disposed on the photoelectric element.

The invention relates to an electrode for a discharge lamp, wherein the electrode has a base body having an electrode plateau providing an end face of the electrode, wherein the base body is delimited by the electrode plateau in a longitudinal extension direction of the electrode. Furthermore, the electrode has a coating, arranged in at least a first region of the base body that is different from the electrode plateau, to increase an emission of heat. In addition, the electrode has an at least partially contiguous free region of the base body extending at least partly in the longitudinal extension direction as far as the electrode plateau, in which the coating for increasing the emission of heat is not arranged, and wherein the first region adjoins at least one section of the free region in the circumferential direction of the electrode.

A hollow cathode includes an insulation plate having cathode holes. Bottom electrodes are below the insulation plate. The bottom electrodes define first holes having a width greater than a width of the cathode holes. Top electrodes are at an opposite side of the insulation plate from the bottom electrodes. The top electrodes define second holes aligned with the first holes along a direction orthogonal to the upper surface of the insulation plate.

The present invention discloses a structure of an emitter electrode for enhancing ion currents, including a tip end part and a shank part. The tip end part has a pinpoint, a first diameter, and a radius of curvature. A length of the tip end part with the shank part is from the pinpoint to a first position of the shank part and a distance between the first position and the pinpoint is 300 times the first diameter. The radius of curvature of the tip end part ranges from 50 nanometers to 5 micrometers. The first diameter is 2 times the radius of curvature.