Patent classifications
H01J1/02
Vacuum integrated electronic device and manufacturing process thereof
A vacuum integrated electronic device has an anode region of conductive material; an insulating region on top of the anode region; a cavity extending through the insulating region and having a sidewall; and a cathode region. The cathode region has a tip portion extending peripherally within the cavity, adjacent to the sidewall of the cavity. The cathode region is formed by tilted deposition, carried out at an angle of 30-60 with respect to a perpendicular to the surface of device.
Electron emission device
Provided herein are electron emission devices and device components for optical, electronic and optoelectronic devices, including cantilever-based MEMS and NEMS instrumentation. Devices of certain aspects of the invention integrate a dielectric, pyroelectric, piezoelectric or ferroelectric film on the receiving surface of a substrate having an integrated actuator, such as a temperature controller or mechanical actuator, optionally in the form of a cantilever device having an integrated heater-thermometer. Also provided are methods of making and using electron emission devices for a range of applications including sensing and imaging technology.
Electron emission device
Provided herein are electron emission devices and device components for optical, electronic and optoelectronic devices, including cantilever-based MEMS and NEMS instrumentation. Devices of certain aspects of the invention integrate a dielectric, pyroelectric, piezoelectric or ferroelectric film on the receiving surface of a substrate having an integrated actuator, such as a temperature controller or mechanical actuator, optionally in the form of a cantilever device having an integrated heater-thermometer. Also provided are methods of making and using electron emission devices for a range of applications including sensing and imaging technology.
INTERFERENCE MANAGEMENT FOR ADAPTIVE TDD WITH FREQUENCY DOMAIN SEPARATIONS
A method of wireless communications includes adapting to downlink/uplink resource allocations. In particular, the downlink/uplink communications may be adjusted according to time division duplexed (TDD) configurations of serving and neighbor cells.
Method and apparatus for reducing the work function of polycrystalline metal hexaboride
Aspects include a method for treating a polycrystalline material, the method comprising: exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein: the surface comprises a plurality of crystallites each having the composition MB.sub.6, M being a metal element; the plasma comprises ions, the ions being characterized by an average ion flux selected from the range of 1.5 to 100 A/cm.sup.2 and an average ion energy that is less than a sputtering threshold energy; the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and the second average work function is less than the first average work function.
INTERFERENCE MANAGEMENT FOR ADAPTIVE TDD WITH FREQUENCY DOMAIN SEPARATIONS
A method of wireless communication at a serving base station identifies a potential interference condition based on an uplink/downlink configuration mismatch. The method includes signaling, to a neighbor base station, to restrict transmissions based on the identified potential interference condition. The transmissions may be restricted by beamforming the transmissions into a different direction and/or blocking transmissions on a frequency. The signaling prompts the neighbor base station to restrict downlink transmissions that will potentially interfere with uplink control channel transmissions received at the serving base station, or to restrict uplink transmissions, intended for the neighbor base station, that will potentially interfere with downlink control channel transmissions from the serving base station.
Partially insulated cathode
A partially-insulated cathode for exciting plasma in a plasma chamber is provided. The partially-insulated cathode includes a conductive structure enclosing a cavity having a cavity surface and an insulating material contiguously covering a portion of the cavity surface from the cavity opening up to an insulation height that is less than a cavity height. Cross-sections of the cavity in X-Y planes have at least one respective cavity-width. A cavity opening has a diameter less than a minimum cavity-width of the at least one cavity-width.
Lighting device with spatially segregated primary and secondary emitters
A lighting device includes at least one first electrically activated emitter, at least one lumiphor support element comprising a lumiphoric material spatially segregated from the first electrically activated emitter and arranged to receive at least a portion of emissions from the first electrically activated emitter, and at least one second electrically activated emitter disposed on or adjacent to the at least one lumiphor support element. First and second electrically activated emitters having different peak wavelengths may be in conductive with first and second device-scale heat sinks, respectively.
Electron gun
An electron gun may include a cathode with an emitting surface configured to emit electrons. The cathode may include a through hole that goes through the emitting surface and is configured to allow back-streaming electrons of the emitted electrons to pass through. The electron gun may also include an anode configured to attract the emitted electrons from the cathode to the anode and focus the emitted electrons into an electron beam. The electron gun may also include a grid structure configured to facilitate the focusing of the emitted electrons, the grid structure being positioned corresponding to the through hole.
Interference management for adaptive TDD with frequency domain separations
A method of wireless communications includes adapting to downlink/uplink resource allocations. In particular, the downlink/uplink communications may be adjusted according to time division duplexed (TDD) configurations of serving and neighbor cells.