Patent classifications
H01J3/04
Source housing assembly for controlling ion beam extraction stability and ion beam current
Provided herein are approaches for improving ion beam extraction stability and ion beam current for an ion extraction system. In one approach, a source housing assembly may include a source housing surrounding an ion source including an arc chamber, the source housing having an extraction aperture plate mounted at a proximal end thereof. The source housing assembly further includes a vacuum liner disposed within an interior of the source housing to form a barrier around a set of vacuum pumping apertures. As configured, openings in the source housing assembly, other than an opening in the extraction aperture plate, are enclosed by the extraction aperture plate and the vacuum liner, thus ensuring appendix arcs or extraneous ions produced outside the arc chamber remain within the source housing. Just those ions produced within the arc chamber exit the source housing through the opening of the extraction aperture plate.
Source housing assembly for controlling ion beam extraction stability and ion beam current
Provided herein are approaches for improving ion beam extraction stability and ion beam current for an ion extraction system. In one approach, a source housing assembly may include a source housing surrounding an ion source including an arc chamber, the source housing having an extraction aperture plate mounted at a proximal end thereof. The source housing assembly further includes a vacuum liner disposed within an interior of the source housing to form a barrier around a set of vacuum pumping apertures. As configured, openings in the source housing assembly, other than an opening in the extraction aperture plate, are enclosed by the extraction aperture plate and the vacuum liner, thus ensuring appendix arcs or extraneous ions produced outside the arc chamber remain within the source housing. Just those ions produced within the arc chamber exit the source housing through the opening of the extraction aperture plate.
Pyrolyzed porous carbon materials and ion emitters
Embodiments related to the use and production of porous carbon materials in ion emitters and other applications are described.
Pyrolyzed porous carbon materials and ion emitters
Embodiments related to the use and production of porous carbon materials in ion emitters and other applications are described.
PYROLYZED POROUS CARBON MATERIALS AND ION EMITTERS
Embodiments related to the use and production of porous carbon materials in ion emitters and other applications are described
PYROLYZED POROUS CARBON MATERIALS AND ION EMITTERS
Embodiments related to the use and production of porous carbon materials in ion emitters and other applications are described
Pyrolyzed porous carbon materials and ion emitters
Embodiments related to the use and production of porous carbon materials in ion emitters and other applications are described.
Emitter structure, gas ion source and focused ion beam system
A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.
Emitter structure, gas ion source and focused ion beam system
A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.