Various methods and systems are provided for an X-ray tube cathode focusing element. In one example, a focusing element is configured with three electron emission filaments, an integrated edge focusing, and a bias voltage. The integrated edge focusing may include a continuous single architecture with rounded edges, and a voltage of the focusing element may be negatively biased relative to a voltage of the electron emission filaments.

Provided is a photocathode kit that does not require adjustment of the distance between a photocathode film and a lens focusing on the photocathode film when the photocathode and the lens are installed inside an electron gun. The photocathode kit includes: a photocathode including a substrate in which a photocathode film is formed on a first surface; a lens; and a holder that holds the substrate and the lens, and the holder has a retaining member that retains the photocathode film and the lens to be spaced apart by a predetermined distance, and a first communication path that communicates between inside of the holder and outside of the holder.

The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and to provide a method of manufacturing a component for a charged particle beam device. Specifically provided is a charged particle beam device using a vacuum component characterized by comprising a metal container, the interior space of which is evacuated to form a high vacuum, and coating layers formed on the surface on the interior space-side of the metal container, wherein the coating layers are vanadium-containing glass, which is to say an amorphous substance. Coating vanadium glass onto walls of a space where it is desirable to form a high vacuum, for example walls in the vicinity of an electron source, reduces gas discharge in the vicinity of the electron source, and the getter effect of the coating layer induces localized evacuation and enables the formation of an extremely high vacuum, even in spaces having a complex structure, without providing a large high-vacuum pump.

Apparatuses, systems, and methods for ion traps are described herein. One apparatus includes a number of microwave (MW) rails and a number of radio frequency (RF) rails formed with substantially parallel longitudinal axes and with substantially coplanar upper surfaces. The apparatus includes two sequences of direct current (DC) electrodes with each sequence formed to extend substantially parallel to the substantially parallel longitudinal axes of the MW rails and the RF rails. The apparatus further includes a number of through-silicon vias (TSVs) formed through a substrate of the ion trap and a trench capacitor formed in the substrate around at least one TSV.

Apparatuses, systems, and methods for ion traps are described herein. One apparatus includes a number of microwave (MW) rails and a number of radio frequency (RF) rails formed with substantially parallel longitudinal axes and with substantially coplanar upper surfaces. The apparatus includes two sequences of direct current (DC) electrodes with each sequence formed to extend substantially parallel to the substantially parallel longitudinal axes of the MW rails and the RF rails. The apparatus further includes a number of through-silicon vias (TSVs) formed through a substrate of the ion trap and a trench capacitor formed in the substrate around at least one TSV.

Aspects of the present disclosure relate generally to systems and methods for use in the implementation and/or operation of quantum information processing (QIP) systems, and more particularly, to provide a cold finger for use with a quantum information processing (QIP) system including a cryostat. The cold finger includes a planar base including a first surface proximate a cooling plate of the cryostat opposite a second surface; a finger including a first end coupled to the second surface of the planar base and a second end configured to engage an ion trap; and an isolation unit positioned above the cooling plate of the cryostat and including a dielectric crystal plate that is configured to isolate the ion trap from electrical noise generated by the cryostat when controlling a temperature of the ion trap.

Aspects of the present disclosure relate generally to systems and methods for use in the implementation and/or operation of quantum information processing (QIP) systems, and more particularly, to provide a cold finger for use with a quantum information processing (QIP) system including a cryostat. The cold finger includes a planar base including a first surface proximate a cooling plate of the cryostat opposite a second surface; a finger including a first end coupled to the second surface of the planar base and a second end configured to engage an ion trap; and an isolation unit positioned above the cooling plate of the cryostat and including a dielectric crystal plate that is configured to isolate the ion trap from electrical noise generated by the cryostat when controlling a temperature of the ion trap.

Various methods and systems are provided for an X-ray tube cathode focusing element. In one example, a focusing element is configured with a first side positioned adjacent to an electrode plate. An insulator having a first side is positioned adjacent the electrode plate and a second, opposite side adjacent to a cathode base. The focusing element has at least three filaments of different sizes positioned in respective channels of different widths, where each of the at least three filaments are coupled to two current feedthroughs, each current feedthrough configured with a leg extending through a central, hollow space of the focusing element, the electrode plate, the insulator, and the cathode base.

The electromagnet mounting frame is characterized by including: a top plate for supporting the electromagnet; plural legs for sustaining the top plate; and a cable placement member fixed to the plural legs and placed below the top plate; wherein a cable placement portion in which a power cable for the electromagnet is to be placed so as to extend in a traveling direction of the charged particle beam, is formed between the cable placement member and the top plate; and wherein the cable placement portion has a cable placement width (widthwise inter-leg length) that is a length thereof in a direction perpendicular to the traveling direction of the charged particle beam, and that is longer than a width of the electromagnet in the direction perpendicular to the traveling direction of the charged particle beam.

The electromagnet mounting frame is characterized by including: a top plate for supporting the electromagnet; plural legs for sustaining the top plate; and a cable placement member fixed to the plural legs and placed below the top plate; wherein a cable placement portion in which a power cable for the electromagnet is to be placed so as to extend in a traveling direction of the charged particle beam, is formed between the cable placement member and the top plate; and wherein the cable placement portion has a cable placement width (widthwise inter-leg length) that is a length thereof in a direction perpendicular to the traveling direction of the charged particle beam, and that is longer than a width of the electromagnet in the direction perpendicular to the traveling direction of the charged particle beam.