In one embodiment, the present disclosure is directed to a method for performing diagnostics on a matching network that utilizes an electronically variable capacitor (EVC). According to the method, all the discrete capacitors of the EVC are switched out. At a first node, a parameter associated with a current flowing between a power supply and one or more of the switches of the discrete capacitors is measured. The method then switches in, one at a time, each discrete capacitor of the EVC. Upon the switching in of each discrete capacitor, the method remeasures the parameter at the first node and determines whether a change to the parameter at the first node is within a predetermined range to determine whether the corresponding switch, driver circuit, or filter of the discrete capacitor most recently switch in has failed.

A solution electrode glow discharge apparatus has a housing that contains a solid electrode. The solid electrode has a head and a tip. The tip of the solid electrode extends outwards from the housing. At least a portion of the head of the solid electrode is positioned with an electrical and thermal conducting block. An adjustable-polarity power supply is provided in communication with the solid electrode. A cooling mechanism is provided for cooling the electrical and thermal conducting block.

A solution electrode glow discharge apparatus has a housing that contains a solid electrode. The solid electrode has a head and a tip. The tip of the solid electrode extends outwards from the housing. At least a portion of the head of the solid electrode is positioned with an electrical and thermal conducting block. An adjustable-polarity power supply is provided in communication with the solid electrode. A cooling mechanism is provided for cooling the electrical and thermal conducting block.

The present invention relates to a plasma diagnosing system and method, and more particularly, to a system and a method for diagnosing plasma in real time using a change in a capacitance sensed by an electrode using a reference waveform having a frequency different from a plasma discharging frequency band region. The sensed capacitance varies before and after discharging plasma and the plasma is diagnosed using the change in capacitance in real time.

An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

An LED device includes a multi-sided heat spreader element with a longitudinal multi-sided wall at least partly enclosing an internal space, with a plurality of LEDs mounted to the outer surface the heat spreader element, and a flow space for a cooling medium in the internal space. The tubular heat spreader element has at least one layer of a thermally conductive metal which is bendable from a flat shape to the multi-sided shape. The multi-sided shape may be tubular with a smoothly curved or multi-faceted polygonal wall. The wall of the LED device may incorporate two-phase cooling elements such as vapor chambers to maintain the LEDs at a constant temperature, and may include a temperature-controlled fan unit to control the LED temperature, and also control the wavelength and frequency of light emitted by the LEDs. A method for manufacturing the LED device is also disclosed.

A device monitors a pulse frequency and a duty ratio of a microwave generated by a microwave output device provided in a plasma processing apparatus. The plasma processing apparatus includes a chamber main body, the microwave output device, a wave guide tube, and a tuner. The microwave output device generates the microwave of which power is pulse-modulated. The device includes a wave detection unit and an acquisition unit. The wave detection unit detects a measured value corresponding to travelling wave power of a microwave in the wave guide tube. The acquisition unit acquires a frequency and a duty ratio of the travelling wave power on the basis of the measured value detected by the wave detection unit.

A gas field ionization source for forming an electric field for ionizing gas comprises: an emitter tip having a tip end; an extraction electrode facing the emitter tip and having an aperture at a position distant therefrom; a gas supply means for supplying the gas in the vicinity of the emitter tip; a vacuum partition made of a metal having a hole; and a high voltage power source for applying voltage between the emitter tip and the extraction electrode. The hole is constructed so that the tip end of the emitter tip can pass therethrough and the vacuum partition has a micro protrusion, around the hole, protruding toward a side of the extraction electrode.

A gas field ionization source for forming an electric field for ionizing gas comprises: an emitter tip having a tip end; an extraction electrode facing the emitter tip and having an aperture at a position distant therefrom; a gas supply means for supplying the gas in the vicinity of the emitter tip; a vacuum partition made of a metal having a hole; and a high voltage power source for applying voltage between the emitter tip and the extraction electrode. The hole is constructed so that the tip end of the emitter tip can pass therethrough and the vacuum partition has a micro protrusion, around the hole, protruding toward a side of the extraction electrode.

A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor mounted on a first side of the waveguide and physically separated from the waveguide by a first gap and having a gas outlet through which a gas processed by the plasma exits the plasma cavity; and an EM seal disposed in the first gap and configured to block leakage of the microwave energy through the first gap.