Patent classifications
H01J35/24
X-RAY BEAM GENERATION SYSTEM WITH DIAMOND THIN FILM WINDOW
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.
X-RAY BEAM SYSTEM WITH A LIQUID TARGET VACUUM CHAMBER
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.
Multiplexed Drive Systems and Methods for a Multi-Emitter X-Ray Source
An improved X-ray source is disclosed. The improved X-ray source has an enclosure, electron guns, a first set of address lines extending through the enclosure, a second set of address lines extending through the enclosure, and nodes defined by the intersection of the first and second set of address lines. Each of the electron guns is coupled to one of the nodes such that a state of each electron gun is uniquely controlled by modulating a state of one of the first set of address lines and one of the second set of address lines.
SYSTEMS AND METHODS FOR FOCAL POINT POSITION CORRECTION
Systems and methods for determining an offset of a position of a focal point of an X-ray tube is provided. The methods may include obtaining at least one parameter associated with an X-ray tube during a scan of a subject and obtaining a position of a focal point of the X-ray tube. The methods may further include determining a target offset of the position of the focal point based on the at least one parameter and a target relationship between a plurality of reference parameters associated with the X-ray tube and a plurality of reference offsets of reference positions of the focal point. The methods may further include causing, based on the target offset, a correction on the position of the focal point of the X-ray tube.
X-ray tube and X-ray generation device
An X-ray tube includes: a vacuum housing configured to include an internal space which is vacuum; a target unit configured to be disposed in the internal space, and include a target that generates an X-ray by using an electron beam incident therein, and a target support unit that supports the target, the X-ray generated by the target being transmitted through the target support unit; an X-ray emission window configured to be so provided as to face the target support unit, and seal an opening of the vacuum housing, the X-rays transmitted through the target support unit being transmitted through the X-ray emission window; an elastic member configured to press the target unit in such a direction as to approach the X-ray emission window; and a target shift unit configured to shift the target unit pressed by the elastic member in a direction crossing an incidence direction of the electron beam.
X-RAY GENERATION DEVICE AND X-RAY ANALYSIS APPARATUS
An X-ray generation device includes: a sealed X-ray tube including a cathode and an anode; a magnetic field generation portion applying a magnetic field to the electron beam, the magnetic field extending in a first direction, which crosses a traveling direction of the electron beam; and a rotary drive system configured to rotate the sealed X-ray tube, the anode having a surface including a first region and a second region arranged on one side and another side, with respect to a straight division line, the first region having a first metal arranged therein, and the second region having a second metal arranged therein, the second metal being different from the first metal, and by means of the rotary drive system rotating the sealed X-ray tube, the sealed X-ray tube being arranged with respect to the magnetic field generation portion so that the straight division line lies along the first direction.
SYSTEM FOR GENERATING X-RAY BEAMS FROM A LIQUID TARGET
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.
System and method for depth-selectable x-ray analysis
A system for x-ray analysis includes at least one x-ray source configured to emit x-rays. The at least one x-ray source includes at least one silicon carbide sub-source on or embedded in at least one thermally conductive substrate and configured to generate the x-rays in response to electron bombardment of the at least one silicon carbide sub-source. At least some of the x-rays emitted from the at least one x-ray source includes Si x-ray emission line x-rays. The system further includes at least one x-ray optical train configured to receive the Si x-ray emission line x-rays and to irradiate a sample with at least some of the Si x-ray emission line x-rays.
TARGET FOR A RADIATION SOURCE, RADIATION SOURCE FOR GENERATING INVASIVE ELECTROMAGNETIC RADIATION, METHOD OF OPERATING A RADIATION SOURCE, AND METHOD FOR PRODUCING A TARGET FOR A RADIATION SOURCE
A target for a radiation source of invasive electromagnetic radiation has at least one target element, which is configured to generate invasive electromagnetic radiation when irradiated with particles and is coupled to a substrate arrangement for dissipating heat out of the target element, wherein: the target element has a peripheral surface which forms a first part of the outer surface of the target element; the outer surface of the target element is also formed by a side surface of the target element; an extension of the side surface defines a thickness (D) of the target element; a peripheral line of the side surface forms a borderline of the peripheral surface; the target has an end face, as part whereof the side surface of the target element is exposed for irradiation with particles; and the substrate arrangement is in contact with the peripheral surface.
TARGET ASSEMBLY, APPARATUS INCORPORATING SAME, AND METHOD FOR MANUFACTURING SAME
A target assembly for generating radiation may comprise a target, a substrate and a window. The target may be capable of generating first radiation when impinged by a beam. The window may be at least partially permeable to the beam. The window and the substrate may form at least part of a hermetically sealed chamber and the target may be positioned in the chamber. The chamber may be filled with air having a normal or reduced content of oxygen.