To analyze an element to be evaluated with high sensitivity and high accuracy in a short period of time, in an electron beam analyzer including a wavelength dispersive X-ray analyzer in an electron microscope. The electron beam analyzer has one diffraction grating in which a plurality of patterns having maximum X-ray reflectance with respect to the respective X-rays are formed. It simultaneously detects an X-ray as an energy reference and an X-ray spectrum to be evaluated. The positional displacement of X-ray energy due to the installation/replacement of the diffraction grating is corrected using the X-ray spectrum as the energy reference, thereby enabling to perform an analysis with high sensitivity and high accuracy in a short period of time.

A charged particle beam apparatus includes: a lens barrel 2; an electron gun 3 configured to emit an electron beam EB1; a stage 40; a transport port 20 provided to transport a sample stage 30 on which a sample SAM is mounted; and a plurality of X-ray detectors 50 configured to detect an X-ray. The stage 40 includes a mounting portion 40c that is provided below the electron gun 3 in the lens barrel 2. The mounting portion 40c includes at least an opening portion OP that is formed to open on an optical axis OA. When the sample stage 30 is mounted on the mounting portion 40c, the sample SAM is positioned in the opening portion OP to be positioned on the optical axis OA. A moving mechanism 51 is electrically connected to an X-ray detector 50a closest to the transport port 20. The X-ray detector 50a is movable by the moving mechanism 51 in a direction toward or away from the mounting portion 40c. A position of the X-ray detector 50a when the X-ray detector 50a is moved closest to the mounting portion 40c overlaps a transport path 32 in a plan view.

A charged particle beam apparatus includes: a lens barrel 2; an electron gun 3 configured to emit an electron beam EB1; a stage 40; a transport port 20 provided to transport a sample stage 30 on which a sample SAM is mounted; and a plurality of X-ray detectors 50 configured to detect an X-ray. The stage 40 includes a mounting portion 40c that is provided below the electron gun 3 in the lens barrel 2. The mounting portion 40c includes at least an opening portion OP that is formed to open on an optical axis OA. When the sample stage 30 is mounted on the mounting portion 40c, the sample SAM is positioned in the opening portion OP to be positioned on the optical axis OA. A moving mechanism 51 is electrically connected to an X-ray detector 50a closest to the transport port 20. The X-ray detector 50a is movable by the moving mechanism 51 in a direction toward or away from the mounting portion 40c. A position of the X-ray detector 50a when the X-ray detector 50a is moved closest to the mounting portion 40c overlaps a transport path 32 in a plan view.

A mass analyzer includes two rotating electric field (REF) units, sinusoidal signal generators and a means for separation of dispersed ions. The REF units include a plurality of elongated electrodes surrounding a central axis, and are lined in tandem at elongated direction. Sinusoidal signals are applied to the electrodes to rotate electric fields within each REF unit. The means for separation is placed adjacent the downstream end of the 2.sup.nd REF unit. Ions enter the 1.sup.st REF unit, diverge outwards and leave the 1.sup.st REF unit on off-axis positions. The ions successively enter the 2.sup.nd REF unit and converge inwards because of 180 degrees phase difference from the 1.sup.st REF unit. Specified mass ions return to and travel along the central axis. However, unspecified mass ions deviate from the central axis and travel apart from the central axis. The means for separation separates specified ions from unspecified ions.

Provided is a projection-type charged particle optical system in which a projection magnification can be changed while a decrease in the accuracy in measuring a mass-to-charge ratio is being suppressed. A projection-type charged particle optical system according to the present invention includes a first electrode disposed so as to face a sample and having an opening formed therein for allowing a charged particle to pass, a second electrode disposed on a side of the first electrode opposite to where the sample is disposed and having an opening formed therein for allowing the charged particle to pass, and a flight-tube electrode disposed such that the charged particle that has been emitted from the sample and has passed through the second electrode enters the flight-tube electrode and being configured to form a substantially equipotential space thereinside. A principal plane is formed at at least two positions in a travel path of the charged particle.

Provided is a projection-type charged particle optical system in which a projection magnification can be changed while a decrease in the accuracy in measuring a mass-to-charge ratio is being suppressed. A projection-type charged particle optical system according to the present invention includes a first electrode disposed so as to face a sample and having an opening formed therein for allowing a charged particle to pass, a second electrode disposed on a side of the first electrode opposite to where the sample is disposed and having an opening formed therein for allowing the charged particle to pass, and a flight-tube electrode disposed such that the charged particle that has been emitted from the sample and has passed through the second electrode enters the flight-tube electrode and being configured to form a substantially equipotential space thereinside. A principal plane is formed at at least two positions in a travel path of the charged particle.

A device for mass spectrometry in continuous operation can be equipped with a focused electron beam source or laser radiation source. It can further include a vacuum chamber, a stage for placing the specimen, and an ion beam column with a plasma source for producing a primary ion beam and a secondary ion mass spectrometer for secondary ion analysis. The ion beam column is connected to an inert gas source and to a reactive gas source and is modified for simultaneous introduction of at least two gases from the inert gas source and reactive gas source. The secondary ion mass spectrometer is of an orthogonal Time-of-Flight type to ensure the function with the ion beam column in continuous operation.