The invention provides a charged particle beam device capable of reducing a positional shift between secondary beams generated in a beam separator. The charged particle beam device includes a charged particle beam source configured to irradiate a sample with a plurality of primary beams, a plurality of detectors configured to detect secondary beams emitted from the sample in correspondence to the primary beams, and a beam separator configured to deflect the secondary beams in a direction different from that of the primary beams. The charged particle beam device further includes a deflector provided between the beam separator and the detector to correct a positional shift between the secondary beams generated in the beam separator.

A charged particle beam apparatus with a charged particle source to generate a primary charged particle beam, a sample holder to hold a sample for impingement of the primary charged particle beam on the sample, a pulsed laser configured to generate a pulsed light beam for impingement onto an area on the sample, and an electrode to collect electrons emitted from the sample in a non-linear photoemission.

A method to compensate for drift while controlling a charged particle beam (CPB) system having at least one charged particle beam controllable in position. Sources of drift include mechanical variations in the stage supporting the sample, beam deflection shifts, and environmental impacts, such as temperature. The method includes positioning a sample supported by a stage in the CPB system, monitoring a reference fiducial on a surface of the sample from a start time to an end time, determining a drift compensation to compensate for a drift that causes an unintended change in the position of a first charged particle beam relative to the sample by a known amount over a period of time based on a change in the position of the reference fiducial between the start time and the end time, and adjusting positions of the first charged particle beam by applying the determined drift compensation during an operation of the CPB system.

A method to compensate for drift while controlling a charged particle beam (CPB) system having at least one charged particle beam controllable in position. Sources of drift include mechanical variations in the stage supporting the sample, beam deflection shifts, and environmental impacts, such as temperature. The method includes positioning a sample supported by a stage in the CPB system, monitoring a reference fiducial on a surface of the sample from a start time to an end time, determining a drift compensation to compensate for a drift that causes an unintended change in the position of a first charged particle beam relative to the sample by a known amount over a period of time based on a change in the position of the reference fiducial between the start time and the end time, and adjusting positions of the first charged particle beam by applying the determined drift compensation during an operation of the CPB system.

Methods and systems for imaging a sample with a charged particle microscope comprises after scanning a region of interest (ROI) of a sample with an electron beam and acquiring X-rays emitted from the sample, scanning the ROI with an ion beam and acquiring ion-induced photons emitted from the sample. A spatial distribution of multiple elements in the sample may be determined based on both the acquired X-rays and the acquired ion-induced photons.

Methods and systems for imaging a sample with a charged particle microscope comprises after scanning a region of interest (ROI) of a sample with an electron beam and acquiring X-rays emitted from the sample, scanning the ROI with an ion beam and acquiring ion-induced photons emitted from the sample. A spatial distribution of multiple elements in the sample may be determined based on both the acquired X-rays and the acquired ion-induced photons.

An object of the invention is to acquire a high-quality image while maintaining an improvement in throughput of image acquisition (measurement (length measurement)). The present disclosure provides a charged particle beam system including a charged particle beam device and a computer system configured to control the charged particle beam device. The charged particle beam device includes an objective lens, a sample stage, and a backscattered electron detector that is disposed between the objective lens and the sample stage and that adjusts a focus of a charged particle beam with which a sample is irradiated. The computer system adjusts a value of an electric field on the sample in accordance with a change in a voltage applied to the backscattered electron detector.

A dielectric coated plasmonic photoemitter is provided. An aspect of the present photonic apparatus includes a conductive photoemitter including a dielectric material coating or layered on a metallic core. The dielectric material being configured to enhance a local optical field strength and current density of the photoemitter as compared to a bare photoemitter without the dielectric layer. The dielectric layered photoemitter being tunable to transmit photoemissions from corners thereof with different photonic characteristics depending on a laser wavelength pulse received.

A dielectric coated plasmonic photoemitter is provided. An aspect of the present photonic apparatus includes a conductive photoemitter including a dielectric material coating or layered on a metallic core. The dielectric material being configured to enhance a local optical field strength and current density of the photoemitter as compared to a bare photoemitter without the dielectric layer. The dielectric layered photoemitter being tunable to transmit photoemissions from corners thereof with different photonic characteristics depending on a laser wavelength pulse received.

Provided are a vibration-suppressing mechanism that has excellent maintainability and can effectively control vibration of a column, and a charged particle beam device using the same. This charged particle beam device comprises: a sample chamber for accommodating a sample that will serve as an object to be observed therein; a column that is disposed on an upper portion of the sample chamber and irradiates and scans the sample with a charged particle beam generated by a charged particle source; and a vibration-suppressing mechanism that is removably provided to the column, said particle beam device being characterized in that the vibration-suppressing mechanism includes a stator affixed to the column, an annular mover that is supported so as to be movable in a direction orthogonal to the axial direction of the column, a plurality of actuators that cause the mover to vibrate in the direction orthogonal to the axial direction of the column, a plurality of vibration sensors affixed to the stator, and a controller that controls the actuators according to output signals from the vibration sensors.