A vacuum feedthrough (10) which is constructed in radial layers comprises the following elements (from inwards to outwards): a lens element (11), a first ring (12) made of glass, a first hollow cylinder (13) made of a first dielectric material, a first electrically conductive layer (18), a second hollow cylinder (14) made of glass, a third hollow cylinder (15) made of ceramic, a second ring made of glass (16), anda frame (17) made of metal. On the basis of the vacuum feedthrough, the invention additionally relates to an electrode assembly, to a device for generating a DBD plasma discharge, to a measuring device for characterizing a pressure and/or a gas composition, and to a method for operating the measuring device.

Chamber (11, 12, 13) for bounding a plasma generation area (42) in a vacuum pressure sensor (40), wherein the chamber comprises an electrically conductive casing element (1, 1, 1) located radially on the outside relative to a central axis, wherein the chamber comprises electrically conductive wall elements (2, 2, 2) arranged substantially perpendicular to the central axis and connected to the casing element, wherein at least one of the wall elements has a first opening (3), through which the central axis extends, wherein the casing element comprises at least a first (B1) and a second region (B2), wherein the first region is located closer to the central axis than the second region. The invention further relates to a vacuum pressure sensor comprising the chamber.

A substrate processing apparatus includes a chamber including a processing room for processing of a substrate using an introduced gas and an exhaust room for exhausting the gas in the processing room, a shield member provided near a side wall of the chamber to separate the processing room and the exhaust room and including a hole allowing the processing room and the exhaust room to communicate with each other, the shield member being driven in a vertical direction, and a hollow relay member connected to a pipe connected to an instrument outside the chamber and configured to be driven in a horizontal direction. When the shield member reaches an upper position, the relay member is driven inwardly of the chamber to be connected to the shield member at its inward end to allow the processing room and the pipe to communicate with each other through the hole.

A substrate processing apparatus includes a chamber including a processing room for processing of a substrate using an introduced gas and an exhaust room for exhausting the gas in the processing room, a shield member provided near a side wall of the chamber to separate the processing room and the exhaust room and including a hole allowing the processing room and the exhaust room to communicate with each other, the shield member being driven in a vertical direction, and a hollow relay member connected to a pipe connected to an instrument outside the chamber and configured to be driven in a horizontal direction. When the shield member reaches an upper position, the relay member is driven inwardly of the chamber to be connected to the shield member at its inward end to allow the processing room and the pipe to communicate with each other through the hole.

A vacuum feedthrough (10) which is constructed in radial layers comprises the following elements (from inwards to outwards): a lens element (11), a first ring (12) made of glass, a first hollow cylinder (13) made of a first dielectric material, a first electrically conductive layer (18), a second hollow cylinder (14) made of glass, a third hollow cylinder (15) made of ceramic, a second ring made of glass (16), anda frame (17) made of metal. On the basis of the vacuum feedthrough, the invention additionally relates to an electrode assembly, to a device for generating a DBD plasma discharge, to a measuring device for characterizing a pressure and/or a gas composition, and to a method for operating the measuring device.

An ion detection device has a strip of carbon-based nanomaterial (CNM) film and a chamber enclosing the CNM film. A low bias voltage is applied at the ends of the CNM film strip, and ions present in the chamber are detected by a change in the magnitude of current flowing through the CNM film under the bias. Also provided are methods for fabricating the device, methods for measuring pressure of a gas, and methods for monitoring or quantifying an ionizing radiation using the device.

An ion detection device has a strip of carbon-based nanomaterial (CNM) film and a chamber enclosing the CNM film. A low bias voltage is applied at the ends of the CNM film strip, and ions present in the chamber are detected by a change in the magnitude of current flowing through the CNM film under the bias. Also provided are methods for fabricating the device, methods for measuring pressure of a gas, and methods for monitoring or quantifying an ionizing radiation using the device.

In a method for determining at least one physical parameter, a sensor unit which is activated by at least one periodic excitation (1.4) is provided, wherein the sensor unit has at least one detection region in which changes of the parameter in the surroundings of the sensor unit lead to output signal (1.7) from the sensor unit. The sensor unit is wired such that if there are no changes of the parameter in the detection region the output signal (1.7) is a zero signal or virtually a zero signal at the output of the sensor unit, whereas if there are changes of the parameter in the detection region the output signal (1.7) is a signal that is not zero and has a specific amplitude and phase. In a closed control loop, the non-zero signal in the receive path is adjusted to zero using a control signal to achieve an adjusted state even in the presence of changes of the parameter in the detection region. The control signal is evaluated in order to determine the physical parameter. The output signal (1.7) from the sensor unit is reduced substantially to the fundamental wave of the excitation (1.4) and the output signal (1.7) is controlled to zero in the entire phase space by means of at least one pulse width modulation. A temperature-stable, fully digital measuring system is provided as a result of the fact that the at least one pulse width modulation itself generates a correction signal with a variable pulse width and possibly a variable phase which is then added to the output signal (1.7) from the sensor unit and the output signal is thereby controlled to zero in the entire phase space, wherein the pulse width of the correction signal and/or the phase of the correction signal is/are determined by the deviations of the output signal (1.7) from zero.

An ionization gauge to measure pressure, while controlling the location of deposits resulting from sputtering when operating at high pressure, includes at least one electron source that emits electrons, and an anode that defines an ionization volume. The ionization gauge also includes a collector electrode that collects ions formed by collisions between the electrons and gas molecules and atoms in the ionization volume, to provide a gas pressure output. The electron source can be positioned at an end of the ionization volume, such that the exposure of the electron source to atom flux sputtered off the collector electrode and envelope surface is minimized. Alternatively, the ionization gauge can include a first shade outside of the ionization volume, the first shade being located between the electron source and the collector electrode, and, optionally, a second shade between the envelope and the electron source, such that atoms sputtered off the envelope are inhibited from depositing on the electron source.

An ionization gauge to measure pressure, while controlling the location of deposits resulting from sputtering when operating at high pressure, includes at least one electron source that emits electrons, and an anode that defines an ionization volume. The ionization gauge also includes a collector electrode that collects ions formed by collisions between the electrons and gas molecules and atoms in the ionization volume, to provide a gas pressure output. The electron source can be positioned at an end of the ionization volume, such that the exposure of the electron source to atom flux sputtered off the collector electrode and envelope surface is minimized. Alternatively, the ionization gauge can include a first shade outside of the ionization volume, the first shade being located between the electron source and the collector electrode, and, optionally, a second shade between the envelope and the electron source, such that atoms sputtered off the envelope are inhibited from depositing on the electron source.