A jet flow generation device includes: a discharge electrode; a reference electrode that is disposed away from the discharge electrode; a power supply circuit that generates an output voltage to control a potential difference between the discharge electrode and the reference electrode; a controller that switches the output voltage of the power supply circuit between a first voltage that does not induce corona discharge between the discharge electrode and the reference electrode and a second voltage that induces corona discharge between the discharge electrode and the reference electrode; and a case housing at least the reference electrode has an injection port that injects an ion wind of ions generated by the corona discharge.

An ion pump with a housing enclosing an interior, a gas inlet having a through-hole extending into the interior of the ion pump, at least one cathode, at least one anode positioned in proximity to the at least one cathode, a magnet disposed on an opposite side of the at least one cathode from the anode, and a blocking shield disposed between the gas inlet and the at least one cathode. The blocking shield is electrically connected to the at least one anode. An associated method installs the blocking shield by inserting components of the blocking shield assembly through the gas inlet, and assembling (inside the interior of the ion pump) the inserted components to form the blocking shield.

The invention relates to an ionizing pump stage, in particular for a vacuum pump, comprising an inlet for gas entering into the pump stage; an ionizing section communicating with the inlet in a gas-conductive manner and an ionizing device for ionizing the gas entered into the ionizing section; an acceleration device for accelerating the ionized gas present in the ionizing section in the conveying direction; and a neutralizing section following the ionizing section in the conveying direction and communicating with the ionizing section in a gas-conductive manner and a neutralizing device for the electrical neutralizing of the ionized gas entering into the neutralizing section.

The invention relates to an ionizing pump stage, in particular for a vacuum pump, comprising an inlet for gas entering into the pump stage; an ionizing section communicating with the inlet in a gas-conductive manner and an ionizing device for ionizing the gas entered into the ionizing section; an acceleration device for accelerating the ionized gas present in the ionizing section in the conveying direction; and a neutralizing section following the ionizing section in the conveying direction and communicating with the ionizing section in a gas-conductive manner and a neutralizing device for the electrical neutralizing of the ionized gas entering into the neutralizing section.

A cold-atom cell is formed by machining a block of silicon to define sites for an atom source chamber, an atom manipulation chamber, and an ion-pump chamber. A polished silicon panel is frit-bonded to an unpolished (due to machining) chamber wall (which would be difficult and costly to polish). The polished panel can then serve as a reflector or a sight for anodic bonding. A solid-phase atom source provides for vapor phase atoms in the source chamber. The source chamber also includes carbon and gold to regulate the atom pressure by sorbing and desorbing thermal atoms. The atom manipulation chamber includes components for magneto-optical trap and an atom chip, e.g., for forming a Bose-Einstein condensate. The ion-pump chamber serves as the site for an ion pump. By integrating the ion pump into the body of the cold-atom cell, a more compact, reliable, and robust cold-atom cell is achieved. In addition to the embodiment just described, several variations and alternatives are presented and within the scope of the claims.

A cold-atom cell is formed by machining a block of silicon to define sites for an atom source chamber, an atom manipulation chamber, and an ion-pump chamber. A polished silicon panel is frit-bonded to an unpolished (due to machining) chamber wall (which would be difficult and costly to polish). The polished panel can then serve as a reflector or a sight for anodic bonding. A solid-phase atom source provides for vapor phase atoms in the source chamber. The source chamber also includes carbon and gold to regulate the atom pressure by sorbing and desorbing thermal atoms. The atom manipulation chamber includes components for magneto-optical trap and an atom chip, e.g., for forming a Bose-Einstein condensate. The ion-pump chamber serves as the site for an ion pump. By integrating the ion pump into the body of the cold-atom cell, a more compact, reliable, and robust cold-atom cell is achieved. In addition to the embodiment just described, several variations and alternatives are presented and within the scope of the claims.

A jet flow generation device includes: a discharge electrode; a reference electrode that is disposed away from the discharge electrode; a power supply circuit that generates an output voltage to control a potential difference between the discharge electrode and the reference electrode; a controller that switches the output voltage of the power supply circuit between a first voltage that does not induce corona discharge between the discharge electrode and the reference electrode and a second voltage that induces corona discharge between the discharge electrode and the reference electrode; and a case housing at least the reference electrode has an injection port that injects an ion wind of ions generated by the corona discharge.

A jet flow generation device includes: a discharge electrode; a reference electrode that is disposed away from the discharge electrode; a power supply circuit that generates an output voltage to control a potential difference between the discharge electrode and the reference electrode; a controller that switches the output voltage of the power supply circuit between a first voltage that does not induce corona discharge between the discharge electrode and the reference electrode and a second voltage that induces corona discharge between the discharge electrode and the reference electrode; and a case housing at least the reference electrode has an injection port that injects an ion wind of ions generated by the corona discharge.

A system has a linear accelerator, ion pump and a compensating magnet. The ion pump includes an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile. The compensating magnet has a position, a shape, an orientation, and a magnetic field profile, where at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet reduce at least one component of a magnetic field in the linear accelerator resulting from the ion pump magnet.

A vacuum exhaust method is for decreasing a pressure in a processing chamber in which a mounting table configured to mount thereon a substrate is provided by using a gas exhaust unit. The vacuum exhaust method includes mounting a non-evaporated getter (NEG) on the mounting table, and adsorbing an active gas in the processing chamber on the NEG mounted on the mounting table. In the adsorbing the active gas, the NEG is maintained at a predetermined temperature.