An IPL apparatus utilizing a Pulse Forming Network (PFN) for generating a plurality of light pulse sequences, comprising a treatment unit comprising one or more lamps adapted to emit a plurality of light pulses towards a treatment face of the IPL apparatus, a PFN and a control unit adapted to operate the PFN to generate a regulated energized pulse driven to the lamp(s). The regulated energized pulse having a desired multi-level voltage waveform with a maximum voltage level and a minimum voltage level which is in a range of 30-50 percent of the maximum voltage level. Rapidly varying heat is induced by a sequence of the plurality of light pulses emitted by the lamp(s) according to the multi-level voltage waveform.

To provide a light irradiation device using a plurality of flash lamps in which a structure that can emit high intensity light as a whole and enables a flash lamp to be used for a practical lifetime without increasing an input current to each lamp is adopted.

A light emission surface is provided on a distal end on a second electrode introducing part side of a light-emitting tube of a flash lamp including a first electrode introducing part and the second electrode introducing part, and a plurality of flash lamps are arranged in a standing manner on a top plate of a processing chamber so that the light emission surface faces the inside of the processing chamber.

A high brightness laser-sustained broadband light source includes a gas containment structure and a pump laser configured to generate a pump beam including illumination of a wavelength at least proximate to a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source includes one or more anamorphic illumination optics configured to focus the pump beam into an approximately elliptical beam waist positioned in or proximate to the center of the gas containment structure. The broadband light source includes one or more first collection optics configured to collect broadband radiation emitted by the plasma in a direction substantially aligned with a longer axis of the elliptical beam waist.

The light source contains a gas filled chamber with a region of radiating plasma sustained by a focused beam of a CW laser. The means for plasma ignition is a pulsed laser system generating a first and a second laser beams focused in the chamber. The first laser beam provides the optical breakdown, after which the second laser beam ignites the plasma, whose volume and density are sufficient for stationary plasma sustenance by CW laser after finishing the second laser pulse. Preferably, the first laser beam is generated in Q-switching mode and the second laser beam is generated in free-running mode. The technical result consists in ensuring high reliability of igniting the plasma, in creating in this basis electrodeless high-brightness broadband light sources with the high spatial and power stability, and in providing an ability to collect broadband plasma radiation in a spatial angle of more than 9 sr.

A product having at least one plasma lamp that includes plates that are approximately parallel, with at least one array of microcavities formed in a surface of at least one plate. When desirable, the plates are separated a fixed distance by spacers with at least one spacer being placed near the plate's edge to form a hermetic seal therewith. A gas makes contact with the microcavity array. Electrodes capable of delivering a time-varying voltage are located such that the application of the time-varying voltage interacts with the gas to form a glow discharge plasma in the microcavities and the fixed volume between the plates. The glow discharge plasma efficiently and uniformly emits radiation that is predominantly in the UV/VUV spectral range with at least a portion of the radiation being emitted from the plasma lamp.

The present invention has as its object the provision of an ultraviolet sterilizer that can reduce ultraviolet light in a wavelength region of 230 to 300 nm, which is harmful to the human body, and can output effective light in a wavelength region of 200 to 230 nm with high emission intensity.

The ultraviolet sterilizer of the present invention is an ultraviolet sterilizer comprising: an ultraviolet light source; a lamp storage chamber for storing the ultraviolet light source; and alight guiding part for guiding light from the ultraviolet light source, in which a band pass filter for reducing ultraviolet light in a wavelength region harmful to a human body is provided at least one of a position between the light guiding part and the lamp storage chamber and a position of a light outputting leading end of the light guiding part, and an inner surface of the light guiding part is formed from an ultraviolet absorbing member that absorbs the ultraviolet light in the wavelength region harmful to the human body.

A system for pumping laser sustained plasma and enhancing one or more selected wavelengths of output illumination generated by the laser sustained plasma is disclosed. In embodiments, the system includes one or more pump modules configured to generate pump illumination for the laser sustained plasma and one or more enhancing illumination sources configured to generate enhancing illumination at one or more selected wavelengths. The pump illumination may be directed along one or more pump illumination paths that are non-collinear to an output illumination path of the output illumination. The enhancing illumination may be directed along an illumination path that is collinear to the output illumination path of the output illumination so that the enhancing illumination is combined with the output illumination, thereby enhancing the output illumination at the one or more selected wavelengths.

An apparatus for generating filtered light may include a broadband illumination source configured to generate broadband illumination and a total internal reflection (TIR) filter formed from a material at least partially transparent to the broadband illumination. The TIR filter may include one or more input faces oriented to receive the broadband illumination. The TIR filter may further be oriented to reflect wavelengths of the broadband illumination beam below a selected cutoff wavelength on one or more filtering faces as filtered broadband illumination and provide the filtered broadband illumination beam through one or more output faces. The cutoff wavelength may further be selected based on total internal reflection on the one or more faces.

An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.

A plasma lamp includes plates that are approximately parallel, with at least one array of microcavities formed in a surface of at least one plate. When desirable, the plates are separated a fixed distance by spacers with at least one spacer being placed near the plate's edge to form a hermetic seal therewith. A gas makes contact with the microcavity array. Electrodes capable of delivering a time-varying voltage are located on the surface of each plate. At least one electrode is located on an exterior surface of at least one interior plate. Optionally, protective windows may be placed over the electrodes. The application of the time-varying voltage interacts with the gas to form a glow discharge plasma in the microcavities and the fixed volume between the plates (when present). The glow discharge plasma efficiently and uniformly emits UV/VUV radiation over the entire surface of the lamp.