This charged particle beam device comprises: a charged particle beam source that generates charged particle beams; an objective lens in which coil current is inputted to focus the charged particle beams on a sample; a control unit that controls the coil current; a hysteresis characteristics storage unit that stores hysteresis characteristics information of the objective lens; a history information storage unit that stores history information relating to the coil current; and an estimating unit that estimates the magnetic field generated by the objective lens based on the coil current, the history information, and the hysteresis characteristic information, and has a magnetic field correction unit that, when the absolute value of the change amount of the coil current is greater than a prescribed value, further adds to the magnetic field estimated by the estimating unit a correction value according to the coil current and its change amount, correcting the magnetic field generated by the objective lens.

A charged particle assessment tool includes: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.

Systems or techniques are provided for magnetic magnification control of electron microscopes. In various embodiments, a system can comprise an electron microscope that diffracts electrons through an analytical sample and modifies, using one or more magnetic immersion fields, trajectories of the electrons onto an electron detector.

A method including configuring a transmission electron microscope according to first acquisition settings that comprise at least one of a first dose rate or a first operating mode. The method further including operating, during a first time period, the electron microscope to image a radiation-sensitive sample in accordance with the first acquisition settings. The method further including, after the first time period, configuring the electron microscope according to second acquisition settings that comprise at least one of a second dose rate different than the first dose rate or a second operating mode different than the first operating mode. The method further including operating, during a second time period, the electron microscope to image the radiation-sensitive sample in accordance with the second acquisition settings. The method further including generating image data based on first data and second data respectively collected during the first time period and the second time period

A multiple particle beam system comprises a magnetic immersion lens and a detection system. A cross-over of the second individual particle beams is provided in the secondary path between the beam switch and the detection system, and a contrast aperture with a central cutout for cutting out the secondary beams is arranged in the region of the cross-over. A contrast correction lens system with a first magnetic contrast correction lens is arranged between the objective lens and the contrast aperture. The contrast correction lens system is configured to generate a magnetic field with an adjustable strength and correct beam tilts of the secondary beams in the cross-over in relation to the optical axis of the multiple particle beam system. It is possible to obtain a more uniform contrast for different individual images and the contrast can be improved overall.