H01J2237/16

Charged-particle beam apparatus

The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.

Semiconductor Processing Apparatus

A semiconductor processing apparatus according to the present invention includes a main body cover that covers a main body device and a control device. The main body cover has a transfer opening for transferring a semiconductor, and the main body cover further has an intake port that generates an air flow in a horizontal direction inside the main body cover.

Vacuum chamber arrangement for charged particle beam generator

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

Charged-Particle Beam Apparatus
20200185189 · 2020-06-11 ·

The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.

Examination container and electron microscope

An examination container includes a main body, a cover and a carrier stage. The main body has an accommodating trough for holding a sample. The cover is detachably connected to the main body to close the accommodating trough. The cover has a first through-hole penetrating through an outer surface and an inner surface of the cover, and includes a membrane arranging on the inner surface of the cover. The membrane has a second through-hole opposite to the first through-hole for passing an electron beam through the first through hole and the second through hole. The carrier stage is installed in a position corresponding to the second through-hole. The carrier stage is detachably arranged in the accommodating trough for a variety of examination purposes. An electron microscope using the abovementioned examination container is also disclosed.

Vacuum chamber arrangement for charged particle beam generator

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

Vacuum chamber arrangement for charged particle beam generator

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

High voltage feedthrough assembly, time-resolved transmission electron microscope and method of electrode manipulation in a vacuum environment

A high voltage feedthrough assembly for providing an electric potential in a vacuum environment comprises a flange connector being adapted for a connection with a vacuum vessel, a vacuum-tight insulator tube having a longitudinal extension with a first end facing to the flange connector and a second end being adapted for projecting into the vacuum vessel, and an electrode device coupled to the second end of the insulator tube, wherein the electrode device has a front electrode, including a photocathode or a field emitter tip and facing to the vacuum vessel and a cable adapter for receiving a high-voltage cable, wherein a flexible tube connector is provided for a vacuum-tight coupling of the insulator tube with the flange connector, and a manipulator device is connected with the insulator tube for adjusting a geometrical arrangement of the insulator tube relative to the flange connector.