A multi-degree-of-freedom sample holder, comprising a housing and a rotating shaft, is disclosed. A frame is provided between the housing and the rotating shaft, and the frame is coaxial with the housing and rotating shaft. The present invention has multiple degrees of freedom such as high-precision translational freedom of the sample along the X-axis, Y-axis and Z-axis, and 360° rotation of the sample around the axis, etc. The sample is always aligned with the sample holder shaft during the rotation, and the static electricity accumulated on the sample can be led out.

A sample stage includes a sample holder that accommodates a sample and a first drive module, a second drive module, and a third drive module that are radially connected to the sample holder and allow the sample holder to have translational degrees of freedom in three directions and rotational degrees of freedom in at least two directions.

Disclosed herein are systems and methods for pulsing electron beams and synchronizing the pulsed electron beam with scanning a sample at a plurality of scan locations. An example method at least includes pulsing an electron beam to form a pulsed electron beam having a pulse period, moving the pulsed electron beam to interact with a sample at a plurality of locations, the interaction at each of the plurality of locations occurring for a dwell time, and synchronizing data acquisition of the interaction of the pulsed electron beam with the sample based on the pulsing and the translating of the electron beam, wherein the dwell time is based on a derivative of the pulse period.

The invention relates to a method of manipulating a sample in an evacuated chamber of a charged particle apparatus, the method performed in said evacuated chamber, the method including: providing a sample on a first substrate; bringing an extremal end of a manipulator in contact with the sample; attaching the sample to said extremal end, the attaching being a removable attaching; lifting the sample attached to the extremal end of the manipulator from the first substrate and transport the sample to a second substrate; attaching the sample to the second substrate; and detaching the sample from the extremal end of the manipulator. At least one of the steps of attaching the sample being performed solely by bringing the sample into contact with a bundle of carbon nanotubes.

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

A retainer is placed on a retainer holding portion formed on a sample chip worktable. With an operation of a button, a take-out support mechanism operates. That is, an upthrust pin moves upward. With this process, an orientation of a sample chip stored in the retainer is changed from a horizontal orientation to an inclined orientation. A plurality of openings through which the upthrust pin passes are formed in the retainer.

A detector includes a semiconductor layer included in a detection region and a peripheral region, and having a first surface and a second surface opposite to the first surface, and a wiring structure included in at least the detection region, and disposed between a space on the first surface side with respect to the semiconductor layer and a space on the second surface side with respect to the semiconductor layer, wherein a thickness of the semiconductor layer in at least a part of the detection region is smaller than a thickness of the peripheral region including the semiconductor layer, and the thickness of the semiconductor layer is larger than a distance between the first surface in the detection region and the space on the first surface side, and a distance between the second surface in the detection region and the space on the second surface side.

A device for providing electrons and its method of making. The device includes an optical fiber with a tip and a metallic arrangement arranged at the tip. The metallic arrangement is arranged to be excited by an energy source to emit electrons or electron beams.

A sample chip for electron microscope includes a first substrate having a film layer, a buffer layer, and a body layer, a spacing layer positioned below the first substrate, and a second substrate positioned below the spacing layer. The buffer layer is positioned on the film layer and has a buffer opening corresponding to an area of the film layer, the body layer is positioned on the buffer layer and has a body opening corresponding to the buffer opening of the buffer layer to expose the area of the film layer corresponding to the buffer opening, the body layer has a thickness of 10 m-800 m, and etching properties of the film layer, the buffer layer, and the body layer are different. A specimen accommodating space is defined in the spacing layer to correspond to the area of the film layer corresponding to the buffer opening.

Provided herein are nanoparticle compositions comprising an organophosphate compound and pharmaceutically acceptable carriers.