Patent classifications
H01J2237/26
Harmonic line noise correction for electron energy loss spectrometer
Electron Energy Loss Spectrometer including a correction circuit for fundamental and third harmonic line noise is described. Various circuits for creating the correction signals are also described. A method of correcting for fundamental and third harmonic line noise is also described.
OPTICAL OBJECTIVE LENS
An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.
Sample Exchange Device and Charged Particle Beam Device
A sample exchange device includes a first transport mechanism that includes a grip portion that grips a sample holding member and transports a sample holding member to a sample exchange chamber, a cooling unit that cools the sample exchange chamber, fiber sensors that detect whether or not the grip portion of the first transport mechanism grips the sample holding member in the sample exchange chamber, and a control unit. The control unit turns on the fiber sensors when the grip portion of the first transport mechanism enters the sample exchange chamber and turns off the fiber sensors after it is detected whether or not the grip portion of the first transport mechanism grips the sample holding member.
PACKAGING OF SEMICONDUCTOR X-RAY DETECTORS
Disclosed herein is an image sensor comprising: a plurality of packages arranged in a plurality of layers; wherein each of the packages comprises an X-ray detector mounted on a printed circuit board (PCB); wherein the packages are mounted on one or more system PCBs; wherein within an area encompassing a plurality of the X-ray detectors in the plurality of packages, a dead zone of the packages in each of the plurality of layers is shadowed by the packages in the other layers.
X-ray and particle shield for improved vacuum conductivity
An x-ray shield for improved vacuum conductivity is disclosed herein. An example x-ray shield includes at least one elongate member formed from high atomic weight material shaped into a twist with at least 180 of twist.
Aberration correcting device for an electron microscope and an electron microscope comprising such a device
The invention relates to an aberration correcting device for correcting aberrations of focusing lenses in an electron microscope. The device comprises a first and a second electron mirror, each comprising an electron beam reflecting face. Between said mirrors an intermediate space is arranged. The intermediate space comprises an input side and an exit side. The first and second electron mirrors are arranged at opposite sides of the intermediate space, wherein the reflective face of the first and second mirror are arranged facing said intermediate space. The first mirror is arranged at the exit side and the second mirror is arranged at the input side of the intermediate space. In use, the first mirror receives the electron beam coming from the input side and reflects said beam via the intermediate space towards the second mirror. The second mirror receives the electron beam coming from the first mirror, and reflects the electron beam via the intermediate space towards the exit side. The incoming electron beam passes said second mirror at a position spaced apart from the reflection position on the second mirror. At least one of the electron mirrors is arranged to provide a correcting aberration to a reflected electron beam.
Packaging of semiconductor X-ray detectors
Disclosed herein is an image sensor comprising: a plurality of packages arranged in a plurality of layers; wherein each of the packages comprises an X-ray detector mounted on a printed circuit board (PCB); wherein the packages are mounted on one or more system PCBs; wherein within an area encompassing a plurality of the X-ray detectors in the plurality of packages, a dead zone of the packages in each of the plurality of layers is shadowed by the packages in the other layers.
ELECTRON MICROSCOPE SAMPLE HOLDER FLUID HANDLING WITH INDEPENDENT PRESSURE AND FLOW CONTROL
A fluid metering system for gas independent pressure and flow control through an electron microscope sample holder includes: a pressure control system that supplies gas; an inlet line providing gas from the pressure control system to the sample holder; an outlet line receiving gas from the sample holder; and a variable leak valve that controls gas flow in the outlet line. The gas flows from an upstream tank of the pressure control system through the sample holder and variable leak valve to a downstream tank of the pressure control system due to the pressure difference of the two tanks as the variable leak valve meters flow in the outlet line. Flow rates are established by monitoring pressure changes at source and collection tanks of known volumes with gas independent pressure gauges. A method of directing the gas flow to a residual gas analyzer (RGA) is also presented.
Electron microscope
The present invention is to provide an electron microscope capable of being activated to an appropriate temperature by disposing an NEG at an extraction electrode around an electron source. The present invention is an electron microscope provided with an electron gun, in which the electron gun includes an electron source, an extraction electrode, and an accelerating tube, the accelerating tube is connected to the extraction electrode at a connection portion, the extraction electrode includes a first heater and a first NEG, and the first heater and the first NEG are spaced apart in an axial direction of an electron beam emitted from the electron source.
Charged particle beam device
An object of the present invention is to provide a charged particle beam device capable of correcting an image drift caused by stage deformation or the like during imaging immediately after stage movement. In order to achieve the above object, proposed is a charged particle beam device including: a sample chamber; a sample stage arranged in the sample chamber; a charged particle beam source which releases a charged particle beam; a deflector which deflects the charged particle beam released from the charged particle beam source; a focusing lens which focuses the charged particle beam; and a control device that controls the sample stage and the deflector, in which the control device calculates a deflection signal to be supplied to the deflector based on a thrust information when driving of the sample stage and a coefficient assigned for each position of the sample stage.