Structures and methods for reducing thermal expansion mismatch during chip scale packaging are disclosed. In one example, a semiconductor structure is disclosed. The semiconductor structure includes a first metal layer over a substrate, a dielectric region, and a polymer region. The first metal layer comprises a first device metal structure. The dielectric region is formed over the first metal layer. The polymer region is formed over the dielectric region. The dielectric region comprises a plurality of metal layers and an inter-metal dielectric layer comprising dielectric material between each pair of two adjacent metal layers in the plurality of metal layers. Each of the plurality of metal layers comprises a dummy metal structure over the first device metal structure. The dummy metal structures in each pair of two adjacent metal layers in the plurality of metal layers shield respectively two non-overlapping portions of the first device metal structure from a top view of the semiconductor structure.

Integrated circuit (IC) packages employing a package substrate with embedded deep trench capacitor(s) (DTC(s)) face-up to a semiconductor die (“die”) for connection, and related fabrication methods. A DTC is embedded in a cavity in the package substrate and coupled to a die. To minimize connection path length between the DTC and the die to reduce impedance and improve capacitor performance, the DTC is disposed in a cavity in the package substrate face-up towards the die. The DTC interconnects of the DTC are oriented face-up towards the die in a vertical direction. Also, to minimize connection path length between the DTC and the die, the DTC can be disposed in the package substrate underneath the die in the vertical direction. The DTC interconnects can be disposed in a die-side metallization layer of the package substrate and coupled to external, die-side interconnects of the package substrate.

Integrated circuit (IC) packages employing a package substrate with embedded deep trench capacitor(s) (DTC(s)) face-up to a semiconductor die (“die”) for connection, and related fabrication methods. A DTC is embedded in a cavity in the package substrate and coupled to a die. To minimize connection path length between the DTC and the die to reduce impedance and improve capacitor performance, the DTC is disposed in a cavity in the package substrate face-up towards the die. The DTC interconnects of the DTC are oriented face-up towards the die in a vertical direction. Also, to minimize connection path length between the DTC and the die, the DTC can be disposed in the package substrate underneath the die in the vertical direction. The DTC interconnects can be disposed in a die-side metallization layer of the package substrate and coupled to external, die-side interconnects of the package substrate.

An integrated circuit device includes a semiconductor substrate having a first device region, a second device region, and a scribe line region therein. The scribe line region, which extends between the first and second device regions, includes a first edge region adjacent the first device region, a second edge region adjacent the second device region and a cutting region extending between the first and second device regions. A lower interlayer insulating layer is provided on the first and second device regions and on the scribe line region. A first multi-level guard ring is provided, which at least partially surrounds the first device region, when viewed from a plan perspective. An insulating structure is provided, which has a recess therein. The recess extends adjacent the first multi-level guard rings and exposes an upper surface of the lower interlayer insulating layer.

The disclosure describes devices and methods of providing a DC bias voltage in a microphone assembly. Particularly, one implementation of such a device may be implemented on an integrated circuit that includes a direct current (DC) bias circuit. The DC bias circuit may be coupled to a transducer and configured to supply a DC bias signal to the transducer. The DC bias circuit includes a multi-stage charge pump and a low pass filter (LUFF) circuit. The multi-stage charge pump includes transistors that are fabricated with deep trench isolation (DTI).

Implementations of methods of making a semiconductor device may include: providing a partial semiconductor wafer. The method may also include providing a wafer holder including a tape portion with one or more openings through the tape portion. The method may include mounting the partial semiconductor wafer over the one or more openings in the tape portion of the wafer holder and providing an electrical connection to the partial semiconductor wafer through the one or more openings in the tape portion during probe test.

According to an embodiment, a semiconductor device includes a first semiconductor region of a first conductivity type, a second semiconductor region of the first conductivity type, a first metal portion, a third semiconductor region of a second conductivity type, a first electrode, a fourth semiconductor region of the second conductivity type, and a second electrode. The first semiconductor region includes a first portion and a second portion. The second semiconductor region is provided on the first semiconductor region. The third semiconductor region is provided on part of the second semiconductor region. The first metal portion is provided in the first semiconductor region. The third semiconductor region is positioned on the first portion. The fourth semiconductor region is provided on another part of the second semiconductor region. The fourth semiconductor region is separated from the third semiconductor region. The fourth semiconductor region is positioned on the second portion.

The present invention provides a test pad structure of chip, which comprises a plurality of first internal test pads, a plurality of second internal test pads, a plurality of first extended test pads, and a plurality of second extended test pads. The first internal test pads and the second internal test pads are disposed in a chip. The second internal test pads and the first internal test pads are spaced by a distance. The first extended test pads are connected with the first internal test pads. The second extended test pads are connected with the second internal test pads. The first extended test pads and the second extended test pads may increase the contact area to be contacted by probes. Signals or power are transmitted to the first internal test pads and the second internal test pads via the first extended test pads and the second extended test pads for the probes to test the chip.

Wafer processing techniques, or methods for forming semiconductor rides, are disclosed for fabricating plated pillar dies having die-level electromagnetic interference (EMI) shield layers. In embodiments, the method includes depositing a metallic seed layer over a semiconductor wafer and contacting die pads thereon. An electroplating process is then performed to compile plated pillars on the metallic seed layer and across the semiconductor wafer. Following electroplating, selected regions of the metallic seed layer are removed to produce electrical isolation gaps around a first pillar type, while leaving intact portions of the metallic seed layer to yield a wafer-level EMI shield layer. The semiconductor wafer is separated into singulated plated pillar dies, each including a die-level EMI shield layer and plated pillars of the first pillar type electrically isolated from the EMI shield layer.

A semiconductor die package and a method of forming the same are provided. The semiconductor die package includes a package substrate, an interposer substrate over the package substrate, semiconductor dies over the interposer substrate, and an underfill element over the interposer substrate and between the semiconductor dies and interposer substrate. The semiconductor die package also includes a ring structure and one or more lid structures separated from the ring structure. The ring structure is coupled to the package substrate to control warpage. The lid structures are coupled to the top surfaces of the semiconductor dies to control warpage and help heat dissipation. In addition, the lid structures define a gap to allow a portion of the underfill element between the adjacent semiconductor dies to be exposed, so that stress concentration on that portion can be avoided or reduced. Accordingly, the reliability of the semiconductor die package is improved.