A metal-dielectric bonding method includes providing a first semiconductor structure including a first semiconductor layer, a first dielectric layer on the first semiconductor layer, and a first metal layer on the first dielectric layer, where the first metal layer has a metal bonding surface facing away from the first semiconductor layer; planarizing the metal bonding surface; applying a plasma treatment on the metal bonding surface; providing a second semiconductor structure including a second semiconductor layer, and a second dielectric layer on the second semiconductor layer, where the second dielectric layer has a dielectric bonding surface facing away from the second semiconductor layer; planarizing the dielectric bonding surface; applying a plasma treatment on the dielectric bonding surface; and bonding the first semiconductor structure with the second semiconductor structure by bonding the metal bonding surface with the dielectric bonding surface.

A semiconductor device according to the present disclosure includes: a first charge accumulation unit capable of accumulating a charge; a first initialization unit that is connected to the first charge accumulation unit and initializes the first charge accumulation unit; and a first voltage switching unit that is connected to the first initialization unit and is capable of selectively supplying a first voltage and a second voltage different from the first voltage to the first initialization unit.

Disclosed are semiconductor devices and semiconductor packages. The semiconductor device comprises a semiconductor substrate that includes a stack region and a pad region, a peripheral circuit structure that includes a plurality of peripheral circuits on the semiconductor substrate, a cell array structure on the peripheral circuit structure, and a redistribution layer on the cell array structure and including a redistribution dielectric layer and a redistribution pattern on the redistribution dielectric layer. The redistribution dielectric layer covers an uppermost conductive pattern of the cell array structure. The redistribution pattern is connected to the uppermost conductive pattern. A thickness in a vertical direction of the redistribution layer on the pad region is greater than that of the redistribution layer on the stack region.

An electronic device includes a first integrated circuit (IC) die and a second IC die. The first IC die includes a first set of contact pads arranged in a first geometrical pattern on a first surface of the first IC die, the second IC die includes a second set of the contact pads that are arranged, on a second surface of the second IC die, in a second geometrical pattern that is a mirror image of the first geometrical pattern. The second surface of the second IC die is facing the first surface of the first IC die, and the contact pads of the first and second sets are aligned with one another and mounted on one another.

A semiconductor memory device according to an embodiment includes a substrate, a first conductor layer, second conductor layers, a first semiconductor layer, a pillar, and a contact. The pillar has a portion provided to penetrate the second conductor layers and the first semiconductor layer. The contact is electrically connected to the pillar and the first conductor layer. The pillar includes a second semiconductor layer, a first insulator layer provided at least between the second semiconductor layer and the second conductor layers, and a third semiconductor layer provided between the second semiconductor layer and the first semiconductor layer and in contact with each of the second semiconductor layer and the first semiconductor layer.

In certain aspects, a memory device includes an array of memory cells and a plurality of peripheral circuits coupled to the array of memory cells. The peripheral circuits include a first peripheral circuit including a recess gate transistor. The peripheral circuits also include a second peripheral circuit including a flat gate transistor.

In certain aspects, a method for forming a three-dimensional (3D) memory device is disclosed. A first semiconductor structure including an array of NAND memory strings is formed on a first substrate. A second semiconductor structure including a recess gate transistor is formed on a second substrate. The recess gate transistor includes a recess gate structure protruding into the second substrate. The first semiconductor structure and the second semiconductor structure are bonded in a face-to-face manner, such that the array of NAND memory strings is coupled to the recess gate transistor across a bonding interface.

In certain aspects, a three-dimensional (3D) memory device includes a first semiconductor structure, a second semiconductor structure, and a bonding interface between the first and the second semiconductor structures. The first semiconductor structure includes an array of NAND memory strings, a first peripheral circuit of the array of NAND memory strings including a first transistor, a polysilicon layer between the array of NAND memory strings and the first peripheral circuit, and a first semiconductor layer in contact with the first transistor. The polysilicon layer is in contact with sources of the array of NAND memory strings. The second semiconductor structure includes a second peripheral circuit of the array of NAND memory strings including a second transistor, and a second semiconductor layer in contact with the second transistor. The second semiconductor layer is between the bonding interface and the second peripheral circuit. The first semiconductor layer is between the polysilicon layer and the second semiconductor layer.

A three-dimensional 3D memory device includes a first semiconductor structure and a second semiconductor structure. The first semiconductor structure includes a first semiconductor layer and an array of NAND memory strings. The second semiconductor structure is under a second side of the first semiconductor layer. The second side of the first semiconductor layer is opposite to the first side of the first semiconductor layer. The second semiconductor structure includes a second semiconductor layer, a first peripheral circuit, and a second peripheral circuit. The first peripheral circuit includes a first transistor in contact with a first side of the second semiconductor layer. The second peripheral circuit includes a second transistor in contact with a second side of the second semiconductor layer. The second side of the second semiconductor layer is opposite to the first side of the second semiconductor layer.

Disclosed herein is a semiconductor device, including: a first substrate including a first electrode, and a first insulating film configured from a diffusion preventing material for the first electrode and covering a periphery of the first electrode, the first electrode and the first insulating film cooperating with each other to configure a bonding face; and a second substrate bonded to and provided on the first substrate and including a second electrode joined to the first electrode, and a second insulating film configured from a diffusion preventing material for the second electrode and covering a periphery of the second electrode, the second electrode and the second insulating film cooperating with each other to configure a bonding face to the first substrate.