Embodiments of the present disclosure are based on recognition that using a glass support structure at the back side of an IC structure with TFT memory may advantageously reduce parasitic effects of front end of line (FEOL) devices (e.g., FEOL transistors) in the IC structure, compared to using a silicon-based (Si) support structure at the back. Arranging a support structure with a dielectric constant lower than that of Si at the back of an IC structure may advantageously decrease various parasitic effects associated with the FEOL devices of the IC structure, since such parasitic effects are typically proportional to the dielectric constant of the surrounding medium.

This power supply IC is a semiconductor integrated circuit device serving as a main part for controlling a switching power supply and is formed by integrating a feedback resistor and an output feedback control unit on a single semiconductor substrate, said feedback resistor generating a feedback voltage by dividing the output voltage of the switching power supply (or the induced voltage appearing across an auxiliary winding provided on the primary side of a transformer included in an insulation-type switching power supply), said output feedback control unit performing output feedback control of the switching power supply in accordance with the feedback voltage. The feedback resistor is a polysilicon resistor having a withstand voltage of 100 V or more. A high-voltage region having higher withstand voltage in the substrate thickness direction than the other region is formed in the semiconductor substrate, and the feedback resistor is formed on the high-voltage region.

A semiconductor device includes a semiconductor chip and a package. The semiconductor chip includes a signal processing circuit, a plurality of pads, and a first resistor which arc formed on a semiconductor substrate. On the semiconductor chip, there is no shot-circuiting between a first pad and a second pad of the plurality of pads. A signal input terminal of the signal processing circuit is connected to the second pad. The first resistor is provided between a reference potential supply terminal for supplying a power supply potential and the first pad. A specific terminal of the plurality of terminals of the package is connected to the first pad by a first bonding wire, and is connected to the second pad by a second bonding wire.

A method is provided for forming a thin film resistor (TFR) in an integrated circuit (IC) device. A TFR film is formed and annealed over an IC structure including IC elements and IC element contacts. At least one TFR cap layer is formed, and a TFR etch defines a TFR element from the TFR film. A TFR contact etch forms TFR contact openings over the TFR element, and a metal layer is formed over the IC structure and extending into the TFR contact openings to form metal contacts to the IC element contacts and the TFR element. The TFR cap layer(s), e.g., SiN cap and/or oxide cap formed over the TFR film, may (a) provide an etch stop during the TFR contact etch and/or (b) provide a hardmask during the TFR etch, which may eliminate the use of a photomask and thereby eliminate post-etch removal of photomask polymer.

An integrated circuit includes a polysilicon resistor having a plurality of segments, including first, second and third segments, the second segment located between and running about parallel to the first and third segments. A first header connects the first and second segments, and a second header connects the second and third segments. A first metal silicide layer located over the first header extends over the first and second segments toward the second header. A second metal silicide layer located over the second header extends over the second and third segments toward the first header. A dielectric layer is located over and contacts the first, second and third segments between the first and second metal silicide layers.

A method of manufacturing an electronic device includes forming a shallow trench isolation (STI) structure on or in a semiconductor surface layer and forming a mask on the semiconductor surface layer, where the mask exposes a surface of a dielectric material of the STI structure and a prospective local oxidation of silicon (LOCOS) portion of a surface of the semiconductor surface layer. The method also includes performing an oxidation process using the mask to oxidize silicon in an indent in the dielectric material of the STI structure and to grow an oxide material on the exposed LOCOS portion of the surface of the semiconductor surface layer.

A semiconductor device includes a capacitor and a resistor. The capacitor includes a first plate, a capacitor dielectric layer disposed over the first plate, and a second plate disposed over the capacitor dielectric layer. The resistor includes a thin film. The thin film of the resistor and the first plate of the capacitor, formed of a same conductive material, are defined in a single patterning process.

A semiconductor device that is of a face-down mounted chip-size package type, discharges electric charges stored in an electric storage device (battery), and has a power loss area ratio of at least 0.4 (W/mm.sup.2) obtained by dividing a power loss (W) in the semiconductor device at time of the discharge by an area (mm.sup.2) of the semiconductor device, the semiconductor device comprising: a field-effect transistor of a horizontal type and a resistor that are connected in series in stated order between an inflow terminal and an outflow terminal; and a control circuit that causes a discharge current to be constant without depending on an applied voltage between the inflow terminal and the outflow terminal. A difference between a maximum temperature of a field-effect transistor portion and a temperature of a resistor portion is within five degrees Celsius in a discharge period.

This semiconductor device includes: a semiconductor substrate of a first conductive type; a first impurity layer of a second conductive type that is formed on a surface of the semiconductor substrate; a second impurity layer of the first conductive type that is formed to surround the first impurity layer on the surface of the semiconductor substrate; an insulating film that covers at least the first impurity layer; a first resistive element that is spiral-shaped and is provided on the insulating film; a second resistive element that is provided on an outer side of the first impurity layer in a planar view of the semiconductor substrate; and a first wiring that couples an end portion of the first resistive element on an outer peripheral side thereof and the second resistive element to each other.

To provide a method for manufacturing a semiconductor device including an oxide semiconductor film having conductivity, or a method for manufacturing a semiconductor device including an oxide semiconductor film having a light-transmitting property and conductivity. The method for manufacturing a semiconductor device includes the steps of forming an oxide semiconductor film over a first insulating film, performing first heat treatment in an atmosphere where oxygen contained in the oxide semiconductor film is released, and performing second heat treatment in a hydrogen-containing atmosphere, so that an oxide semiconductor film having conductivity is formed.