A finger-type semiconductor capacitor array layout includes a first conductive structure and a second conductive structure. The first conductive structure includes longitudinal first conductive strips and lateral power supply strips. The second conductive structure includes longitudinal second conductive strips and P lateral power supply strip(s). The longitudinal first conductive strips and the longitudinal second conductive strips are alternately disposed in a first integrated circuit (IC) layer; and the longitudinal first conductive strips include a first row of strips and a second row of strips. The lateral power supply strips are located in a second IC layer, and coupled to the first and second rows of strips through vias. The P lateral power supply strip(s) is/are located in the second IC layer, and include(s) a first-capacitor-group power supply strip that is coupled to K strip(s) of the longitudinal second conductive strips through K via(s). The P and K are positive integers.

A method for fabricating a MOMCAP includes steps as follows: An Nth metal layer is formed on a substrate according to an Nth expected capacitance value of the Nth metal layer. An Nth capacitance error value between an Nth actual capacitance value of the Nth metal layer and the Nth expected capacitance value is calculated. An N+1th expected capacitance value of an N+1th metal layer is adjusted to form an N+1th actual capacitance value according to the Nth capacitance error value, and the N+1th metal layer with an N+1th actual capacitance value is formed on the Nth metal layer according to the adjusted N+1th expected capacitance value, to make the sum of the Nth actual capacitance value and the N+1th actual capacitance value equal to the sum of the Nth expected capacitance value and the N+1th expected capacitance value. N is an integer greater than 1.

In one example, an electronic device includes a substrate with a substrate front side, a substrate rear side opposite to the substrate front side, a substrate body, and conductive vias extending through the substrate body from the substrate front side to the substrate rear side. A first construct is over the substrate front side and includes a first dielectric structure and first conductors embedded in the first dielectric structure and coupled to the conductive vias. A second construct is over the substrate rear side and includes a second dielectric structure and second conductors embedded in the second dielectric structure and coupled to the conductive vias. One or more of the first conductors or the second conductors define one or more passive devices. Other examples and related methods are also disclosed herein.

The present disclosure provides a semiconductor device with a composite dielectric structure and a method for forming the semiconductor device. The semiconductor device includes a conductive contact disposed over a semiconductor substrate, and a first dielectric layer disposed over the conductive contact. A top surface of the conductive contact is exposed by an opening. The semiconductor device also includes a bottom electrode extending along sidewalls of the opening and the top surface of the conductive contact, and a top electrode disposed over the bottom electrode and separated from the bottom electrode by a dielectric structure. The dielectric structure includes a second dielectric layer and dielectric portions disposed over the second dielectric layer. The dielectric portions cover top corners of the opening and extend partially along the sidewalls of the opening.

A semiconductor device includes a semiconductor substrate, an insulating film disposed above the semiconductor substrate, a temperature detecting element disposed on the insulating film, and an anode side region and a cathode side region respectively located on an anode side and a cathode side of the temperature detecting element. The anode side region or the cathode side region includes one or more capacitance elements, and a sum of capacitance values of the capacitance elements is larger than a capacitance value of the temperature detecting element.

A semiconductor device includes a capacitor and a resistor. The capacitor includes a first plate, a capacitor dielectric layer disposed over the first plate, and a second plate disposed over the capacitor dielectric layer. The resistor includes a thin film. The thin film of the resistor and the first plate of the capacitor, formed of a same conductive material, are defined in a single patterning process.

An apparatus is provided, which includes a stack of a first plurality of layers interleaved with a second plurality of layers. In an example, the first plurality of layers includes conductive material, and the second plurality of layers includes insulating material. In an example, the first plurality of layers includes an upper layer and lower layer. A first via may extend through at least a portion of the stack, where the first via may be in contact with the upper layer and the lower layer. A second via may extend through at least a portion of the stack, where the second via may be isolated from the upper layer and lower layer.

Techniques in accordance with embodiments described herein are directed to semiconductor devices including a layer of aluminum nitride AlN or aluminum gallium nitride AlGaN as a ferroelectric layer and a method of making a thin film of AlN/AlGaN that possesses ferroelectric properties. In a ferroelectric transistor, a thin film of AlN/AlGaN that exhibits ferroelectric properties is formed between a gate electrode and a second semiconductor layer, e.g., of GaN.

A semiconductor wafer manufacturing method including: forming a plurality of trench capacitors at a main surface of a semiconductor wafer, wherein each of the plurality of trench capacitors is configured as unit cells that internally include unit trench capacitors, and wherein a length component in a predetermined direction of a layout pattern of trenches of the plurality of trench capacitors is made equivalent, within a fixed tolerance range, to a length component in a direction that intersects the predetermined direction.

A semiconductor processing system is provided to form a capacitor dielectric layer in a metal-insulator-metal capacitor. The semiconductor processing system includes a precursor tank configured to generate a precursor gas from a metal organic solid precursor, a processing chamber configured to perform a plasma enhanced chemical vapor deposition, and at least one buffer tank between the precursor tank and the processing chamber. The at least one buffer tank is coupled to the precursor tank via a first pipe and coupled to the processing chamber via a second pipe.