Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

Plasma processing and power supply systems and methods are disclosed. The plasma processing system comprises a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator. The plasma processing system also comprises means for frequency tuning the high-frequency generator using a probe signal that is concurrently applied with the power applied to the plasma chamber at the primary frequency.

Disclosed is a resonator for expanding a transfer distance. A conical resonator includes a metal layer configured to operate according to a resonant frequency, and a dielectric layer coupled to the top or bottom of the metal layer to space the metal layer apart from another metal layer without overlap, wherein the metal layer and the dielectric layer have a Swiss-roll structure, and include an input face to which power is supplied on the bottom and an open face on the top.

Filter arrangement comprising an inner electric conductor comprising at least one inner conductor segment, an outer electric conductor at least partly surrounding the inner conductor, at least one dielectric element and at least one coil spring. The at least one dielectric element is arranged sandwiched between at least one inner conductor segment and the outer conductor to form a capacitance between the outer conductor and the inner conductor segment. The at least one coil spring is arranged inside said outer conductor to force the inner conductor segment and the at least one dielectric element against the outer conductor. The at least one coil spring is made from an electrically conducting material to form an inductance and is electrically connected with the inner conductor segment. An antenna feeding network and a multi-radiator antenna comprising such a filter arrangement is also provided.

Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

To provide a wave control medium that can absorb and control wave motion while achieving downsizing and wider bandwidth of a metamaterial and the like.

A wave control medium 5 includes a three-dimensional microstructure having a base 2, a spiral part 3, and a matching element 6 disposed between the base 2 and the spiral part 3, in which the three-dimensional microstructure includes a material selected from any one of a metal, a dielectric, a magnetic body, a semiconductor, and a superconductor, or a combination of a plurality of these materials. The wave control medium 5 can absorb the wave motion by having the matching element 6 disposed between the base 2 and the spiral part 3 to moderate a change in the entire impedance value.

Plasma processing systems and methods are disclosed. The plasma processing system includes a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator.

An EPR resonator for a cylindrical TE01n microwave mode, where n=1, 2, 3, or 4, has: a cylindrical body (10) which has an RF absorption of less than 5% at RFs below 1 kHz, a first plunger (11) delimiting the resonating volume within the body in an axial direction at a first end and a second plunger (12) delimiting the resonating volume within the body at a second end, the second plunger having an opening (13) for inserting an EPR sample. The first and second plunger each has a spiral winding of an electrically conductive filament wherein neither the ends nor neighboring turns of the spiral windings have electrically conductive connections prone to forming electrically closed loops. Using spiral winding plungers for cylindrical TE01n microwave modes provides equivalent functionality compared to conventional plungers, but without creating Eddy currents at frequencies lower than the frequency of the TE01n microwave mode.

A double loop antenna includes a source loop comprising: a spiral-shaped conductive source coil pattern disposed on a top surface of a board, and a source capacitor pattern comprising symmetrical conductive patterns disposed on the top surface and a bottom surface of the board; and a resonance loop comprising: a spiral-shaped conductive resonance coil pattern disposed on the bottom surface of the board, and a resonance capacitor pattern comprising symmetrical conductive patterns disposed on the top surface and the bottom surface of the board, wherein the source coil pattern and the resonance coil pattern are formed on different surfaces of the board.

A double loop antenna includes a source loop comprising: a spiral-shaped conductive source coil pattern disposed on a top surface of a board, and a source capacitor pattern comprising symmetrical conductive patterns disposed on the top surface and a bottom surface of the board; and a resonance loop comprising: a spiral-shaped conductive resonance coil pattern disposed on the bottom surface of the board, and a resonance capacitor pattern comprising symmetrical conductive patterns disposed on the top surface and the bottom surface of the board, wherein the source coil pattern and the resonance coil pattern are formed on different surfaces of the board.