Thin-film mesh for medical devices, including stent and scaffold devices, and related methods are provided. Micropatterned thin-film mesh, such as thin-film Nitinol (TFN) mesh, may be fabricated via sputter deposition on a micropatterned wafer. The thin-film mesh may include slits to be expanded into pores, and the expanded thin-film mesh used as a cover for a stent device. The stent device may include two stent modules that may be implanted at a bifurcated aneurysm such that one module passes through a medial surface of the other module. The thin-film mesh may include pores with complex, fractal, or fractal-like shapes. The thin-film mesh may be used as a scaffold for a scaffold device. The thin-film scaffold may be placed in a solution including structural protein such as fibrin, seeded with cells, and placed in the body to replace or repair tissue.

Osteoconductive synthetic bone grafts are provided in which porous metallic matrices are loaded with an osteoinductive protein. In certain embodiments, the grafts include porous ceramic granules deposited within the matrices.

A method for improving bioactivity of a surface of an implantable object comprising titania, titanium, an alloy of titanium, and/or polytetrafluoroethylene (PTFE) and implantable objects prepared thereby provides forming an accelerated neutral beam derived from an accelerated gas-cluster ion-beam (GCIB) in a reduced-pressure chamber, introducing an implantable object into the reduced-pressure chamber, and irradiating at least a first portion of the surface of said implantable object with a GCIB-derived neutral beam.

A method for improving bioactivity of a surface of an implantable object comprising titania, titanium, an alloy of titanium, and/or polytetrafluoroethylene (PTFE) and implantable objects prepared thereby provides forming an accelerated neutral beam derived from an accelerated gas-cluster ion-beam (GCIB) in a reduced-pressure chamber, introducing an implantable object into the reduced-pressure chamber, and irradiating at least a first portion of the surface of said implantable object with a GCIB-derived neutral beam.

The invention relates to a device for use in the transcatheter treatment of mitral valve regurgitation, specifically a coaptation enhancement element for implantation across the valve; a system including the coaptation enhancement element and anchors for implantation; a system including the coaptation enhancement element, catheter and driver; and a method for transcatheter implantation of a coaptation element across a heart valve.

The invention relates to a device for use in the transcatheter treatment of mitral valve regurgitation, specifically a coaptation enhancement element for implantation across the valve; a system including the coaptation enhancement element and anchors for implantation; a system including the coaptation enhancement element, catheter and driver; and a method for transcatheter implantation of a coaptation element across a heart valve.

An implant comprises a substrate and a coating on a surface of the substrate, and the coating comprises silicon nitride and has a thickness of from about 1 to about 15 micrometer. A method of providing the implant comprises coating a surface of the implant substrate with the coating comprising silicon nitride and having a thickness of from about 1 to about 15 micrometer by physical vapour deposition.

An implant comprises a substrate and a coating on a surface of the substrate, and the coating comprises silicon nitride and has a thickness of from about 1 to about 15 micrometer. A method of providing the implant comprises coating a surface of the implant substrate with the coating comprising silicon nitride and having a thickness of from about 1 to about 15 micrometer by physical vapour deposition.

The method consists of subjecting a coarse-grained titanium semi-product (1) with the pure titanium content of at least 99 wt % to a plastic deformation. In said plastic deformation the transverse cross-section surface area of the titanium semi-product is reduced by hydrostatic extrusion in which the titanium semi-product is the billet (1) extruded through the die (4). The reduction (R) of the transverse cross-section of the titanium billet (1) is realized in at least three but not more than five consecutive hydrostatic extrusion passes at the initial temperature of the billet (1) not above 50° C. and the extrusion velocity not above 50 cm/s. Prior to each hydrostatic extrusion pass, the titanium billet is covered with a friction-reducing agent. During the first hydrostatic extrusion pass, the reduction of the transverse cross-section surface area of the titanium semi-product is at least four, whereas during the second and third hydrostatic extrusion pass it is at least two and a half.

The method consists of subjecting a coarse-grained titanium semi-product (1) with the pure titanium content of at least 99 wt % to a plastic deformation. In said plastic deformation the transverse cross-section surface area of the titanium semi-product is reduced by hydrostatic extrusion in which the titanium semi-product is the billet (1) extruded through the die (4). The reduction (R) of the transverse cross-section of the titanium billet (1) is realized in at least three but not more than five consecutive hydrostatic extrusion passes at the initial temperature of the billet (1) not above 50° C. and the extrusion velocity not above 50 cm/s. Prior to each hydrostatic extrusion pass, the titanium billet is covered with a friction-reducing agent. During the first hydrostatic extrusion pass, the reduction of the transverse cross-section surface area of the titanium semi-product is at least four, whereas during the second and third hydrostatic extrusion pass it is at least two and a half.