A method for manufacturing a microelectromechanical systems (MEMS) microphone comprises depositing a membrane on a first sacrificial layer, wherein the first sacrificial layer is deposited on a substrate, etching the substrate to define a cavity, releasing the membrane by removing at least the first sacrificial layer, and forming at least one anchor at the edge of the membrane.

A method for manufacturing a microelectromechanical systems (MEMS) microphone comprises depositing a membrane on a first sacrificial layer, wherein the first sacrificial layer is deposited on a substrate, etching the substrate to define a cavity, releasing the membrane by removing at least the first sacrificial layer, and forming at least one anchor at the edge of the membrane.

A read circuit for capacitive sensors such as a MEMS microphones includes a sensor node configured to be coupled to a capacitive sensor to apply a bias voltage to the sensor and sense the capacitance value of the sensor wherein the voltage at the sensor node is indicative of the capacitance value of the capacitive sensor. A switch is provided between the sensor node and the intermediate node. A shock detector coupled to the sensor node and the switch asserts a shock signal to make the switch conductive in response to a shock applied to the capacitive sensor, and de-asserts the shock signal to make the switch non-conductive with a delay after the end of the shock applied to the capacitive sensor.

A read circuit for capacitive sensors such as a MEMS microphones includes a sensor node configured to be coupled to a capacitive sensor to apply a bias voltage to the sensor and sense the capacitance value of the sensor wherein the voltage at the sensor node is indicative of the capacitance value of the capacitive sensor. A switch is provided between the sensor node and the intermediate node. A shock detector coupled to the sensor node and the switch asserts a shock signal to make the switch conductive in response to a shock applied to the capacitive sensor, and de-asserts the shock signal to make the switch non-conductive with a delay after the end of the shock applied to the capacitive sensor.

Ultrasonic transducers that are capable of generating increased levels of ultrasound, as well as receiving ultrasonic waves with increased sensitivity. The ultrasonic transducers include a back cover, a protective front cover, a backplate, and a vibrator film layer disposed between the backplate and the protective front cover. The backplate includes a plurality of grooves formed on a surface thereof facing the vibrator film layer. Each groove includes upper edges having cross-sectional contours that gradually tend toward the deepest part of the groove to allow a larger area of the backplate to be closer to the vibrator film layer, thereby increasing the resulting electric field, and, consequently, increasing the output power and sensitivity of the ultrasonic transducer.

Ultrasonic transducers that are capable of generating increased levels of ultrasound, as well as receiving ultrasonic waves with increased sensitivity. The ultrasonic transducers include a back cover, a protective front cover, a backplate, and a vibrator film layer disposed between the backplate and the protective front cover. The backplate includes a plurality of grooves formed on a surface thereof facing the vibrator film layer. Each groove includes upper edges having cross-sectional contours that gradually tend toward the deepest part of the groove to allow a larger area of the backplate to be closer to the vibrator film layer, thereby increasing the resulting electric field, and, consequently, increasing the output power and sensitivity of the ultrasonic transducer.

Presented herein are contaminant-proof microphone assemblies for use with devices/apparatuses, such as auditory prostheses, that include one or more microphones disposed within a housing. A contaminant-proof microphone assembly in accordance with certain embodiments presented herein includes a microphone, a microphone plug, and a contaminant-proof membrane. The microphone plug has a first end coupled to the microphone and a second end that is configured to be positioned adjacent the contaminant-proof membrane. As such, the microphone plug is disposed between a sound inlet of the microphone and the contaminant-proof membrane. The microphone plug may be configured to mate with the housing or a gasket attached to the housing.

Presented herein are contaminant-proof microphone assemblies for use with devices/apparatuses, such as auditory prostheses, that include one or more microphones disposed within a housing. A contaminant-proof microphone assembly in accordance with certain embodiments presented herein includes a microphone, a microphone plug, and a contaminant-proof membrane. The microphone plug has a first end coupled to the microphone and a second end that is configured to be positioned adjacent the contaminant-proof membrane. As such, the microphone plug is disposed between a sound inlet of the microphone and the contaminant-proof membrane. The microphone plug may be configured to mate with the housing or a gasket attached to the housing.

An image capture device includes a housing having a pattern of apertures and a membrane assembly. The membrane assembly includes a support that has internal and external surfaces and a channel that aligns with at least one aperture of the pattern of apertures and extends between the internal and external surfaces. The membrane assembly includes indents that are adjacent to the channel, aligned with the pattern of apertures, and disposed on the external surface. The indents have a depth that is less than a depth of the channel.

An image capture device includes a housing having a pattern of apertures and a membrane assembly. The membrane assembly includes a support that has internal and external surfaces and a channel that aligns with at least one aperture of the pattern of apertures and extends between the internal and external surfaces. The membrane assembly includes indents that are adjacent to the channel, aligned with the pattern of apertures, and disposed on the external surface. The indents have a depth that is less than a depth of the channel.