Patent classifications
H05B3/62
Furnace combustion tube and mounting assembly
A combustion tube mounting system releasably mounts a combustion tube to an aperture in the floor of a furnace housing. The combustion tube has a base assembly with a cam and can be manually or automatically unlocked by cam pins in the floor for selectively engaging the cam for lowering the combustion tube from the floor of the furnace. When a new combustion tube is placed on the lower seal assembly and raised, it automatically aligns and engages the upper furnace seal and engages cams on the floor of the furnace housing which lock the combustion tube in place as it is introduced into the furnace.
METAL WIRING BONDING STRUCTURE AND PRODUCTION METHOD THEREFOR
A metal wiring bonding structure 100 comprises contacts 753 of connection FPC 75 and heater lands 46 of a sheet heater 30 to be bonded by a solder bonding member 766. A connection FPC 75 includes contact opposed lands 754 formed of metal and disposed at positions respectively opposed to the plurality of contacts 753 on a surface of a support layer 751 opposite from a surface on which metal wires 750 are provided. In addition to base surfaces 461 opposed to the contacts 753, the heater lands 46 respectively include extended surfaces 462 opposed to imaginary extended portions 753b imaginarily extended ahead from the contacts 753. A solder bonding member 756 covers surfaces of the contact opposed lands 754, a distal end surface of the connection FPC 75, and the extended surfaces 462 of the heater lands 46, and is filled in a bonding space C.
SYSTEM AND METHOD FOR PRODUCING AN ENGINEERED IRRADIATION PATTERN IN A NARROWBAND SYSTEM
This application is related to a method and construction technology for the implementation of narrowband, digital heat injection technology. More specifically, it relates to techniques for implementations thereof producing engineered irradiation patterns.
FAR -INFRARED RADIATION MULTI-STAGE TYPE HEATING FURNACE FOR STEEL SHEETS FOR HOT STAMPING
Provided is a far-infrared radiation multi-stage type heating furnace for steel sheets for hot stamping, the furnace including far-infrared radiation heaters having flexibility that are prevented from deflecting even during heating at temperatures ranging from the Ac.sub.3 transformation temperature to 950 C. The far-infrared radiation multi-stage type heating furnace includes: multiple-staged heating units that accommodate steel sheets for hot stamping, each heating unit formed by thermal insulation materials disposed around the periphery; and far-infrared radiation heaters positioned above and below the heating units. A far-infrared radiation heater (14-1) is received by a plurality of first metal strips (26) so as to be disposed approximately horizontally. The plurality of first metal strips (26) are disposed so that their strong axis direction approximately corresponds to the direction of gravity and supported by support pieces (27) so as to be expandable and contractible in a longitudinal direction by thermal expansion or thermal contraction. The support pieces (27) are disposed outside the thermal insulation materials in the heating units and a ceiling unit.
Bake devices for handling and uniform baking of substrates
Embodiments of the present disclosure relate to bake apparatuses for handling and uniform baking of substrates and methods for the handling and the uniform baking of substrates. The bake apparatuses allow the substrates to be heated to a temperature greater than 50 C. without bowing of about 1 mm to about 2 mm from the edge of the substrates to the center of the substrates. The bake apparatuses heat the substrates uniformly or substantially uniformly to improve substrate quality.
Bake devices for handling and uniform baking of substrates
Embodiments of the present disclosure relate to bake apparatuses for handling and uniform baking of substrates and methods for the handling and the uniform baking of substrates. The bake apparatuses allow the substrates to be heated to a temperature greater than 50 C. without bowing of about 1 mm to about 2 mm from the edge of the substrates to the center of the substrates. The bake apparatuses heat the substrates uniformly or substantially uniformly to improve substrate quality.
ONE-COAT ENCAPSULATED GRAPHITE HEATER AND PROCESS
A coated graphite heater. The heater has a configuration comprising a plurality of heating elements having a major portion disposed parallel to an upper surface of the heater so that the major portion is disposed horizontally. The heater configuration provides a heater that exhibits reduced thermal stress and/or reduced CTE mismatch stress particularly compared to designs having heating elements with a major portion oriented perpendicular to the plane of the upper surface of the heater.
Seal girding a stick of pipe or a pipeline in the entry or exit ports of a pipe fusion chamber
A seal obstructs the migration of particulates and precipitation into a pipe fusion chamber through its pipe stick entry and pipeline exit passages. Sheets of cloth serially overlap the anticipated center axis of a pipe stick/pipeline which will pass through the machine. The outer edge of each sheet is pleated and fixed to a frame contiguous with the perimeter of the passage and the inner edge of each sheet is gathered on an elastic band. When a face of a pipe stick/pipeline pushes the sheets away from the frame, the pleats and bands cooperate to allow the inner edges of the sheets to slide over the face and hug substantially the entire outer circumference of the pipe stick/pipeline.
PLASMA PROCESSING APPARATUS, METHOD OF OPERATING PLASMA PROCESSING APPARATUS, AND POWER SUPPLY DEVICE
A plasma processing apparatus according to an embodiment includes a processing container, a mounting table, a plurality of heaters, and a power supply device. The mounting table is provided in the processing container. The plurality of heaters are provided in the mounting table. The power supply device supplies electric power to the plurality of heaters. The power supply device includes a plurality of transformers and a plurality of zero-cross control type solid state relays (SSRs). The plurality of transformers are configured to step down a voltage from an alternating-current power source. Each of the plurality of transformers includes a primary coil and a secondary coil. The primary coil is connected to the alternating-current power source. Each of the plurality of SSRs is provided between one corresponding heater among the plurality of heaters and the secondary coil of one corresponding transformer among the plurality of transformers.
PLASMA PROCESSING APPARATUS, METHOD OF OPERATING PLASMA PROCESSING APPARATUS, AND POWER SUPPLY DEVICE
A plasma processing apparatus according to an embodiment includes a processing container, a mounting table, a plurality of heaters, and a power supply device. The mounting table is provided in the processing container. The plurality of heaters are provided in the mounting table. The power supply device supplies electric power to the plurality of heaters. The power supply device includes a plurality of transformers and a plurality of zero-cross control type solid state relays (SSRs). The plurality of transformers are configured to step down a voltage from an alternating-current power source. Each of the plurality of transformers includes a primary coil and a secondary coil. The primary coil is connected to the alternating-current power source. Each of the plurality of SSRs is provided between one corresponding heater among the plurality of heaters and the secondary coil of one corresponding transformer among the plurality of transformers.