The invention relates to a device for heating molten metal by the use of a heater that can be immersed into the molten metal. This immersion heater includes an outer cover formed of one or more materials resistant to the molten metal in which the immersion heater is to be used, and a heating element inside of the outer cover, where the heating element is protected from contacting the molten metal.

The invention relates to a device for heating molten metal by the use of a heater that can be immersed into the molten metal. This immersion heater includes an outer cover formed of one or more materials resistant to the molten metal in which the immersion heater is to be used, and a heating element inside of the outer cover, where the heating element is protected from contacting the molten metal.

A heating module for a furnace with a process zone. The module includes one or more Silicon Carbide heating elements in a refractory plug. The heating lengths of the elements extend, exposed, from the plug and do not engage one another, but may be positioned to cross over each other. The plug is releasably positioned in the furnace with the heating lengths exposed to the process zone. The plug can be positioned in an array of heating modules, which can be releasably positioned in the furnace with the heating lengths exposed to the process zone.

A vertical dual-chamber annealing device is provided. The vertical dual-chamber annealing device includes an outer chamber unit, an inner chamber body, a temperature control unit, a supporting structure, and a gas-tight seal structure. The inner chamber body can be moved upward, such that the inner chamber body can be located in the outer chamber unit and supported by the supporting structure. After the supporting of the supporting structure is removed, the inner chamber body is moved downward and separated from the outer chamber unit. Therefore, an arrangement of the inner chamber body and the outer chamber unit can increase the convenience of cleaning and replacing the inner chamber body. The structure of the inner chamber body can enhance the uniformity of a reaction temperature. The gas-tight seal structure isolates an inert gas and a reactive gas, which is beneficial to the recovery and the reuse of the reactive gas.

A vertical dual-chamber annealing device is provided. The vertical dual-chamber annealing device includes an outer chamber unit, an inner chamber body, a temperature control unit, a supporting structure, and a gas-tight seal structure. The inner chamber body can be moved upward, such that the inner chamber body can be located in the outer chamber unit and supported by the supporting structure. After the supporting of the supporting structure is removed, the inner chamber body is moved downward and separated from the outer chamber unit. Therefore, an arrangement of the inner chamber body and the outer chamber unit can increase the convenience of cleaning and replacing the inner chamber body. The structure of the inner chamber body can enhance the uniformity of a reaction temperature. The gas-tight seal structure isolates an inert gas and a reactive gas, which is beneficial to the recovery and the reuse of the reactive gas.

An electrode for a resistance analytical furnace has a central opening including a crucible-engaging surface and an annular flange spaced from the crucible-engaging surface. The flange has a lower surface with a plurality of grooves formed therein. The grooves are curved and extend from the central opening of the edge of the flange.

An electrode for a resistance analytical furnace has a central opening including a crucible-engaging surface and an annular flange spaced from the crucible-engaging surface. The flange has a lower surface with a plurality of grooves formed therein. The grooves are curved and extend from the central opening of the edge of the flange.

A modular heater includes multiple heater modules. The heater modules can include mating features, such as a tongue and groove seal, and/or soft seal, to prevent radiation, thermal convection and thermal conduction leakage. The heater module can also include heater elements, together with supports and expansion room for the heater elements.

A heating chamber (1) for a heating furnace is proposed, with which electrothermal vaporization of impurities from samples can be effected in order to be able to then analyze them spectrometrically. The heating chamber has a wall (3), a sample reception area (5), a nozzle area (7) and two electrical connection areas (9, 11). The heating chamber (1) is specially configured such that an electric current flows through the wall (3) in such a way that a heating capacity caused by it is higher in the nozzle area (7) than in the sample reception area (5). For example, the electrical connection areas (9, 11) may be arranged in a radial direction remoter from the longitudinal axis (8) than a part of the wall (3) surrounding the nozzle area (7), and the heating chamber (1) may be configured, for example by means of a locally constricted area (13), in such a way that the current between the two electrical connection areas (9, 11) is predominantly conducted radially inwards towards the part of the wall (3) surrounding the nozzle area (7). Advantageous heat distribution in the heating chamber (1) achievable thereby may have a positive effect on the analysis of sample impurities.

A heating chamber (1) for a heating furnace is proposed, with which electrothermal vaporization of impurities from samples can be effected in order to be able to then analyze them spectrometrically. The heating chamber has a wall (3), a sample reception area (5), a nozzle area (7) and two electrical connection areas (9, 11). The heating chamber (1) is specially configured such that an electric current flows through the wall (3) in such a way that a heating capacity caused by it is higher in the nozzle area (7) than in the sample reception area (5). For example, the electrical connection areas (9, 11) may be arranged in a radial direction remoter from the longitudinal axis (8) than a part of the wall (3) surrounding the nozzle area (7), and the heating chamber (1) may be configured, for example by means of a locally constricted area (13), in such a way that the current between the two electrical connection areas (9, 11) is predominantly conducted radially inwards towards the part of the wall (3) surrounding the nozzle area (7). Advantageous heat distribution in the heating chamber (1) achievable thereby may have a positive effect on the analysis of sample impurities.