Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC voltage, and methods of applying a pulsed DC voltage, to a substrate during plasma assisted or plasma enhanced semiconductor manufacturing processes.

A plasma heater includes a plasma heating section, an exhaust wasteheat heating section, a gas circulation pump, a water cooling system, and a treatment tank for waste gas and waste water. Flames emitted by plasma torches of plasma generators are directly sprayed onto first water pipes for heating. Exhaust generated after combustion of the plasma torches flows through the tail gas residual heat heating section in the metal cylindrical casing, then flows out of the metal cylindrical casing to enter the gas circulation pump, and flows back into the plasma generators through the gas circulation pump for recycling. After the circulating exhaust operates for more than 10 minutes, the discharged waste gas and waste liquid enter the recovering treatment tank.

A system and a method for determining/predicting a tapping time for a metal melt in an electric arc furnace (EAF), at least one electrode is provided for melting the metal melt until it reach a target tapping temperature, the EAF further includes a slag and smoke layer on the surface of the metal melt, wherein an electromagnetic stirrer is provided for stirring the metal melt.

A system and a method for determining/predicting a tapping time for a metal melt in an electric arc furnace (EAF), at least one electrode is provided for melting the metal melt until it reach a target tapping temperature, the EAF further includes a slag and smoke layer on the surface of the metal melt, wherein an electromagnetic stirrer is provided for stirring the metal melt.

An electric arc furnace (EAF) including a raw material container, a set of electrodes, a set of electrical potential transformers, and a reference signal verification device. The set of electrodes are configured to be controllably extended toward the raw material container. The set of electrical potential transformers are correspondingly coupled to the set of electrodes. The reference signal verification device is configured to carry out the steps of reading a reference signal value coming from the raw material container; comparing the reference signal value to an approximated value; and determining that there is a loss of the reference signal if the reference signal value is not within a predetermined amount of the approximated value.

An electric arc furnace (EAF) including a raw material container, a set of electrodes, a set of electrical potential transformers, and a reference signal verification device. The set of electrodes are configured to be controllably extended toward the raw material container. The set of electrical potential transformers are correspondingly coupled to the set of electrodes. The reference signal verification device is configured to carry out the steps of reading a reference signal value coming from the raw material container; comparing the reference signal value to an approximated value; and determining that there is a loss of the reference signal if the reference signal value is not within a predetermined amount of the approximated value.

A structure of composite crucibles and a high temperature adiabatic method in an arc heating process are disclosed. The structure may include a conventional water-cooled copper platform on which one or more graphite platform(s) are disposed and the topmost graphite platform is configured for disposing one or more metallic specimen(s). When arc smelts the metallic specimen(s) in the furnace in vacuum, and the heat of the metallic specimen(s) is transferred to the graphite platform, the graphite platform can reduce heat loss and improve heat preservation so as to cause the metallic specimen(s) to remain stable for the process of heating and melting to complete. The heat of the graphite platform is further transferred to the copper platform for lowering the temperature of the graphite platform.

An electronic device, and a magnetic energy harvesting device and method of harvesting magnetic energy, for electric metallurgical furnaces and similar environments. The device comprises a conductor which is configured to become induced with electricity in response to a time-varying magnetic field. The field may be irregular, such as near a metallurgical furnace or a similar environment. The electronic device may be a transmitter in a metallurgical electric furnace. The transmitter may be connected to an environment sensor. The electronic device may be powered by the magnetic energy harvesting device. The magnetic energy harvesting device may a wire loop or a coil. The method comprises inductively harvesting energy from magnetic field fluctuations caused by a metallurgical furnace or a similar environment to wirelessly power the electronic device.

An electronic device, and a magnetic energy harvesting device and method of harvesting magnetic energy, for electric metallurgical furnaces and similar environments. The device comprises a conductor which is configured to become induced with electricity in response to a time-varying magnetic field. The field may be irregular, such as near a metallurgical furnace or a similar environment. The electronic device may be a transmitter in a metallurgical electric furnace. The transmitter may be connected to an environment sensor. The electronic device may be powered by the magnetic energy harvesting device. The magnetic energy harvesting device may a wire loop or a coil. The method comprises inductively harvesting energy from magnetic field fluctuations caused by a metallurgical furnace or a similar environment to wirelessly power the electronic device.

To realize a reduction in size of an electromagnetic wave heating system that utilizes water vapor. The electromagnetic wave heating system comprises a heat chamber having a first wall surface and a second wall surface different from the first wall surface, in which an object is placed to be heated, a flat antenna arranged on the first wall surface of the heat chamber and configured to emit an electromagnetic wave so as to heat an object inside the heating chamber, a discharger arranged on the second wall surface and configured to generate a discharge plasma by occurring a high voltage through a resonation structure of the electromagnetic wave, and an oscillator formed by a semiconductor element and configured to output the electromagnetic wave, and it is configured that the electromagnetic wave outputted from the oscillator is supplied into the flat antenna and the discharger.