The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 m.sup.2 to 50 m.sup.2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.

A metal plate includes a surface including a longitudinal direction of the metal plate and a width direction orthogonal to the longitudinal direction. A surface reflectance by regular reflection of a light is 8% or more and 25% or less. The surface reflectance is measured when the light is incident on the surface at an angle of 450.2. The light is in at least one plane orthogonal to the surface.

The film-forming method according to an embodiment of the present invention includes: a step A for forming a photocurable resin liquid film on a substrate; a step B for vaporizing the photocurable resin in a first region on the substrate by selectively irradiating the first region with infrared rays or visible light having a wavelength that is longer than 550 nm; and a step C for obtaining a photocured resin film by curing the photocurable resin in the second region on the substrate, said second region including the first region, by irradiating, simultaneously with the step 3 or after performing the step 3, the second region with light, to which the photocurable resin is sensitive.

A method includes steps of (a) forming a substrate layer 10 above a support substrate 8 which is transparent, and then a thin-film element above the substrate layer 10; and (b) emitting laser beams La and Lb to a face of the support substrate 8 opposite to another face of the support substrate to which the substrate layer 10 and the thin-film element are formed, and delaminating the substrate layer 10 and the thin-film element from the support substrate 8. In step (b), the laser beams La and Lb are emitted from different directions.

A method includes steps of (a) forming a substrate layer 10 above a support substrate 8 which is transparent, and then a thin-film element above the substrate layer 10; and (b) emitting laser beams La and Lb to a face of the support substrate 8 opposite to another face of the support substrate to which the substrate layer 10 and the thin-film element are formed, and delaminating the substrate layer 10 and the thin-film element from the support substrate 8. In step (b), the laser beams La and Lb are emitted from different directions.

A thin film production method according to one embodiment includes: a coating film forming step of forming a coating film by discharging a coating liquid on a support from first to M-th line heads (M is 2 or larger and N or smaller) while allowing the support to pass through N line heads once; and a drying step of obtaining a thin film by drying the coating film. A thin film forming nozzle hole 28 of the m-th line head (m is 2 or larger and M or smaller) is arranged to be positioned between adjacent thin film forming nozzle holes in an (m1)-th thin film forming nozzle hole array Q.sub.m-1. Every time the first line head discharges the coating liquid, the m-th line head applies the coating liquid onto the support at a predetermined delay time with respect to a discharge time of the first line head. The first to M-th line heads discharge the coating liquid from the film forming nozzle hole selected in accordance with a shape of a thin film formation region onto the support.

A light source and method for making the same are disclosed. The light source includes a plurality of Segmented LEDs connected in parallel to a power bus and a controller. The power bus accepts a variable number of Segmented LEDs. The controller receives AC power and provides a power signal on the power bus. Each Segmented LED is characterized by a driving voltage that is greater than 3 times the driving voltage of a conventional LED fabricated in the same material system as the Segmented LED. The number of Segmented LEDs in the light source is chosen to compensate for variations in the light output of individual Segmented LEDs introduced by the manufacturing process. In another aspect of the invention, the number of Segmented LEDs connected to the power bus can be altered after the light source is assembled.

A light source and method for making the same are disclosed. The light source includes a plurality of Segmented LEDs connected in parallel to a power bus and a controller. The power bus accepts a variable number of Segmented LEDs. The controller receives AC power and provides a power signal on the power bus. Each Segmented LED is characterized by a driving voltage that is greater than 3 times the driving voltage of a conventional LED fabricated in the same material system as the Segmented LED. The number of Segmented LEDs in the light source is chosen to compensate for variations in the light output of individual Segmented LEDs introduced by the manufacturing process. In another aspect of the invention, the number of Segmented LEDs connected to the power bus can be altered after the light source is assembled.

The present invention provides a photosensitive resin composition which has a light-blocking property, and at the same time, a high sensitivity, and has excellent half-tone characteristics. The present invention provides a photosensitive resin composition including an (A) alkali-soluble resin, a (B) radically polymerizable compound, a (C) photo initiator, and a (D) colorant, where the (A) alkali-soluble resin contains a polyimide, a polyimide precursor, a polybenzoxazole precursor, and/or a copolymer thereof, and the (B) radically polymerizable compound contains a (B-1) bifunctional or higher (meth)acrylic compound that has a glass transition temperature of 150 C. or higher as a homopolymer, and a (B-2) tetrafunctional or higher (meth)acrylic compound other than the (B-1).